Biological Photonic Crystals: Diatoms

The aim of this work was to produce a variety of fluorescent diatom cell wall material as a basis for spectroscopic investigations of the influence of the photonic structure on the emission of an incorporated laser dye. This goal was achieved by the method of in vivo-fluorochromation, in which the fluorescence dyes are incorporated by the diatom cells during cell wall formation. Several fluorescent dyes (mostly rhodamines) known as strong laser dyes, were tested for a possible application within this method. The results of this work show that half of the tested rhodamines can be applied for an in vivo-fluorochromation of diatom cells. For a successful incorporation into the diatom cell wall, a relatively low toxicity to diatom cells is necessary. Replacement of the carbon acid function at the carboxyphenyl ring of the rhodamine by a methyl or ethylester function showed to convert a rhodamine of relatively low toxicity to a rhodamine leading to severe lethal effects within the cells. In contrast to their carbon acid forms, which posses a net neutral charge of the molecule, rhodamine esters exhibit a net positive charge. The enhanced toxicological effects seem to be due to an increased accumulation of positive charged rhodamines within the mitochondria, an increased hydrophobicity due to the attachment of an alkyl substituent, an increased retention time of the dyes within the mitochondria and a therefore stronger negative effect on the mitochondrial membrane bound energy processes of the diatom cell. Therefore rhodamines with a positive net charge deriving from a methyl or ethylester function at the carboxy phenyl ring instead of a carbon acid substituent showed not to be suitable for long-term investigations/ biomineralization studies of diatoms. Investigations performed on diatom species of different orders showed that rhodamine 19, rhodamine B, and rhodamine 101 can presumably be successfully applied for in vivo-fluorochromation to all diatom species. The results obtained here can help to find further laser dyes for an in vivo-fluorochromation of diatom cells and therefore for the production of fluorescent nanostructural elements for a detailed optical investigation of the diatom cell wall. First optical measurements performed on in vivo-fluorochromated cell walls did not give any hints concerning the photonic structure of the diatom cell. Cell wall parts with different nanostructural elements were investigated and by comparison of the obtained fluorescence emission spectra, no special features that might derive from photonic structural effects could be observed. Results concerning the concentration dependent shifts within the emission spectra, as well as the decrease of fluorescence intensity of the stained cell wall structures with increasing dye concentration, depict that several effects occurring by interaction of the molecules within the cell wall can have an impact on the technical application of fluorescent cell walls. It can be assumed that the investigation of the photonic crystal behaviour and the possibility to achieve laser action within the diatom cell wall can be hampered by molecular interactions. The results give hints to prevent such obstacles. Comparison of the recent findings and state of the art of in vivo-fluorochromation of diatom cell wall material, make clear that the here presented results are of importance and can offer a considerable contribution to the development and establishment of new biosilification markers, for diatoms as well as for other biosilifying organisms.

Lithography-free micro- and nanostructuring based on conventional plasma etching

In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, which must overcome the diffraction limit. Therefore, new photolithography techniques have been recently developed, but they are rather expensive and restricted to plane surfaces. Recently a new route has been presented - so-called Bottom-Up approach - where from a single atom or a molecule it is possible to obtain functional devices. This creates new field - Nanotechnology - where one speaks about structures with dimensions 1 - 100 nm, and which has the possibility to replace the conventional photolithography concerning its integral part - the self-assembly. However, this technique requires additional and special equipment and therefore is not yet widely applicable. This work presents a general scheme for the fabrication of silicon and silicon dioxide structures with lateral dimensions of less than 100 nm that avoids high-resolution photolithography processes. For the self-aligned formation of extremely small openings in silicon dioxide layers at in depth sharpened surface structures, the angle dependent etching rate distribution of silicon dioxide against plasma etching with a fluorocarbon gas (CHF3) was exploited. Subsequent anisotropic plasma etching of the silicon substrate material through the perforated silicon dioxide masking layer results in high aspect ratio trenches of approximately the same lateral dimensions. The latter can be reduced and precisely adjusted between 0 and 200 nm by thermal oxidation of the silicon structures owing to the volume expansion of silicon during the oxidation. On the basis of this a technology for the fabrication of SNOM calibration standards is presented. Additionally so-formed trenches were used as a template for CVD deposition of diamond resulting in high aspect ratio diamond knife. A lithography-free method for production of periodic and nonperiodic surface structures using the angular dependence of the etching rate is also presented. It combines the self-assembly of masking particles with the conventional plasma etching techniques known from microelectromechanical system technology. The method is generally applicable to bulk as well as layered materials. In this work, layers of glass spheres of different diameters were assembled on the sample surface forming a mask against plasma etching. Silicon surface structures with periodicity of 500 nm and feature dimensions of 20 nm were produced in this way. Thermal oxidation of the so structured silicon substrate offers the capability to vary the fill factor of the periodic structure owing to the volume expansion during oxidation but also to define silicon dioxide surface structures by selective plasma etching. Similar structures can be simply obtained by structuring silicon dioxide layers on silicon. The method offers a simple route for bridging the Nano- and Microtechnology and moreover, an uncomplicated way for photonic crystal fabrication.