Restarting automata with restricted utilization of auxiliary symbols

The restarting automaton is a restricted model of computation that was introduced by Jancar et al. to model the so-called analysis by reduction, which is a technique used in linguistics to analyze sentences of natural languages. The most general models of restarting automata make use of auxiliary symbols in their rewrite operations, although this ability does not directly correspond to any aspect of the analysis by reduction. Here we put restrictions on the way in which restarting automata use auxiliary symbols, and we investigate the influence of these restrictions on their expressive power. In fact, we consider two types of restrictions. First, we consider the number of auxiliary symbols in the tape alphabet of a restarting automaton as a measure of its descriptional complexity. Secondly, we consider the number of occurrences of auxiliary symbols on the tape as a dynamic complexity measure. We establish some lower and upper bounds with respect to these complexity measures concerning the ability of restarting automata to recognize the (deterministic) context-free languages and some of their subclasses.

Lithography-free micro- and nanostructuring based on conventional plasma etching

In now-a-days semiconductor and MEMS technologies the photolithography is the working horse for fabrication of functional devices. The conventional way (so called Top-Down approach) of microstructuring starts with photolithography, followed by patterning the structures using etching, especially dry etching. The requirements for smaller and hence faster devices lead to decrease of the feature size to the range of several nanometers. However, the production of devices in this scale range needs photolithography equipment, which must overcome the diffraction limit. Therefore, new photolithography techniques have been recently developed, but they are rather expensive and restricted to plane surfaces. Recently a new route has been presented - so-called Bottom-Up approach - where from a single atom or a molecule it is possible to obtain functional devices. This creates new field - Nanotechnology - where one speaks about structures with dimensions 1 - 100 nm, and which has the possibility to replace the conventional photolithography concerning its integral part - the self-assembly. However, this technique requires additional and special equipment and therefore is not yet widely applicable. This work presents a general scheme for the fabrication of silicon and silicon dioxide structures with lateral dimensions of less than 100 nm that avoids high-resolution photolithography processes. For the self-aligned formation of extremely small openings in silicon dioxide layers at in depth sharpened surface structures, the angle dependent etching rate distribution of silicon dioxide against plasma etching with a fluorocarbon gas (CHF3) was exploited. Subsequent anisotropic plasma etching of the silicon substrate material through the perforated silicon dioxide masking layer results in high aspect ratio trenches of approximately the same lateral dimensions. The latter can be reduced and precisely adjusted between 0 and 200 nm by thermal oxidation of the silicon structures owing to the volume expansion of silicon during the oxidation. On the basis of this a technology for the fabrication of SNOM calibration standards is presented. Additionally so-formed trenches were used as a template for CVD deposition of diamond resulting in high aspect ratio diamond knife. A lithography-free method for production of periodic and nonperiodic surface structures using the angular dependence of the etching rate is also presented. It combines the self-assembly of masking particles with the conventional plasma etching techniques known from microelectromechanical system technology. The method is generally applicable to bulk as well as layered materials. In this work, layers of glass spheres of different diameters were assembled on the sample surface forming a mask against plasma etching. Silicon surface structures with periodicity of 500 nm and feature dimensions of 20 nm were produced in this way. Thermal oxidation of the so structured silicon substrate offers the capability to vary the fill factor of the periodic structure owing to the volume expansion during oxidation but also to define silicon dioxide surface structures by selective plasma etching. Similar structures can be simply obtained by structuring silicon dioxide layers on silicon. The method offers a simple route for bridging the Nano- and Microtechnology and moreover, an uncomplicated way for photonic crystal fabrication.

Prediction of the azimuth angle dependence of the quasimolecular anisotropy in heavy ion collisions

Within the quasimolecular (MO) kinematic dipole model we predict a strong dependence of the anisotropy of the MO radiation on the orientation of the heavy ion scattering plane relative to the direction of the photon detection plane.

Designing a Robust Pitch Angle Controller for a 2‐Motor‐Pitch‐System in a Large Wind Turbine

Für große Windenergieanlagen werden neue Pitchregler wie Einzelblattregler oder Turmdämpfungsregler entwickelt. Während diese neuen Pitchregler die Elemente der Windenergieanlagen entlasten, wird das Pitchantriebssystem stärker belastet. Die Pitchantriebe müssen weitaus häufiger bei höherer Amplitude arbeiten. Um die neuen Pitchregler nutzen zu können, muss zunächst das Problem der Materialermüdung der Pitchantriebssysteme gelöst werden. Das Getriebespiel in Getrieben und zwischen Ritzeln und dem Zahnkranz erhöht die Materialermüdung in den Pitchantriebssystemen. In dieser Studie werden als Lösung zwei Pitchantriebe pro Blatt vorgeschlagen. Die beiden Pitchantriebe erzeugen eine Spannung auf dem Pitchantriebssystem und kompensieren das Getriebespiel. Drehmomentspitzen, die eine Materialermüdung verursachen, treten bei diesem System mit zwei Pitchmotoren nicht mehr auf. Ein Reglerausgang wird via Drehmomentverteiler auf die beiden Pitchantriebe übertragen. Es werden mehrere Methoden verglichen und der leistungsfähigste Drehmomentverteiler ausgewählt. Während die Pitchantriebe in Bewegung sind, ändert sich die Spannung auf den Getrieben. Die neuen Pitchregler verstellen den Pitchwinkel in einer sinusförmigen Welle. Der Profilgenerator, der derzeit als Pitchwinkelregler verwendet wird, kann eine Phasenverzögerung im sinusförmigen Pitchwinkel verursachen. Zusätzlich erzeugen große Windenergieanlagen eine hohe Last, die sich störend auf die Pitchbewegung auswirkt. Änderungen der viskosen Reibung und Nichtlinearität der Gleitreibung bzw. Coulombsche Reibung des Pitchregelsystems erschweren zudem die Entwicklung eines Pitchwinkelreglers. Es werden zwei robuste Regler (H∞ und μ–synthesis ) vorgestellt und mit zwei herkömmlichen Reglern (PD und Kaskadenregler) verglichen. Zur Erprobung des Pitchantriebssystems und des Pitchwinkelreglers wird eine Prüfanordnung verwendet. Da der Kranz nicht mit einem Positionssensor ausgestattet ist, wird ein Überwachungselement entwickelt, das die Kranzposition meldet. Neben den beiden Pitchantrieben sind zwei Lastmotoren mit dem Kranz verbunden. Über die beiden Lastmotoren wird das Drehmoment um die Pitchachse einer Windenergieanlage simuliert. Das Drehmoment um die Pitchachse setzt sich zusammen aus Schwerkraft, aerodynamischer Kraft, zentrifugaler Belastung, Reibung aufgrund des Kippmoments und der Beschleunigung bzw. Verzögerung des Rotorblatts. Das Blatt wird als Zweimassenschwinger modelliert. Große Windenergieanlagen und neue Pitchregler für die Anlagen erfordern ein neues Pitchantriebssystem. Als Hardware-Lösung bieten sich zwei Pitchantriebe an mit einem robusten Regler als Software.

The Effects of Visual Discriminability and Rotation Angle on 30-Month-Olds’ Search Performance in Spatial Rotation Tasks

Tracking objects that are hidden and then moved is a crucial ability related to object permanence, which develops across several stages in early childhood. In spatial rotation tasks, children observe a target object that is hidden in one of two or more containers before the containers are rotated around a fixed axis. Usually, 30-month-olds fail to find the hidden object after it was rotated by 180°. We examined whether visual discriminability of the containers improves 30-month-olds’ success in this task and whether children perform better after 90° than after 180° rotations. Two potential hiding containers with same or different colors were placed on a board that was rotated by 90° or 180° in a within-subjects design. Children (N D 29) performed above chance level in all four conditions. Their overall success in finding the object did not improve by differently colored containers. However, different colors prevented children from showing an inhibition bias in 90° rotations, that is, choosing the empty container more often when it was located close to them than when it was farther away: This bias emerged in the same colors condition but not in the different colors condition. Results are discussed in view of particular challenges that might facilitate or deteriorate spatial rotation tasks for young children.