Stacking faults in SiCf/SiC composite obtained by chemical vapor reaction process

SiC fiber-reinforced SiC matrix composite (SiCf/SiC) is one of the leading candidates in ceramic materials for engineering applications due to its unique combination of properties such as high thermal conductivity, high resistance to corrosion and working conditions. Fiber-reinforced composites are materials which exhibit a significant improvement in properties like ductility in comparison to the monolithic SiC ceramic. The SiCf/SiC composite was obtained from a C/C composite precursor using convertion reaction under high temperature and controlled atmosphere. In this work, SiC phase presented the stacking faults in the structure, being not possible to calculate the unit cell size, symmetry and bond lengths but it seem equal card number 29-1129 of JCPDS.

Micromorphologic assessment of CVD (chemical vapor deposition) and conventional diamond tips and their cutting effectiveness

The aim of this study was to compare the micromorphology of CVD diamond tips coupled to ultrasound with conventional high speed diamond tips after cavity preparations, and to measure the width and depth of the cavities obtained. Two hundred bovine teeth were divided into 20 subgroups. Each of the diamond tips (10 CVD and 10 conventional) were used to prepare 10 standardized cavities, using an apparatus that controlled the time (t: 27 s), speed (5.3 mm/s) and load (0.012 KGF) of the tip against the teeth during preparation. The unused and the used (after one, five and 10 preparations) tips were analyzed by scanning electronic microscopy. The images were randomly assessed by 3 examiners with regard to the presence or absence of micromorphologic alterations. Cavity measurements were made after visualization under a stereoscopic microscope. Cavity widths and depths were analyzed by the ANOVA Factorial test (p < 0.05). The CVD diamond tips presented less wear than the conventional tips after all the cavity preparations performed, but produced shallower cavities that were equivalent in width to those made by conventional tips after the fifth preparation. CVD diamond tips may be suggested as an alternative to conventional diamond tips due to their conservative preparation and greater longevity.

Chemical vapor deposition of multi-walled carbon nanotubes from nickel/yttria-stabilized zirconia catalysts

Multi-walled carbon nanotubes (MWNT) were produced by chemical vapor deposition using yttria-stabilized zirconia/nickel (YSZ/Ni) catalysts. The catalysts were obtained by a liquid mixture technique that resulted in fine dispersed nanoparticles of NiO supported in the YSZ matrix. High quality MWNT having smooth walls, few defects, and low amounts of by-products such as amorphous carbon were obtained, even from catalysts with large Ni concentrations (> 50 wt.%). By adjusting the experimental parameters, such as flux of the carbon precursor (ethylene) and Ni concentration, both the MWNT morphology and the process yield could be controlled. The resulting YSZ/Ni/MWNT composites can be interesting due to their mixed ionic-electronic transport properties, which could be useful in electrochemical applications.

Plasma enhanced chemical vapor deposition of titanium(IV) ethoxide-oxygen-helium mixtures

Thin films were deposited by plasma enhanced chemical vapor deposition from titanium (IV) ethoxide (TEOT)-oxygen-helium mixtures. Actinometric optical emission spectroscopy was used to obtain the relative plasma concentrations of the species H, CH, O and CO as a function of the percentage of oxygen in the feed, R(ox). The concentrations of these species rise with increasing R(ox) and tend to fall for R(ox) greater than about 45%. As revealed by a strong decline in the emission intensity of the actinometer Ar as R(ox) was increased, the electron mean energy or density (or both) decreased as greater proportions of oxygen were fed to the chamber. This must tend to reduce gas-phase fragmentation of the monomer by plasma electrons. As the TEOT flow rate was fixed, however, and since the species H and CH do not contain oxygen, the rise in their plasma concentrations with increasing R(ox) is explained only by intermediate reactions involving oxygen or oxygen-containing species. Transmission infrared (IRS) and X-ray photoelectron (XPS) spectroscopies were employed to investigate film structure and composition. The presence of CH(2), CH(3), C=C, C-O and C=O groups was revealed by IRS. In addition, the presence of C-O and C=O groups was confirmed by XPS, which also revealed titanium in the +4 valence state. The Ti content of the films, however, was found to be much less than that of the monomer material itself. (C) 2007 Elsevier B.V. All rights reserved.

Diverse Amorphous Carbonaceous Thin Films Obtained by Plasma Enhanced Chemical Vapor Deposition and Plasma Immersion Ion Implantation and Deposition

Diverse amorphous hydrogenated carbon and similar films containing additional elements were produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) and by Plasma Immersion Ion Implantation and Deposition (PIIID). Thus a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:O:Si were obtained, starting from the same feed gases, using both techniques. The same deposition system supplied with radiofrequency (RF) power was used to produce all the films. A cylindrical stainless steel chamber equipped with circular electrodes mounted horizontally was employed. RF power was fed to the upper electrode; substrates were placed on the lower electrode. For PIIID negative high tension pulses were also applied to the lower electrode. Raman spectroscopy confirmed that all the films are amorphous. Chemical characterization of each pair of films was undertaken using Infrared Reflection Absorption Spectroscopy and X-ray Photoelectron Spectroscopy. The former revealed the presence of specific structures, such as C-H, C-O, O-H. The latter allowed calculation of the ratio of hetero-atoms to carbon atoms in the films, e. g. F:C, N:C, and Si:C. Only relatively small differences in elemental composition were detected between films produced by the two methods. The deposition rate in PIIID is generally reduced in relation to that of PECVD; for a-C:H:Cl films the reduction factor is almost four.

Development of chemical vapor deposition diamond burrs using hot filament

The fabrication of boring tools (burrs) for dentistry with the use of a hot-filament chemical vapor deposition (CVD) system, to form the diamond abrading structure, is reported here. The diamond was synthesized from a methane/freon gas mixture diluted in hydrogen. Comparative drilling tests with conventional diamond burrs and the CVD diamond burrs in borosilicate glasses demonstrated a lifetime more than 20 times larger for the CVD diamond burrs. Also, heat flow experiments in dentine showed that the CVD diamond burrs induce temperature gradients of the same order as the conventional ones. These characteristics of the CVD diamond burrs are highly desirable for odontological applications where the burrs' lifetime and the low temperature processing are essential to the quality and comfort of the treatment. © 1996 American Institute of Physics.

Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition

Diverse amorphous hydrogenated carbon-based films (a-C:H, a-C:H:F, a-C:H:N, a-C:H:Cl and a-C:H:Si:O) were obtained by radiofrequency plasma enhanced chemical vapor deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID). The same precursors were used in the production of each pair of each type of film, such as a-C:H, using both PECVD and PIIID. Optical properties, namely the refractive index, n, absorption coefficient, α, and optical gap, ETauc, of these films were obtained via transmission spectra in the ultraviolet-visible near-infrared range (wavelengths from 300 to 3300 nm). Film hardness, elastic modulus and stiffness were obtained as a function of depth using nano-indentation. Surface energy values were calculated from liquid drop contact angle data. Film roughness and morphology were assessed using atomic force microscopy (AFM). The PIIID films were usually thinner and possessed higher refractive indices than the PECVD films. Determined refractive indices are consistent with literature values for similar types of films. Values of ETauc were increased in the PIIID films compared to the PECVD films. An exception was the a-C:H:Si:O films, for which that obtained by PIIID was thicker and exhibited a decreased ETauc. The mechanical properties - hardness, elastic modulus and stiffness - of films produced by PECVD and PIIID generally present small differences. An interesting effect is the increase in the hardness of a-C:H:Cl films from 1.0 to 3.0 GPa when ion implantation is employed. Surface energy correlates well with surface roughness. The implanted films are usually smoother than those obtained by PECVD. ©2013 Elsevier B.V. All rights reserved.

Avaliação da ponta de diamante CVC (Chemical Vapor Deposition) associada ao aparelho de ultra-som

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Propriedades estruturais e ópticas de filmes finos a-C:H:CI obtidos por deposição à vapor químico assistido por plasma e deposição e implantação iônica por imersão em plasma

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Development of amorphous carbon protective coatings on poly(vinyl)chloride

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

XPS investigation of plasma-deposited polysiloxane films irradiated with helium ions

This work describes an XPS investigation of plasma-deposited polysiloxane films irradiated with 170 keV He+ ions at fluences, Phi, ranging from 1 x 10(14) to 1 x 10(16) cm(-2). Modifications in the atomic concentrations of the surface atoms with (D were revealed by changes in the [O]/[Si], [O]/[C] and [C]/[Si] atomic ratios. Surface chemical structure modifications were evidenced by the increasing C1s peak width and asymmetry as Phi was increased, due to the formation of ether and carboxyl functionalities. Moreover, structural transformations were indicated by the positive binding energy shift of the Si2p peaks, due to the increasing Si oxidation. Correlations of the XPS data with other results from previous work on polysiloxanes illustrate the role of ion beam-induced bond breaking on the structural modifications.

Propriedades químicas e ópticas de filmes de carbono amorfo halogenados produzidos por deposição a vapor químico assistido por plasma (PECVD) e deposição e implantação iônica por imersão em plasma (DIIIP)

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Caracterização de filmes finos obtidos por deposição de vapor químico assistido a plasma (PECVD) e deposição e implantação iônica por imersão em plasma (PIIID)

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Caracterização de Filmes a-C:H:Cl e a-C:H:Si:Cl produzidos por deposição à vapor químico assistido por plasma (PECVD) e deposição e implantação iônica por imersão em plasma (PIIID)

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Soil attributes and efficiency of sulfentrazone on control of purple nutsedge (Cyperus rotundus L.)

Herbicidas aplicados ao solo são submetidos à adsorção, lixiviação e degradação por processos físicos, químicos e biológicos, além da absorção pelas plantas. Todos esses processos são afetados pela classe dos solos onde foram aplicados e das condições climáticas reinantes logo após a aplicação, que afetarão a eficiência dos produtos no controle de plantas daninhas. Investigaram-se as influências dos atributos de solos e condições de cultivo na eficiência do herbicida sulfentrazone no controle da planta daninha tiririca (Cyperus rotundus L.). O Latossolo Vermelho-Amarelo Distrófico (LVAd), o Latossolo Vermelho (LVd - Distrófico; LVdf - Distroférrico; LVef - Eutroférrico) e o Nitossolo Vermelho Eutrófico (NVe) foram coletados sob duas condições de cultivo, visando obter solos com teores diferenciados de argila, óxido de ferro e matéria orgânica. As amostras dos solos foram submetidas à caracterização granulométrica, química e mineralógica e, em seguida, utilizadas no bioensaio de avaliação da eficiência do sulfentrazone (1,6 L p.c. ha-1) no controle da tiririca em condições de pré-emergência. O sulfentrazone apresentou comportamento diferenciado entre as classes de solos estudados e a sua eficiência diminuiu com o aumento do teor de óxido de ferro nos solos, na seguinte ordem: LVAd, LVd, NVe, LVef e LVdf, sendo que as variações nos teores de argila (240 a 640 g kg-1) e da matéria orgânica (12 a 78 g kg-1) dos solos não interferiram na eficiência do sulfentrazone.