Multichannel Remote Data Acquisition and Analysing Systems For Fisheries / Environmental Investigations

Remote Data acquisition and analysing systems developed for fisheries and related environmental studies have been reported. It consists of three units. The first one namely multichannel remote data acquisition system is installed at the remote place powered by a rechargeable battery. It acquires and stores the 16 channel environmental data on a battery backed up RAM. The second unit called the Field data analyser is used for insitue display and analysis of the data stored in the backed up RAM. The third unit namely Laboratory data analyser is an IBM compatible PC based unit for detailed analysis and interpretation of the data after bringing the RAM unit to the laboratory. The data collected using the system has been analysed and presented in the form of a graph. The system timer operated at negligibly low current, switches on the power to the entire remote operated system at prefixed time interval of 2 hours.Data storage at remote site on low power battery backedupRAM and retrieval and analysis of data using PC are the special i ty of the system. The remote operated system takes about 7 seconds including the 5 second stabilization time to acquire and store data and is very ideal for remote operation on rechargeable bat tery. The system can store 16 channel data scanned at 2 hour interval for 10 days on 2K backed up RAM with memory expansion facility for 8K RAM.

Microwave Plasma Assisted ALD Development for the Deposition of Gate Oxides & ALD of High-k Dielectrics

The semiconductor industry's urge towards faster, smaller and cheaper integrated circuits has lead the industry to smaller node devices. The integrated circuits that are now under volume production belong to 22 nm and 14 nm technology nodes. In 2007 the 45 nm technology came with the revolutionary high- /metal gate structure. 22 nm technology utilizes fully depleted tri-gate transistor structure. The 14 nm technology is a continuation of the 22 nm technology. Intel is using second generation tri-gate technology in 14 nm devices. After 14 nm, the semiconductor industry is expected to continue the scaling with 10 nm devices followed by 7 nm. Recently, IBM has announced successful production of 7 nm node test chips. This is the fashion how nanoelectronics industry is proceeding with its scaling trend. For the present node of technologies selective deposition and selective removal of the materials are required. Atomic layer deposition and the atomic layer etching are the respective techniques used for selective deposition and selective removal. Atomic layer deposition still remains as a futuristic manufacturing approach that deposits materials and lms in exact places. In addition to the nano/microelectronics industry, ALD is also widening its application areas and acceptance. The usage of ALD equipments in industry exhibits a diversi cation trend. With this trend, large area, batch processing, particle ALD and plasma enhanced like ALD equipments are becoming prominent in industrial applications. In this work, the development of an atomic layer deposition tool with microwave plasma capability is described, which is a ordable even for lightly funded research labs.