Degrees of Free Word-Order and Freely Rewriting Restarting Automata

In natural languages with a high degree of word-order freedom syntactic phenomena like dependencies (subordinations) or valencies do not depend on the word-order (or on the individual positions of the individual words). This means that some permutations of sentences of these languages are in some (important) sense syntactically equivalent. Here we study this phenomenon in a formal way. Various types of j-monotonicity for restarting automata can serve as parameters for the degree of word-order freedom and for the complexity of word-order in sentences (languages). Here we combine two types of parameters on computations of restarting automata: 1. the degree of j-monotonicity, and 2. the number of rewrites per cycle. We study these notions formally in order to obtain an adequate tool for modelling and comparing formal descriptions of (natural) languages with different degrees of word-order freedom and word-order complexity.

Lithography-free micro- and nanostructuring based on conventional plasma etching

In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, which must overcome the diffraction limit. Therefore, new photolithography techniques have been recently developed, but they are rather expensive and restricted to plane surfaces. Recently a new route has been presented - so-called Bottom-Up approach - where from a single atom or a molecule it is possible to obtain functional devices. This creates new field - Nanotechnology - where one speaks about structures with dimensions 1 - 100 nm, and which has the possibility to replace the conventional photolithography concerning its integral part - the self-assembly. However, this technique requires additional and special equipment and therefore is not yet widely applicable. This work presents a general scheme for the fabrication of silicon and silicon dioxide structures with lateral dimensions of less than 100 nm that avoids high-resolution photolithography processes. For the self-aligned formation of extremely small openings in silicon dioxide layers at in depth sharpened surface structures, the angle dependent etching rate distribution of silicon dioxide against plasma etching with a fluorocarbon gas (CHF3) was exploited. Subsequent anisotropic plasma etching of the silicon substrate material through the perforated silicon dioxide masking layer results in high aspect ratio trenches of approximately the same lateral dimensions. The latter can be reduced and precisely adjusted between 0 and 200 nm by thermal oxidation of the silicon structures owing to the volume expansion of silicon during the oxidation. On the basis of this a technology for the fabrication of SNOM calibration standards is presented. Additionally so-formed trenches were used as a template for CVD deposition of diamond resulting in high aspect ratio diamond knife. A lithography-free method for production of periodic and nonperiodic surface structures using the angular dependence of the etching rate is also presented. It combines the self-assembly of masking particles with the conventional plasma etching techniques known from microelectromechanical system technology. The method is generally applicable to bulk as well as layered materials. In this work, layers of glass spheres of different diameters were assembled on the sample surface forming a mask against plasma etching. Silicon surface structures with periodicity of 500 nm and feature dimensions of 20 nm were produced in this way. Thermal oxidation of the so structured silicon substrate offers the capability to vary the fill factor of the periodic structure owing to the volume expansion during oxidation but also to define silicon dioxide surface structures by selective plasma etching. Similar structures can be simply obtained by structuring silicon dioxide layers on silicon. The method offers a simple route for bridging the Nano- and Microtechnology and moreover, an uncomplicated way for photonic crystal fabrication.

Computation of locally free class groups

We show that the locally free class group of an order in a semisimple algebra over a number field is isomorphic to a certain ray class group. This description is then used to present an algorithm that computes the locally free class group. The algorithm is implemented in MAGMA for the case where the algebra is a group ring over the rational numbers.

On Alternating Non-Context-Free Grammars

We study several extensions of the notion of alternation from context-free grammars to context-sensitive and arbitrary phrase-structure grammars. Thereby new grammatical characterizations are obtained for the class of languages that are accepted by alternating pushdown automata.

Computing Generators of Free Modules over Orders in Group Algebras

Let E be a number field and G be a finite group. Let A be any O_E-order of full rank in the group algebra E[G] and X be a (left) A-lattice. We give a necessary and sufficient condition for X to be free of given rank d over A. In the case that the Wedderburn decomposition E[G] \cong \oplus_xM_x is explicitly computable and each M_x is in fact a matrix ring over a field, this leads to an algorithm that either gives elements \alpha_1,...,\alpha_d \in X such that X = A\alpha_1 \oplus ... \oplusA\alpha_d or determines that no such elements exist. Let L/K be a finite Galois extension of number fields with Galois group G such that E is a subfield of K and put d = [K : E]. The algorithm can be applied to certain Galois modules that arise naturally in this situation. For example, one can take X to be O_L, the ring of algebraic integers of L, and A to be the associated order A(E[G];O_L) \subseteq E[G]. The application of the algorithm to this special situation is implemented in Magma under certain extra hypotheses when K = E = \IQ.

Hyperfine structure and isotopic shift of the n^2 P_J levels (n = 7-10) of ^203,205 TI measured by Doppler-free two-photon spectroscopy

Using Doppler-free two-photon absorption spectroscopy, we have measured hyperfine splitting constants as well as isotopic level shifts of the 6s^2 np ^2 P_l/2,3/2 states in (n=7-10) in ^203 TI and ^205 TI. Calculations for hyperfine constants and electron density at the nucleus have been performed by the Dirac-Fock method. The experimental results are compared with these calculations as well as with the predictions of the semiempirical theory.

Dress- and Auto- Makers in the “Free Trade” Arena

Even though there have been many studies on the impact of trade liberalisation on labour standards, most of the studies are at national level, and there is a lack of research at industry level. This paper examines the impact of free trade on labour standards in capital- and labour-intensive industries in a developing country. For empirical findings, I take the case of the garment industry, representing labour-intensive industry, and automotive industry, representing capital-intensive industry, in Indonesia in the face of ASEAN Free Trade Area (AFTA). Since the garment industry is a women-dominated industry, while the automotive industry is a men-dominated industry, this paper also employs a feminist perspective. As such, this paper also investigates whether free trade equally affects men and women workers. Besides free trade, other independent variables are also taken into account. Employing quantitative and qualitative methods, empirical evidence shows that there is an indication that free trade has a negative relationship with labour standards in the garment industry, whereas a positive relationships with labour standards in the automotive industry. This implies that free trade might result in decreasing labour standards in labour-intensive industry, while increasing standards in capital-intensive industry. It can also be inferred that free trade unequally affect men and women workers, in that women workers bear the brunt of free trade. The results also show that other internal and external independent variables are indicated to have relationships with labour standards in the garment and automotive industries. Therefore, these variables need to be considered in examining the extent of the impact of free trade on labour standards in labour- and capital-intensive industries.

Akzeptanz und Motivation beim selbstregulierten Lernen unter Einsatz von neuen Medien in der berufsbegleitenden Weiterbildung

Das Ziel der Dissertation war die Untersuchung des Computereinsatzes zur Lern- und Betreuungsunterstützung beim selbstgesteuerten Lernen in der Weiterbildung. In einem bisher konventionell durchgeführten Selbstlernkurs eines berufsbegleitenden Studiengangs, der an das Datenmanagement der Bürodatenverarbeitung heranführt, wurden die Kursunterlagen digitalisiert, die Betreuung auf eine online-basierte Lernbegleitung umgestellt und ein auf die neuen Lernmedien abgestimmtes Lernkonzept entwickelt. Dieses neue Lernkonzept wurde hinsichtlich der Motivation und der Akzeptanz von digitalen Lernmedien evaluiert. Die Evaluation bestand aus zwei Teilen: 1. eine formative, den Entwicklungsprozess begleitende Evaluation zur Optimierung der entwickelten Lernsoftware und des eingeführten Lernkonzeptes, 2. eine sowohl qualitative wie quantitative summative Evaluation der Entwicklungen. Ein zentraler Aspekt der Untersuchung war die freie Wahl der Lernmedien (multimediale Lernsoftware oder konventionelles Begleitbuch) und der Kommunikationsmedien (online-basierte Lernplattform oder die bisher genutzten Kommunikationskanäle: E-Mail, Telefon und Präsenztreffen). Diese Zweigleisigkeit erlaubte eine differenzierte Gegenüberstellung von konventionellen und innovativen Lernarrangements. Die Verbindung von qualitativen und quantitativen Vorgehensweisen, auf Grund derer die subjektiven Einstellungen der Probanden in das Zentrum der Betrachtung rückten, ließen einen Blickwinkel auf den Nutzen und die Wirkung der Neuen Medien in Lernprozessen zu, der es erlaubte einige in der Literatur als gängig angesehene Interpretationen in Frage zu stellen und neu zu diskutieren. So konnten durch eine Kategorisierung des Teilnehmerverhaltens nach online-typisch und nicht online-typisch die Ursache-Wirkungs-Beziehungen der in vielen Untersuchungen angeführten Störungen in Online-Seminaren verdeutlicht werden. In den untersuchten Kursen zeigte sich beispielsweise keine Abhängigkeit der Drop-out-Quote von den Lern- und Betreuungsformen und dass diese Quote mit dem neuen Lernkonzept nur geringfügig beeinflusst werden konnte. Die freie Wahl der Lernmedien führte zu einer gezielten Nutzung der multimedialen Lernsoftware, wodurch die Akzeptanz dieses Lernmedium stieg. Dagegen war die Akzeptanz der Lernenden gegenüber der Lernbegleitung mittels einer Online-Lernplattform von hoch bis sehr niedrig breit gestreut. Unabhängig davon reichte in allen Kursdurchgängen die Online-Betreuung nicht aus, so dass Präsenztreffen erbeten wurde. Hinsichtlich der Motivation war die Wirkung der digitalen Medien niedriger als erwartet. Insgesamt bieten die Ergebnisse Empfehlungen für die Planung und Durchführung von computerunterstützten, online-begleiteten Kursen.