Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition

Thin silicon nitride films were prepared at 350 degrees C by inductively coupled plasma chemical vapor deposition on Si(100) substrates under different NH(3)/SiH(4) or N(2)/SiH(4) gas mixture. The chemical composition and bonding structure of the deposited films were investigated as a function of the process parameters, such as the gas flow ratio NH(3)/SiH(4) or N(2)/SiH(4) and the RF power, using X-ray photoelectron spectroscopy (XPS). The gas flow ratio was 1.4, 4.3, 7.2 or 9.5 and the RF power, 50 or 100 W. Decomposition results of Si 2p XPS spectra indicated the presence of bulk Si, under-stoichiometric nitride, stoichiometric nitride Si(3)N(4), oxynitride SiN(x)O(y), and stoichiometric oxide SiO(2), and the amounts of these compounds were strongly influenced by the two process parameters. These results were consistent with those obtained from N 1s XPS spectra. The chemical composition ratio N/Si in the film increased with increasing the gas flow ratio until the gas flow ratio reached 4.3, reflecting the high reactivity of nitrogen, and stayed almost constant for further increase in gas flow ratio, the excess nitrogen being rejected from the growing film. A considerable and unexpected incorporation of contaminant oxygen and carbon into the depositing film was observed and attributed to their high chemical reactivity. (C) 2010 Elsevier B.V. All rights reserved.

Electrochemical oxidation of glycine by doped nickel hydroxide modified electrode

The electrocatalytic oxidation of glycine by doped nickel hydroxide modified electrodes and their use as sensors are described. The electrode modification was carried out by a simple electrochemical coprecipitation and its electrochemical properties were investigated. The modified electrode presented activity for glycine oxidation after applying a potential required to form NiOOH (similar to 0.45 V vs Ag/AgCl). In these conditions a sensitivity of 0.92 mu A mmol(-1) L and a linear response range from 0.1 up to 1.2 mmol L(-1) were achieved in the electrolytic Solutions at PH 12.6. Limits of detection and quantification were found to be 30 and 110 mu mol L(-1), respectively. Kinetic studies performed with rotating disk electrode (RDE) and by chronoamperometry allowed to determine the heterogeneous rate constant of 4.3 x 10(2) mol(-1) Ls(-1), Suggesting that NiOOH is a good electrocatalyst for glycine oxidation. NiOOH activity to oxidize other amino acids was also investigated, (c) 2008 Elsevier B.V. All rights reserved.