Characterisation of Ni–Ti thin films produced by filtered arc deposition

Ti–49.5 at%Ni thin films have been formed by deposition onto Si and glass substrates using a filtered arc deposition system (FADS). The films deposited on glass were composed of nanocrystalline parent phase grains contained within an amorphous matrix. The films deposited onto silicon were crystalline, and were largely parent phase whereas a bulk alloy of the same composition would be expected to be martensite. The stabilisation of the parent phase is proposed to be a grain size effect, with the critical grain size for parent phase stabilisation being about 30 nm.

Finite element simulations of the cyclic elastoplastic behaviour of copper thin films

A large-scale computational and statistical strategy is presented to investigate the development of plastic strain heterogeneities and plasticity induced roughness at the free surface in multicrystalline films subjected to cyclic loading conditions, based on continuum crystal plasticity theory. The distribution of plastic strain in the grains and its evolution during cyclic straining are computed using the finite element method in films with different ratios of in-plane grain size and thickness, and as a function of grain orientation (grains with a {1 1 1} or a {0 0 1} plane parallel to the free surface and random orientations). Computations are made for 10 different realizations of aggregates containing 50 grains and one large aggregate with 225 grains. It is shown that overall cyclic hardening is accompanied by a significant increase in strain dispersion. The case of free-standing films is also addressed for comparison. The overall surface roughness is shown to saturate within 10 to 15 cycles. Plasticity induced roughness is due to the higher deformation of {0 0 1} and random grains and due to the sinking or rising at some grain boundaries.

Surface structure of SnOxNy thin films deposited using a filtered cathodic arc for novel energy storage systems

Tin oxide/nitride (SnOxNy) thin films were synthesised using a filtered cathodic vacuum arc deposition system. These films were deposited at room temperature with increasing amounts of reactive nitrogen gas to alter the nanostructure. To understand the surface structure of the coatings several techniques were used including scanning electron microscopy (SEM), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and x-ray absorption spectroscopy (XAS). Preliminary results have shown that a cathodic arc can be used to deposit smooth films which exhibit a mixed tin oxide/nitride structure.

X-ray diffraction line broadening from gold and platinum thin films

X-ray diffraction line profile analysis has been used to study the microstructure of (Ill) oriented gold and platinum thin films deposited by thermal evaporation and DC magnetron sputtering. In addition to crystallite size broadening, the profiles from these films displayed broadening arising from dislocations. A parallel investigation, using transmission electron microscopy (TEM) was undertaken to study the nature of dislocations formed, and to provide information on the dimensions of the crystallite columns in the films. X-ray data were collected at room temperature to determine the anisotropy of the broadening with (hkl), using a Siemens D5000 powder diffractometer (CuKa radiation) and two high-resolution synchrotron instruments (BM 16 at the ESRF [A=0.35A] and station 2.3 at the Daresbury laboratory. Two approaches to instrument deconvolution were investigated; Fourier deconvolution and fundamental parameters profile fitting, using Lab6 as a reference material to determine the instrument profile function. After removal of the crystallite size broadening contribution from the measured integral breadths, the residual microstrain broadening was modelled assuming dislocations based on a FCC a/2<110>{ Ill} slip system. The results of the X-ray analysis agreed with dark field TEM micrographs, which showed that many of the crystallites contained dislocations of mixed character (screw- edge).

Temperature-agile and structure-tunable optical properties of VO 2/Ag thin films

By integrating together VO2’s unique near-room-temperature (RT) semiconductor–metal (S–M) phase transition with a thin silver (Ag) layer’s plasmonic properties, VO2/Ag multilayers could present a much enhanced optical transmission change when increasing the temperature from RT to over VO2’s S–M phase-transition temperature. Changing VO2 and Ag layer thicknesses can also significantly tune their transmission and absorption properties, which could lead to a few useful designs in optoelectronic and energy-saving industries.