Surface structure of SnOxNy thin films deposited using a filtered cathodic arc for novel energy storage systems

Tin oxide/nitride (SnOxNy) thin films were synthesised using a filtered cathodic vacuum arc deposition system. These films were deposited at room temperature with increasing amounts of reactive nitrogen gas to alter the nanostructure. To understand the surface structure of the coatings several techniques were used including scanning electron microscopy (SEM), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS), x-ray diffraction (XRD) and x-ray absorption spectroscopy (XAS). Preliminary results have shown that a cathodic arc can be used to deposit smooth films which exhibit a mixed tin oxide/nitride structure.

Towards enhanced performance thin-film composite membranes via surface plasma modification

Advancing the design of thin-film composite membrane surfaces is one of the most promising pathways to deal with treating varying water qualities and increase their long-term stability and permeability. Although plasma technologies have been explored for surface modification of bulk micro and ultrafiltration membrane materials, the modification of thin film composite membranes is yet to be systematically investigated. Here, the performance of commercial thin-film composite desalination membranes has been significantly enhanced by rapid and facile, low pressure, argon plasma activation. Pressure driven water desalination tests showed that at low power density, flux was improved by 22% without compromising salt rejection. Various plasma durations and excitation powers have been systematically evaluated to assess the impact of plasma glow reactions on the physico-chemical properties of these materials associated with permeability. With increasing power density, plasma treatment enhanced the hydrophilicity of the surfaces, where water contact angles decreasing by 70% were strongly correlated with increased negative charge and smooth uniform surface morphology. These results highlight a versatile chemical modification technique for post-treatment of commercial membrane products that provides uniform morphology and chemically altered surface properties.

Premature thermal fatigue failure of aluminium injection dies with duplex surface treatment

The premature failure of an aluminium injection die with a duplex surface treatment (plasma nitriding and physical vapor deposition coating) was investigated, in an effort to identify the causes of such premature failure of the component. The manufacturing and the operating conditions were documented. Analytical tools were used, including scanning electron microscopy with energy dispersive X-ray capability, X-ray diffraction, and instrumented microhardness testing. Preliminary observations showed a microstructure of coarse tempered martensite, and a considerably rough surface with porosity and cracks. A detailed analysis of crack initiation sites identified sulfur inclusions in the subsurface, underneath the coating. A further revision of the processing conditions revealed that a sulfur-impregnated grinding stone had been used to polish the die. The chemical composition of such grinding stone matched that of the inclusions found in the subsurface of the failed component. Thus, searched causes of premature failure could be discussed on the lights of the present findings.

Study of active screen plasma processing conditions for carburising and nitriding austenitic stainless steel

Active screen (AS) is an advanced technology for plasma surface engineering, which offers some advantages over conventional direct current (DC) plasma treatments. Such surface defects and process instabilities as arcing, edge and hollow cathode effects can be minimised or completely eliminated by the AS technique, with consequent improvements in surface quality and material properties. However, the lack of information and thorough understanding of the process mechanisms generate scepticism in industrial practitioners. In this project, AISI 316 specimens were plasma carburised and plasma nitrided at low temperature in AS and DC furnaces, and the treated samples were comparatively analysed. Two diagnostic techniques were used to study the plasma: optical fibre assisted optical emission spectroscopy, and a planar electrostatic probe. Optimum windows of treatment conditions for AS plasma nitriding and AS plasma carburising of austenitic stainless steel were identified and some evidence was obtained on the working principles of AS furnaces. These include the sputtering of material from the cathodic mesh and its deposition on the worktable, the generation of additional active species, and the electrostatic confinement of the plasma within the operative volume of the furnace.

A nitrocarburising and low-temperature chromising duplex surface treatment

A duplex surface treatment has been developed involving the pre-treatment of hardened and tempered AISI H13 chromium hot-work tool steel by a ferritic nitrocarburising process, and a subsequent treatment of the nitrocarburised surface by a low-temperature chromium thermo-reactive deposition process.  The process formed a thin and hard chromium carbonitride surface layer above a hardened diffusion zone, and the low processing temperature allowed the properties of the core material to be retained. It is expected this surface treatment will find application in the treatment  of tooling used for aluminium forming operations.

Nitrocarburising and low-temperature chromising duplex surface treatment

A new duplex surface engineering process has been developed that involves the deposition of chromium on ferritic nitrocarburised steel surfaces at low temperatures. This process formed a thin and hard chromium carbonitride surface layer and is to be applied to hardened tooling used in metal forming operations for improved wear performance and die life.

New insights into the mechanism of low-temperature active-screen plasma nitriding of austenitic stainless steel

Low-temperature active-screen plasma nitriding is an effective surface engineering technology to improve the wear and corrosion resistance of austenitic stainless steel through the formation of expanded austenite. The material sputtered from the active screen and redeposited on the specimens has been suggested to play an important role in the nitriding mechanism involved. This paper reports a patterned deposition layer, which is in correlation with the grain orientation of polycrystalline specimens. This has provided new insights into the nitriding mechanism. © 2012 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

On the fundamental mechanisms of active screen plasma nitriding

The nitriding mechanisms of conventional DC plasma treatments have been extensively studied and discussed, but no general agreement has been reached thus far. The sputtering and redeposition theory is among the most accepted ones but, even though this mechanism is feasible, its contribution to the nitriding effect is under question. Furthermore, the novel active screen plasma nitriding technique has been successful in treating samples left at floating potential, where sputtering can not be considered to play a major role. Therefore, it has been proposed that the material sputtered from the cathodic mesh of the active screen furnace (auxiliary cathode) and deposited onto the treated specimens is involved in the mass transfer of nitrogen. The contribution made by this transferred material is the focus of attention of the present study. The hardening effect on the treated specimens showed considerable correlation with the deposition layer, and the XRD analysis of this deposited material yielded possible FeN and FexN peaks. This finding supports the deposition of iron nitrides and their subsequent decomposition on the treated substrate as a mechanism of significance to the plasma nitriding treatments conducted in active screen experimental settings.

Synthesis of high surface area amorphous tin-zinc oxides by a sol-gel method

A new method to synthesize conducting oxide nanoparticles with low photocatalytic activity was investigated. Initially, the preparation of amorphous ZnO-SnO2 solid solution nanoparticles was studied using a sol-gel technique. It was found that X-ray amorphous nanopowders with low photocatalytic activity were produced when the precipitates were heat treated below 500 °C. However, FT-IR data showed that the sample may not be an oxide semiconductor. A mixture of ZnO and SnO2 crystalline nanoparticles was also produced at 800 °C and found to have much reduced photoactivity than commercial ZnO nanoparticles having a similar specific surface area.

Finite element simulations of the cyclic elastoplastic behaviour of copper thin films

A large-scale computational and statistical strategy is presented to investigate the development of plastic strain heterogeneities and plasticity induced roughness at the free surface in multicrystalline films subjected to cyclic loading conditions, based on continuum crystal plasticity theory. The distribution of plastic strain in the grains and its evolution during cyclic straining are computed using the finite element method in films with different ratios of in-plane grain size and thickness, and as a function of grain orientation (grains with a {1 1 1} or a {0 0 1} plane parallel to the free surface and random orientations). Computations are made for 10 different realizations of aggregates containing 50 grains and one large aggregate with 225 grains. It is shown that overall cyclic hardening is accompanied by a significant increase in strain dispersion. The case of free-standing films is also addressed for comparison. The overall surface roughness is shown to saturate within 10 to 15 cycles. Plasticity induced roughness is due to the higher deformation of {0 0 1} and random grains and due to the sinking or rising at some grain boundaries.

Corrosion properties of a RF-magnetron-sputtered TiN coating deposited on 316L stainless steel

The effect of rf-power in the range from 100 to 200 W on the electrochemical properties of TiN coatings deposited on 316L stainless steel was investigated by using various electrochemical techniques in a 3.5-wt\% NaCl solution. Surface analyses were also conducted to analyze the coating characteristics. X-ray diffraction (XRD) and atomic force microscopy (AFM) analyses confirmed that increasing the rf-power led to a preferred orientation of the TiN(200) microstructure and decreased the surface roughness. The potentiodynamic test results confirmed the passive behavior of all of the specimens with low passive current densities and demonstrated that the effective pitting resistance of the TiN coatings increased with increasing rf-power. The electrochemical impedance spectroscopy (EIS) tests showed that the TiN films deposited with high rf-power had excellent corrosion resistance during an immersion time of 720 h due to their high total resistance and low porosity.