Laser stimulated light reflection for TeO2-WO 3-Bi2O3 thin films with incorporated Si nanoparticles

A novel method of preparation of the Si nanoparticles (NPs) incorporated in tellurite TeO2-WO3-Bi2O3 (TWB) thin films is proposed. This mew method applies RF magnetron sputtering technique at room temperature. The incorporation of Si NP was confirmed by transmission electron microscopy (TEM); isolated Si NPs with diameters of around 6 nm are observed. Energy dispersive X-ray spectroscopy (EDS) was performed during TEM analysis in order to confirm the presence of Si NP and also the other elements of the thin film. The thin films are explored with respect to the photoinduced changes of the reflectivity within the 400-65 nm spectra range using a 10 ns pulsed Nd:YAG with power densities varying up to 400 MW/cm2 and beam diameter within the 3-5 mm range. The observed processes are analyzed within a framework of trapping level conceptions for the Si NP. The possible application of the discovered materials as optical sensitive sensors is proposed. © 2013 Elsevier B.V.

Influência da potência de laser Nd: YAG na soldagem do aço inoxidável duplex UNS S32205

Pós-graduação em Engenharia Mecânica - FEIS

Lensometry by two-laser holography with photorefractive Bi12TiO20

Refractive and profilometric measurements of lenses were performed through holography with a photorefractive Bi12TiO20 crystal as the recording medium. Two properly aligned diode lasers emitting in the red region were employed as light sources. Both lasers were tuned in order to provide millimetric and sub-millimetric synthetic wavelengths. The surfaces of the test lens were covered by a 25-μm opaque plastic tape in order to allow the lens profilometry upon illuminating them with a collimated beam. The resulting holographic images appear covered by interference fringes corresponding to the wavefront geometry of the wave scattered by the lens. For refractive index measurement a diffusely scattering flat surface was positioned behind the uncovered lens which was also illuminated by a plane wave. The resulting contour interferogram describes the form of the wavefront after the beam traveled back and forth through the lens. The fringe quantitative evaluation was carried out through the four-stepping technique and the resulting phase map and the Branch-cut method was employed for phase unwrapping. The only non-optical procedure for lens characterization was the thickness measurement, made by a dial caliper. Exact ray tracing calculation was performed in order to establish a relation between the output wavefront geometry and the lens parameters like radii of curvature, thickness and refractive index. By quantitatively comparing the theoretical wavefront geometry with the experimental results relative uncertainties bellow 3% for refractive index and 1 % for focal length were obtained. © 2008 American Institute of Physics.

Influência do espaçamento do feixe de laser Nd: YAG na obtenção de óxidos e nitretos na superfície do titânio em pressão atmosférica

Neste trabalho investigou-se a modificação de superfície do titânio pela irradiação com feixe de Laser Nd:YAG. Os parâmetros do laser como a potência, o comprimento de onda, a frequência, a velocidade de varredura e a área de exposição foram mantidos constantes, exceto o espaçamento da matriz, o qual foi de 0,01 e 0,02 mm. A caracterização da superfície foi realizada por Microscopia Eletrônica de Varredura (MEV) e Difração de Raios X (DRX), sendo que os espectros foram refinados pelo método Rietveld. Pela análise de MEV, observou-se uma mudança na topografia, obtendo uma superfície rugosa produzida pelo fenômeno de ablação. As análises por Rietveld dos espectros de difração de raios X detectaram TiN, Ti2N, TiO2 (anatásio e rutilo), sendo que a amostra com espaçamento 0,01 mm apresentou uma maior quantidade de óxidos e nitretos. Isso pode ser devido à sobreposição do feixe, induzindo à formação de uma superfície com maior estabilidade termodinâmica. Os óxidos e nitretos obtidos são de grande importância, pois são responsáveis por produzir uma maior interação entre o osso-implante.