6 resultados para HIGH TIDAL VOLUME
em Cochin University of Science
Resumo:
The present study is an investigation to address relevant chemical aspects of the three varied aquatic environments, such as mangroves, river and the estuary. The sampling locations include a thick mangrove forest with high tidal activity, a mangrove nursery with minimal disturbances and low tidal inundation, a highly polluted riverine system and an estuarine site, as reference. Nutrients and bioorganic compounds in the water column and surface sediment were estimated in an attempt to understand the regeneration properties of these different aquatic systems.Assessment of the trace metal pollution was also carried out.
Resumo:
The proposed study is an attempt to quantify and study the seasonal and spatial variations in the distribution of Cr, Mn, Fe, Co, Ni, Cu, Zn, Cd and Pb among the various geochemical phases in the surficial sediments of Chitrapuzha river. The study also estimates the concentration of heavy metals in dissolved, particulate and sediments and their variation in seasonal and spatial distribution. Chitrapuzha River originates as a small stream from the upper reaches of high ranges in the eastern boundary of Kerala, passes through the valley and finally joints in the Cochin backwaters. Numerous industrial units located along the banks of the river discharge treated and untreated effluents into the water. These are long standing local complaints about water pollution causing fish mortality and serious damage to agricultural crops resulting in extensive unemployment in the area. The river is thus of considerable social and economic importance.
Resumo:
Rice husk silica was utilized as the promoter of ceria for preparing supported vanadia catalysts. Effect of vanadium content was investigated with 2–10 wt.% V2O5 loading over the support. Structural characterization of the catalysts was done by various techniques like energy dispersive X-ray (EDX), X-ray diffraction (XRD), BET surface area, thermal analysis (TGA/DTA), FT-infrared spectroscopy (FT-IR), UV–vis diffused reflectance spectroscopy (DR UV–vis), electron paramagnetic spectroscopy (EPR) and solid state magnetic resonance spectroscopies (29Si and 51V MASNMR). Catalytic activity was studied towards liquid-phase oxidation of benzene. Surface area of ceria enhanced upon rice husk silica promotion, thus makes dispersion of the active sites of vanadia easier. Highly dispersed vanadia was found for low V2O5 loading and formation of cerium orthovanadate (CeVO4) occurs as the loading increases. Spectroscopic investigation clearly confirms the formation of CeVO4 phase at higher loadings of V2O5. The oxidation activity increases with vanadia loading up to 8 wt.% V2O5, and further increase reduces the conversion rate. Selective formation of phenol can be attributed to the presence of highly dispersed active sites of vanadia over the support.
Resumo:
Doppler limited high resolution spectrum in the wavelength region 17224 to 17236 cm−1 of the first positive system (B 3Π g −A 3Σ u + ) of the N2 molecule is recorded by optogalvanic spectroscopic technique using a single mode ring dye laser. It is observed that the intensity and line width of the rotational line increase with the discharge current. Dependence of the collision broadening coefficient on the current was also evaluated.
Resumo:
High strength and high performance concrete are being widely used all over the world. Most of the applications of high strength concrete have been found in high rise buildings, long span bridges etc. The potential of rice husk ash as a cement replacement material is well established .Earlier researches showed an improvement in mechanical properties of high strength concrete with finely ground RHA as a partial cement replacement material. A review of literature urges the need for optimizing the replacement level of cement with RHA for improved mechanical properties at optimum water binder ratio. This paper discusses the mechanical properties of RHA- High strength concrete at optimized conditions
Resumo:
The semiconductor industry's urge towards faster, smaller and cheaper integrated circuits has lead the industry to smaller node devices. The integrated circuits that are now under volume production belong to 22 nm and 14 nm technology nodes. In 2007 the 45 nm technology came with the revolutionary high- /metal gate structure. 22 nm technology utilizes fully depleted tri-gate transistor structure. The 14 nm technology is a continuation of the 22 nm technology. Intel is using second generation tri-gate technology in 14 nm devices. After 14 nm, the semiconductor industry is expected to continue the scaling with 10 nm devices followed by 7 nm. Recently, IBM has announced successful production of 7 nm node test chips. This is the fashion how nanoelectronics industry is proceeding with its scaling trend. For the present node of technologies selective deposition and selective removal of the materials are required. Atomic layer deposition and the atomic layer etching are the respective techniques used for selective deposition and selective removal. Atomic layer deposition still remains as a futuristic manufacturing approach that deposits materials and lms in exact places. In addition to the nano/microelectronics industry, ALD is also widening its application areas and acceptance. The usage of ALD equipments in industry exhibits a diversi cation trend. With this trend, large area, batch processing, particle ALD and plasma enhanced like ALD equipments are becoming prominent in industrial applications. In this work, the development of an atomic layer deposition tool with microwave plasma capability is described, which is a ordable even for lightly funded research labs.