Dynamic response times of electrorheological fluids in steady shear

Transient responses of electrorheological fluids to square-wave electric fields in steady shear are investigated by computational simulation method. The structure responses of the fluids to the field with high frequency are found to be very similar to that to the field with very low frequency or the sudden applied direct current field. The stress rise processes are also similar in both cases and can be described by an exponential expression. The characteristic time tau of the stress response is found to decrease with the increase of the shear rate (gamma) over dot and the area fraction of the particles phi(2). The relation between them can be roughly expressed as tau proportional to(gamma) over dot(-3/4)phi(2)(-3/2). The simulation results are compared with experimental measurements. The aggregation kinetics of the particles in steady shear is also discussed according to these results.

Influence of inherent structure shear stress of supercooled liquids on their shear moduli

Configurations of supercooled liquids residing in their local potential minimum (i.e. in their inherent structure, IS) were found to support a non-zero shear stress. This IS stress was attributed to the constraint to the energy minimization imposed by boundary conditions, which keep size and shape of the simulation cell fixed. In this paper we further investigate the influence of these boundary conditions on the IS stress. We investigate its importance for the computation of the low frequency shear modulus of a glass obtaining a consistent picture for the low- and high frequency shear moduli over the full temperature range. Hence, we find that the IS stress corresponds to a non-thermal contribution to the fluctuation term in the Born-Green expression. This leads to an unphysical divergence of the moduli in the low temperature limit if no proper correction for this term is applied. Furthermore, we clarify the IS stress dependence on the system size and put its origin on a more formal basis.