Effects Of The Piscicides, Mahua Oil Cake And Croton Seed On The Prawn Culture System

The present research programme envisages a comparative study of the effects of two piscicides of plant origin, viz., mahua oil cake, a derivative from the plant fig Iatifolia and croton seed, a product from the plant Croton tiglium. Although some reports on the effects of mahua oil cake and croton seed on fresh water pond culture systems are available, information on their effect on brackishwater culture systems are rather scanty This was the guiding principle for launching the present study It is hoped that the findings will enable aquaculturists to make use of the piscicides in a more rational and efficient way, and will go a long way towards realising the maximum return liom culture systems without hampering the environment. The thesis is presented in seven chapters such as Introduction, Review of literature, Materials and Methods, Results, Discussion, Summary and Bibliography

Microwave Plasma Assisted ALD Development for the Deposition of Gate Oxides & ALD of High-k Dielectrics

The semiconductor industry's urge towards faster, smaller and cheaper integrated circuits has lead the industry to smaller node devices. The integrated circuits that are now under volume production belong to 22 nm and 14 nm technology nodes. In 2007 the 45 nm technology came with the revolutionary high- /metal gate structure. 22 nm technology utilizes fully depleted tri-gate transistor structure. The 14 nm technology is a continuation of the 22 nm technology. Intel is using second generation tri-gate technology in 14 nm devices. After 14 nm, the semiconductor industry is expected to continue the scaling with 10 nm devices followed by 7 nm. Recently, IBM has announced successful production of 7 nm node test chips. This is the fashion how nanoelectronics industry is proceeding with its scaling trend. For the present node of technologies selective deposition and selective removal of the materials are required. Atomic layer deposition and the atomic layer etching are the respective techniques used for selective deposition and selective removal. Atomic layer deposition still remains as a futuristic manufacturing approach that deposits materials and lms in exact places. In addition to the nano/microelectronics industry, ALD is also widening its application areas and acceptance. The usage of ALD equipments in industry exhibits a diversi cation trend. With this trend, large area, batch processing, particle ALD and plasma enhanced like ALD equipments are becoming prominent in industrial applications. In this work, the development of an atomic layer deposition tool with microwave plasma capability is described, which is a ordable even for lightly funded research labs.