Propriedades químicas e ópticas de filmes de carbono amorfo halogenados produzidos por deposição a vapor químico assistido por plasma (PECVD) e deposição e implantação iônica por imersão em plasma (DIIIP)

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Caracterização estrutural e propriedades óticas e mecânicas do diglime polimerizado a plasma

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Análise morfológica de filmes finos de óxido de zinco

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Caracterização química, propriedades ópticas e modelagem de filmes de carbono amorfo hidrogenado halogenado e similares produzidos por deposição à plasma

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Propriedades estruturais e ópticas de filmes finos a-C:H:CI obtidos por deposição à vapor químico assistido por plasma e deposição e implantação iônica por imersão em plasma

Pós-graduação em Ciência e Tecnologia de Materiais - FC

Síntese e caracterização de vidros teluritos

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Estudo das propriedades ópticas, linear e não linear, e elétrica dos vidros da família Li2O-TeO2-WO3

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)

Structural and optical properties of brominated plasma polymers

Novel brominated amorphous hydrogenated carbon (a-C:H:Br) films were produced by the plasma polymerization of acetylene-bromoform mixtures. The main parameter of interest was the degree of bromination, which depends on the partial pressure of bromoform in the plasma feed, expressed as a percentage of the total pressure, R-B. When bromoform is present in the feed, deposition rates of up to about 110 nm min(-1) may be obtained. The structure and composition of the films were characterized by Transmission Infrared Reflection Absorption Spectroscopy (IRRAS) and X-ray Photo-electron Spectroscopy (XPS). The latter revealed that films with atomic ratios Br:C of up to 0.58 may be produced. Surface contact angles, measured using goniometry, could be increased from similar to 63 degrees (for an unbrominated film) to similar to 90 degrees for R-B of 60 to 80%. Film surface roughness, measured using a profilometer, does not depend strongly on R-B. Optical properties the refractive index, n, absorption coefficient, alpha(E), where E is the photon energy, and the optical gap, E-g, were determined from film thicknesses and data obtained by Transmission Ultraviolet-Visible Near Infrared Spectroscopy (UVS). Control of n was possible via selection of R-B. The measured optical gap increases with increasing F-BC, the atomic ratio of Br to C in the film, and semi-empirical modeling accounts for this tendency. A typical hardness of the brominated films, determined via nano-indentation, was similar to 0.5 GPa. (C), 2013 Elsevier B.V. All rights reserved.

Metallic nanoparticles grown in the core of femtosecond laser micromachined waveguides

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Near-infrared nonlinearity of a multicomponent tellurium oxide glass at 800 and 1,064 nm

We report on the nonlinear (NL) optical properties of glassy TeO2-GeO2-K2O-Bi2O3 at lambda = 800 nm and lambda = 1,064 nm. Using the Kerr gate technique with a laser delivering 150 fs pulses at 800 nm, we demonstrated the fast NL response of the samples. The modulus of the NL refractive index, n (2), at 800 nm was similar to 10(-15) cm(2)/W. The Z-scan technique was used to determine n (2) a parts per thousand +10(-15) cm(2)/W, at 1,064 nm with pulses of 17 ps. The two-photon absorption coefficient, alpha (2), was smaller than the minimum that we can measure (< 0.003 cm/GW). The figure of merit n (2)/alpha (2) lambda was calculated and indicates that this glass composition has large potential to be used for all-optical switching.

SeP hole injection layer for devices based on organic materials

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Writing saturated holograms in LiNbO3 crystals through phase control and double diffraction

Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)

Picosecond nonlinearity of GeO2-Bi2O3-PbO-TiO2 glasses at 532 and 1,064 nm

Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)

Acetylene plasma polymer treated by atmospheric dielectric barrier discharge

Plasma polymer films are very attractive for industrial applications in several sectors such as in the electronic, mechanic, biomedic, coating and others, due to its good adhesion, being insoluble in mild acids and bases and having a high crosslinking structure. This work reports the physical, structural, and surface properties of the polymer obtained from an acetylene plasma polymerization technique and treated by dielectric barrier discharge (DBD). The film was deposited in a reactor supplied by a radio-frequency power source at low pressure. After deposition, the nanofilms were treated in a DBD plasma reactor operating in air. The treatment times varied from 1 to 5 min. The analysis of molecular structure of the samples was investigated by FTIR spectroscopy, showing absorption bands in 3480, 2930, 1720, 1450 and 1380 cm(-1). The water contact-angle was investigated by goniometric technique and presented values from 5 to 65 degrees. The aging effect of these films was also studied. The alteration in the films surface morphology was assessed by an atomic force microscopy (AFM) which indicated that the roughness increased from 60 nm to 160 nm as a result of the DBD treatment. The refractive index of the samples presented values near 1.7, measured by UV-Visible spectroscopy. (C) 2014 Elsevier Ltd. All rights reserved.

Implantação iônica por imersão em plasma e deposição de filmes finos poliméricos provenientes da mistura hexametildisilazano/argônio

Thin polymeric films deposited by plasma are very atractive for many industrial and scientific applications, in areas such as electronics, mechanics, coatings, biomaterials, among others, due to its favorable properties such as good adhesion to the substrate, high crosslinking, nanomectric thickness, homogeneity, etc. In this work, thin films were deposited by plasma immersion ion implantation and deposition technique from a hexamethyldisilazane/argon mixture at different proportions. These films were subjected to several characterizations, such as, contact angle, which presented values near to 100 degrees, surface energy, with values near to 31 mJ/m2, hardness with values between 0.7 and 2.6 GPa, thickness from 100 to 200 nm, refractive index from 1.56 to 1.64, molecular structure presenting the following functional groups in the infrared spectra region: CHx from 2960 to 2900 cm-1; Si-H around 2130 cm-1; CH3 in Si-(CH3)x around 1410 cm-1; CH3 in Si-(CH3)x in 1260 cm-1; N-H around 1180 cm-1; CH2 in Si-CH2-Si bonds around 1025 cm-1; Si-O in Si-O-Si from 1020 to 1100 cm-1; Si-N in Si-H-Si bonds around 940 cm-1; CH3 in Si-(CH3)3 in 850 cm-1; Si-C bonds in Si-(CH3)2 around 800 cm-1; and Si-H in 680 cm-1 . From these characterizations, it was possible to conclude that the concentration of argon or hexamethyldisilazane in the mixture changed the resulting polymer