Systematic multi-configuration calculations on structures and properties of complex atoms

Die relativistische Multikonfigurations Dirac-Fock (MCDF) Methode ist gegenwärtig eines der am häufigsten benutzten Verfahren zur Berechnung der elektronischen Struktur und der Eigenschaften freier Atome. In diesem Verfahren werden die Wellenfunktionen ausgewählter atomarer Zustände als eine Linearkombination von sogenannten Konfigurationszuständen (CSF - Configuration State Functions) konstruiert, die in einem Teilraum des N-Elektronen Hilbert-Raumes eine (Vielteilchen-)Basis aufspannen. Die konkrete Konstruktion dieser Basis entscheidet letzlich über die Güte der Wellenfunktionen, die üblicherweise mit Hilfe einer Variation des Erwartungswertes zum no-pair Dirac-Coulomb Hamiltonoperators gewonnen werden. Mit Hilfe von MCDF Wellenfunktionen können die dominanten relativistischen und Korrelationseffekte in freien Atomen allgemein recht gut erfaßt und verstanden werden. Außer der instantanen Coulombabstoßung zwischen allen Elektronenpaaren werden dabei auch die relativistischen Korrekturen zur Elektron-Elektron Wechselwirkung, d.h. die magnetischen und Retardierungsbeiträge in der Wechselwirkung der Elektronen untereinander, die Ankopplung der Elektronen an das Strahlungsfeld sowie der Einfluß eines ausgedehnten Kernmodells erfaßt. Im Vergleich mit früheren MCDF Rechnungen werden in den in dieser Arbeit diskutierten Fallstudien Wellenfunktionsentwicklungen verwendet, die um 1-2 Größenordnungen aufwendiger sind und daher systematische Untersuchungen inzwischen auch an Atomen mit offenen d- und f-Schalen erlauben. Eine spontane Emission oder Absorption von Photonen kann bei freien Atomen theoretisch am einfachsten mit Hilfe von Übergangswahrscheinlichkeiten erfaßt werden. Solche Daten werden heute in vielen Forschungsbereichen benötigt, wobei neben den traditionellen Gebieten der Fusionsforschung und Astrophysik zunehmend auch neue Forschungsrichtungen (z.B. Nanostrukturforschung und Röntgenlithographie) zunehmend ins Blickfeld rücken. Um die Zuverlässigkeit unserer theoretischen Vorhersagen zu erhöhen, wurde in dieser Arbeit insbesondere die Relaxation der gebundenen Elektronendichte, die rechentechnisch einen deutlich größeren Aufwand erfordert, detailliert untersucht. Eine Berücksichtigung dieser Relaxationseffekte führt oftmals auch zu einer deutlich besseren Übereinstimmung mit experimentellen Werten, insbesondere für dn=1 Übergänge sowie für schwache und Interkombinationslinien, die innerhalb einer Hauptschale (dn=0) vorkommen. Unsere in den vergangenen Jahren verbesserten Rechnungen zu den Wellenfunktionen und Übergangswahrscheinlichkeiten zeigen deutlich den Fortschritt bei der Behandlung komplexer Atome. Gleichzeitig kann dieses neue Herangehen künftig aber auch auf (i) kompliziertere Schalensstrukturen, (ii) die Untersuchung von Zwei-Elektronen-ein-Photon (TEOP) Übergängen sowie (iii) auf eine Reihe weiterer atomarer Eigenschaften übertragen werden, die bekanntermaßen empflindlich von der Relaxation der Elektronendichte abhängen. Dies sind bspw. Augerzerfälle, die atomare Photoionisation oder auch strahlende und dielektronische Rekombinationsprozesse, die theoretisch bisher nur selten überhaupt in der Dirac-Fock Näherung betrachtet wurden.

Molecular Beam Epitaxial Growth of III-V Semiconductor Nanostructures on Silicon Substrates

The main focus and concerns of this PhD thesis is the growth of III-V semiconductor nanostructures (Quantum dots (QDs) and quantum dashes) on silicon substrates using molecular beam epitaxy (MBE) technique. The investigation of influence of the major growth parameters on their basic properties (density, geometry, composition, size etc.) and the systematic characterization of their structural and optical properties are the core of the research work. The monolithic integration of III-V optoelectronic devices with silicon electronic circuits could bring enormous prospect for the existing semiconductor technology. Our challenging approach is to combine the superior passive optical properties of silicon with the superior optical emission properties of III-V material by reducing the amount of III-V materials to the very limit of the active region. Different heteroepitaxial integration approaches have been investigated to overcome the materials issues between III-V and Si. However, this include the self-assembled growth of InAs and InGaAs QDs in silicon and GaAx matrices directly on flat silicon substrate, sitecontrolled growth of (GaAs/In0,15Ga0,85As/GaAs) QDs on pre-patterned Si substrate and the direct growth of GaP on Si using migration enhanced epitaxy (MEE) and MBE growth modes. An efficient ex-situ-buffered HF (BHF) and in-situ surface cleaning sequence based on atomic hydrogen (AH) cleaning at 500 °C combined with thermal oxide desorption within a temperature range of 700-900 °C has been established. The removal of oxide desorption was confirmed by semicircular streaky reflection high energy electron diffraction (RHEED) patterns indicating a 2D smooth surface construction prior to the MBE growth. The evolution of size, density and shape of the QDs are ex-situ characterized by atomic-force microscopy (AFM) and transmission electron microscopy (TEM). The InAs QDs density is strongly increased from 108 to 1011 cm-2 at V/III ratios in the range of 15-35 (beam equivalent pressure values). InAs QD formations are not observed at temperatures of 500 °C and above. Growth experiments on (111) substrates show orientation dependent QD formation behaviour. A significant shape and size transition with elongated InAs quantum dots and dashes has been observed on (111) orientation and at higher Indium-growth rate of 0.3 ML/s. The 2D strain mapping derived from high-resolution TEM of InAs QDs embedded in silicon matrix confirmed semi-coherent and fully relaxed QDs embedded in defectfree silicon matrix. The strain relaxation is released by dislocation loops exclusively localized along the InAs/Si interfaces and partial dislocations with stacking faults inside the InAs clusters. The site controlled growth of GaAs/In0,15Ga0,85As/GaAs nanostructures has been demonstrated for the first time with 1 μm spacing and very low nominal deposition thicknesses, directly on pre-patterned Si without the use of SiO2 mask. Thin planar GaP layer was successfully grown through migration enhanced epitaxy (MEE) to initiate a planar GaP wetting layer at the polar/non-polar interface, which work as a virtual GaP substrate, for the GaP-MBE subsequently growth on the GaP-MEE layer with total thickness of 50 nm. The best root mean square (RMS) roughness value was as good as 1.3 nm. However, these results are highly encouraging for the realization of III-V optical devices on silicon for potential applications.

Optimization of the Mechanical and Optical Properties of Tunable Optical Sensor Arrays (TOSA) for a Nanospectrometer in the Visible and Near Infrared Spectral Range

Tunable Optical Sensor Arrays (TOSA) based on Fabry-Pérot (FP) filters, for high quality spectroscopic applications in the visible and near infrared spectral range are investigated within this work. The optical performance of the FP filters is improved by using ion beam sputtered niobium pentoxide (Nb2O5) and silicon dioxide (SiO2) Distributed Bragg Reflectors (DBRs) as mirrors. Due to their high refractive index contrast, only a few alternating pairs of Nb2O5 and SiO2 films can achieve DBRs with high reflectivity in a wide spectral range, while ion beam sputter deposition (IBSD) is utilized due to its ability to produce films with high optical purity. However, IBSD films are highly stressed; resulting in stress induced mirror curvature and suspension bending in the free standing filter suspensions of the MEMS (Micro-Electro-Mechanical Systems) FP filters. Stress induced mirror curvature results in filter transmission line degradation, while suspension bending results in high required filter tuning voltages. Moreover, stress induced suspension bending results in higher order mode filter operation which in turn degrades the optical resolution of the filter. Therefore, the deposition process is optimized to achieve both near zero absorption and low residual stress. High energy ion bombardment during film deposition is utilized to reduce the film density, and hence the film compressive stress. Utilizing this technique, the compressive stress of Nb2O5 is reduced by ~43%, while that for SiO2 is reduced by ~40%. Filters fabricated with stress reduced films show curvatures as low as 100 nm for 70 μm mirrors. To reduce the stress induced bending in the free standing filter suspensions, a stress optimized multi-layer suspension design is presented; with a tensile stressed metal sandwiched between two compressively stressed films. The stress in Physical Vapor Deposited (PVD) metals is therefore characterized for use as filter top-electrode and stress compensating layer. Surface micromachining is used to fabricate tunable FP filters in the visible spectral range using the above mentioned design. The upward bending of the suspensions is reduced from several micrometers to less than 100 nm and 250 nm for two different suspension layer combinations. Mechanical tuning of up to 188 nm is obtained by applying 40 V of actuation voltage. Alternatively, a filter line with transmission of 65.5%, Full Width at Half Maximum (FWHM) of 10.5 nm and a stopband of 170 nm (at an output wavelength of 594 nm) is achieved. Numerical model simulations are also performed to study the validity of the stress optimized suspension design for the near infrared spectral range, wherein membrane displacement and suspension deformation due to material residual stress is studied. Two bandpass filter designs based on quarter-wave and non-quarter-wave layers are presented as integral components of the TOSA. With a filter passband of 135 nm and a broad stopband of over 650 nm, high average filter transmission of 88% is achieved inside the passband, while maximum filter transmission of less than 1.6% outside the passband is achieved.

Moisture-dependent physical properties of locust bean (Parkia biglobosa) seeds

Seed moisture content is significant in the handling and processing of seeds. This work therefore determined the physical properties of Locust bean seeds as functions of seed moisture content in the moisture range of 5.9 – 28.2% dry basis. Mohsenin, Stepanoff and ASAE standard methods were used in determining the properties. Increases in seed dimensions vitz length = 10.2±1.0 – 11.3±0.9 mm; width = 8.5±0.8 – 9.1±0.6 mm; surface area = 191.2±24.6 – 208.3±26.3 mm2 ; geometric mean diameter = 7.78±0.49 – 8.12±0.03 and arithmetic mean diameter = 8.06±0.56 – 8.34±0.49 mm were recorded. Seed thickness = 5.49±0.43 – 5.26±0.62 mm; sphericity = 0.75±0.04 – 0.71±0.03; true density = 1251.96±55.5 - 1222±62.16 kgm-3 and porosity = 48.4±2.14 – 41.9±3.78 decreased. Static coefficient of friction increased on plywood (0.5±0.02 – 0.6±0.01), glass (0.4±0.05 – 0.5±0.01) and decreased on aluminium (0.5±0.02 – 0.5±0.04). A data of the physical properties of Locust bean; Parkia biglobosa was developed. This is useful for the design and development of equipment necessary for its handling and processing.