Optimization in the Technological Steps for the Fabrication of Large Area Micromirror Arrays

Micromirror arrays are a very strong candidate for future energy saving applications. Within this work, the fabrication process for these micromirror arrays has been optimized and some steps for the large area fabrication of micromirror modules were performed. At first the surface roughness of the insulation layer of silicon dioxide (SiO2) was investigated. This SiO2 thin layer was deposited on three different type of substrates i.e. silicon, glass and Polyethylene Naphthalate (PEN) substrates. The deposition techniques which has been used are Plasma Enhanced Chemical Vapor Deposition (PECVD), Physical Vapor Deposition (PVD) and Ion Beam Sputter Deposition (IBSD). The thickness of the SiO2 thin layer was kept constant at 150nm for each deposition process. The surface roughness was measured by Stylus Profilometry and Atomic Force Microscopy (AFM). It was found that the layer which was deposited by IBSD has got the minimum surface roughness value and the layer which was deposited by PECVD process has the highest surface roughness value. During the same investigation, the substrate temperature of PECVD was varied from 80° C to 300° C with the step size of 40° C and it was found that the surface roughness keeps on increasing as the substrate holder temperature increases in the PECVD process. A new insulation layer system was proposed to minimize the dielectric breakdown effect in insulation layer for micromirror arrays. The conventional bilayer system was replaced by five layer system but the total thickness of insulation layer remains the same. It was found that during the actuation of micromirror arrays structure, the dielectric breakdown effect was reduced considerably as compared to the bilayer system. In the second step the fabrication process of the micromirror arrays was successfully adapted and transferred from glass substrates to the flexible PEN substrates by optimizing the conventional process recipe. In the last section, a large module of micromirror arrays was fabricated by electrically interconnecting four 10cm×10cm micromirror modules on a glass pane having dimensions of 21cm×21cm.

Development of directly modulated high speed telecommunication lasers based on surface defined feedback gratings

High-speed semiconductor lasers are an integral part in the implemen- tation of high-bit-rate optical communications systems. They are com- pact, rugged, reliable, long-lived, and relatively inexpensive sources of coherent light. Due to the very low attenuation window that exists in the silica based optical fiber at 1.55 μm and the zero dispersion point at 1.3 μm, they have become the mainstay of optical fiber com- munication systems. For the fabrication of lasers with gratings such as, distributed bragg reflector or distributed feedback lasers, etching is the most critical step. Etching defines the lateral dimmensions of the structure which determines the performance of optoelectronic devices. In this thesis studies and experiments were carried out about the exist- ing etching processes for InP and a novel dry etching process was de- veloped. The newly developed process was based on Cl2/CH4/H2/Ar chemistry and resulted in very smooth surfaces and vertical side walls. With this process the grating definition was significantly improved as compared to other technological developments in the respective field. A surface defined grating definition approach is used in this thesis work which does not require any re-growth steps and makes the whole fabrication process simpler and cost effective. Moreover, this grating fabrication process is fully compatible with nano-imprint lithography and can be used for high throughput low-cost manufacturing. With usual etching techniques reported before it is not possible to etch very deep because of aspect ratio dependent etching phenomenon where with increasing etch depth the etch rate slows down resulting in non-vertical side walls and footing effects. Although with our de- veloped process quite vertical side walls were achieved but footing was still a problem. To overcome the challenges related to grating defini- tion and deep etching, a completely new three step gas chopping dry etching process was developed. This was the very first time that a time multiplexed etching process for an InP based material system was demonstrated. The developed gas chopping process showed extra ordinary results including high mask selectivity of 15, moderate etch- ing rate, very vertical side walls and a record high aspect ratio of 41. Both the developed etching processes are completely compatible with nano imprint lithography and can be used for low-cost high-throughput fabrication. A large number of broad area laser, ridge waveguide laser, distributed feedback laser, distributed bragg reflector laser and coupled cavity in- jection grating lasers were fabricated using the developed one step etch- ing process. Very extensive characterization was done to optimize all the important design and fabrication parameters. The devices devel- oped have shown excellent performance with a very high side mode suppression ratio of more than 52 dB, an output power of 17 mW per facet, high efficiency of 0.15 W/A, stable operation over temperature and injected currents and a threshold current as low as 30 mA for almost 1 mm long device. A record high modulation bandwidth of 15 GHz with electron-photon resonance and open eye diagrams for 10 Gbps data transmission were also shown.

Downscaling and Modeling the Effects of Climate Change on Hydrology and Water Resources in the Upper Blue Nile River Basin, Ethiopia

The Upper Blue Nile River Basin (UBNRB) located in the western part of Ethiopia, between 7° 45’ and 12° 45’N and 34° 05’ and 39° 45’E has a total area of 174962 km2 . More than 80% of the population in the basin is engaged in agricultural activities. Because of the particularly dry climate in the basin, likewise to most other regions of Ethiopia, the agricultural productivity depends to a very large extent on the occurrence of the seasonal rains. This situation makes agriculture highly vulnerable to the impact of potential climate hazards which are about to inflict Africa as a whole and Ethiopia in particular. To analyze these possible impacts of future climate change on the water resources in the UBNRB, in the first part of the thesis climate projection for precipitation, minimum and maximum temperatures in the basin, using downscaled predictors from three GCMs (ECHAM5, GFDL21 and CSIRO-MK3) under SRES scenarios A1B and A2 have been carried out. The two statistical downscaling models used are SDSM and LARS-WG, whereby SDSM is used to downscale ECHAM5-predictors alone and LARS-WG is applied in both mono-model mode with predictors from ECHAM5 and in multi-model mode with combined predictors from ECHAM5, GFDL21 and CSIRO-MK3. For the calibration/validation of the downscaled models, observed as well as NCEP climate data in the 1970 - 2000 reference period is used. The future projections are made for two time periods; 2046-2065 (2050s) and 2081-2100 (2090s). For the 2050s future time period the downscaled climate predictions indicate rise of 0.6°C to 2.7°C for the seasonal maximum temperatures Tmax, and of 0.5°C to 2.44°C for the minimum temperatures Tmin. Similarly, during the 2090s the seasonal Tmax increases by 0.9°C to 4.63°C and Tmin by 1°C to 4.6°C, whereby these increases are generally higher for the A2 than for the A1B scenario. For most sub-basins of the UBNRB, the predicted changes of Tmin are larger than those of Tmax. Meanwhile, for the precipitation, both downscaling tools predict large changes which, depending on the GCM employed, are such that the spring and summer seasons will be experiencing decreases between -36% to 1% and the autumn and winter seasons an increase of -8% to 126% for the two future time periods, regardless of the SRES scenario used. In the second part of the thesis the semi-distributed, physically based hydrologic model, SWAT (Soil Water Assessment Tool), is used to evaluate the impacts of the above-predicted future climate change on the hydrology and water resources of the UBNRB. Hereby the downscaled future predictors are used as input in the SWAT model to predict streamflow of the Upper Blue Nile as well as other relevant water resources parameter in the basin. Calibration and validation of the streamflow model is done again on 1970-2000 measured discharge at the outlet gage station Eldiem, whereby the most sensitive out the numerous “tuneable” calibration parameters in SWAT have been selected by means of a sophisticated sensitivity analysis. Consequently, a good calibration/validation model performance with a high NSE-coefficient of 0.89 is obtained. The results of the future simulations of streamflow in the basin, using both SDSM- and LARS-WG downscaled output in SWAT reveal a decline of -10% to -61% of the future Blue Nile streamflow, And, expectedly, these obviously adverse effects on the future UBNRB-water availibiliy are more exacerbated for the 2090’s than for the 2050’s, regardless of the SRES.