Lithography-free micro- and nanostructuring based on conventional plasma etching

In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, which must overcome the diffraction limit. Therefore, new photolithography techniques have been recently developed, but they are rather expensive and restricted to plane surfaces. Recently a new route has been presented - so-called Bottom-Up approach - where from a single atom or a molecule it is possible to obtain functional devices. This creates new field - Nanotechnology - where one speaks about structures with dimensions 1 - 100 nm, and which has the possibility to replace the conventional photolithography concerning its integral part - the self-assembly. However, this technique requires additional and special equipment and therefore is not yet widely applicable. This work presents a general scheme for the fabrication of silicon and silicon dioxide structures with lateral dimensions of less than 100 nm that avoids high-resolution photolithography processes. For the self-aligned formation of extremely small openings in silicon dioxide layers at in depth sharpened surface structures, the angle dependent etching rate distribution of silicon dioxide against plasma etching with a fluorocarbon gas (CHF3) was exploited. Subsequent anisotropic plasma etching of the silicon substrate material through the perforated silicon dioxide masking layer results in high aspect ratio trenches of approximately the same lateral dimensions. The latter can be reduced and precisely adjusted between 0 and 200 nm by thermal oxidation of the silicon structures owing to the volume expansion of silicon during the oxidation. On the basis of this a technology for the fabrication of SNOM calibration standards is presented. Additionally so-formed trenches were used as a template for CVD deposition of diamond resulting in high aspect ratio diamond knife. A lithography-free method for production of periodic and nonperiodic surface structures using the angular dependence of the etching rate is also presented. It combines the self-assembly of masking particles with the conventional plasma etching techniques known from microelectromechanical system technology. The method is generally applicable to bulk as well as layered materials. In this work, layers of glass spheres of different diameters were assembled on the sample surface forming a mask against plasma etching. Silicon surface structures with periodicity of 500 nm and feature dimensions of 20 nm were produced in this way. Thermal oxidation of the so structured silicon substrate offers the capability to vary the fill factor of the periodic structure owing to the volume expansion during oxidation but also to define silicon dioxide surface structures by selective plasma etching. Similar structures can be simply obtained by structuring silicon dioxide layers on silicon. The method offers a simple route for bridging the Nano- and Microtechnology and moreover, an uncomplicated way for photonic crystal fabrication.

Konzeption von Entwicklungspfaden für Zulieferparks in der Automobilindustrie

Die Automobilindustrie reagiert mit Modularisierungsstrategien auf die zunehmende Produktkomplexität, getrieben durch die wachsenden Individualisierungsanforde-rungen auf der Kundenseite und der Modellpolitik mit neuen Fahrzeuganläufen. Die Hersteller verlagern die Materialbereitstellungskomplexität durch Outsourcing an die nächste Zulieferebene, den First Tier Suppliern, die seit Beginn der 90er Jahre zunehmend in Zulieferparks in unmittelbarer Werknähe integriert werden. Typische Merkmale eines klassischen Zulieferparks sind: Bereitstellung einer Halleninfrastruktur mit Infrastrukturdienstleistungen, Anlieferung der Teileumfänge im JIS-Verfahren (Just-in-Sequence = reihenfolgegenaue Synchronisation), lokale Wertschöpfung (Vormontagen, Sequenzierung) des Zulieferers, Vertragsbindung der First Tier Zulieferer für die Dauer eines Produktlebenszyklus und Einbindung eines Logistikdienstleisters. Teilweise werden zur Finanzierung Förderprojekte des öffent-lichen Sektors initiiert. Bisher fehlte eine wissenschaftliche Bearbeitung dieses Themas "Zulieferpark". In der Arbeit werden die in Europa entstandenen Zulieferparks näher untersucht, um Vor- und Nachteile dieses Logistikkonzeptes zu dokumentieren und Entwicklungs-trends aufzuzeigen. Abgeleitet aus diesen Erkenntnissen werden Optimierungs-ansätze aufgezeigt und konkrete Entwicklungspfade zur Verbesserung der Chancen-Risikoposition der Hauptakteure Automobilhersteller, Zulieferer und Logistikdienst-leister beschrieben. Die Arbeit gliedert sich in vier Haupteile, einer differenzierten Beschreibung der Ausgangssituation und den Entwicklungstrends in der Automobilindustrie, dem Vorgehensmodell, der Dokumentation der Analyseergebnisse und der Bewertung von Zulieferparkmodellen. Im Rahmen der Ergebnisdokumentation des Analyseteils werden vier Zulieferparkmodelle in detaillierten Fallstudien anschaulich dargestellt. Zur Erarbeitung der Analyseergebnisse wurde eine Befragung der Hauptakteure mittels strukturierten Fragebögen durchgeführt. Zur Erhebung von Branchentrends und zur relativen Bewertung der Parkmodelle wurden zusätzlich Experten befragt. Zur Segmentierung der Zulieferparklandschaft wurde die Methode der Netzwerk-analyse eingesetzt. Die relative Bewertung der Nutzenposition basiert auf der Nutzwertanalyse. Als Ergebnisse der Arbeit liegen vor: · Umfassende Analyse der Zulieferparklandschaft in Europa, · Segmentierung der Parks in Zulieferparkmodelle, Optimierungsansätze zur Verbesserung einer Win-Win-Situation der beteiligten Hauptakteure, · Relative Nutzenbewertung der Zulieferparkmodelle, · Entwicklungspfade für klassische Zulieferparks.

Farmers’ perspectives with regard to arable crop production and deagrarianisation: an analysis of Nkonkobe Municipality, South Africa

This exploratory study evaluated biophysical, cultural and socio-economic factors affecting crop production and land utilisation in the Nkonkobe Municipality, South Africa. The study sought to establish what farmers in the area perceive as serious threats to crop production, drivers for land abandonment, and how best current agricultural production could be intensified. The farmers’ perspectives were assessed through interviews using semi-structured and open-ended questionnaires. The results of the study revealed declining crop productivity and increase in land abandonment in the Municipality. The biophysical drivers of land abandonment were low and erratic rainfall and land degradation while the socio-economic drivers were labour shortages due to old age and youth movement to cities, lack of farming equipment and security concerns. The most abandoned crops were maize, sorghum and wheat. This trend was attributed to the labour intensiveness of cereal production and a shift in dietary preference to purchased rice. These findings should be factored in any programmes that seek to increase land utilisation and crop productivity in the Municipality.