2 resultados para Fused deposition modeling

em Biblioteca Digital da Produção Intelectual da Universidade de São Paulo (BDPI/USP)


Relevância:

30.00% 30.00%

Publicador:

Resumo:

We investigate the depositional time scale of lithological couplets (fine sandstone/siltstone-siltstone/mudstone) from two distinctive outcrops of Permo-Carboniferous glacial rhythmites in the Itarare Group (Parana Basin, Brazil). Resolving the fundamental issue of time scale for these rhythmites is important in light of recent evidence for paleosecular variation measured in these sequences. Spectral analysis and tuning of high-resolution gray scale scans of sediment core microstratigraphy, which comprises pervasive laminations, reveal a comparable spectral content at both localities, with a frequency suite interpreted as that of short-term climate variability of Recent and modern times. This evidence for decadal- to centennial-scale deposition of these lithological couplets is discussed in light of the `varvic` character, i.e., annual time scale that was previously assumed for the rhythmites.

Relevância:

30.00% 30.00%

Publicador:

Resumo:

The fluid flow of the liquid phase in the sol-gel-dip-coating process for SnO(2) thin film deposition is numerically simulated. This calculation yields useful information on the velocity distribution close to the substrate, where the film is deposited. The fluid modeling is done by assuming Newtonian behavior, since the linear relation between shear stress and velocity gradient is observed. Besides, very low viscosities are used. The fluid governing equations are the Navier-Stokes in the two dimensional form, discretized by the finite difference technique. Results of optical transmittance and X-ray diffraction on films obtained from colloidal suspensions with regular viscosity, confirm the substrate base as the thickest part of the film, as inferred from the numerical simulation. In addition, as the viscosity increases, the fluid acquires more uniform velocity distribution close to the substrate, leading to more homogenous and uniform films.