10 resultados para oxidation in low temperature

em University of Queensland eSpace - Australia


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Exposure to ethylene gas elicits flower abscission from cut stems of Geraldton waxflower (Chamelaucium uncinatum Schauer). Ethylene response rates in plants are mediated by temperature. At 20degreesC, flower abscission from waxflower 'Purple Pride' occurred upon 12 h exposure to I mu11(-1) ethylene. This ethylene treatment did not cause flower abscission at either 10 or 2degreesC. Moreover, flowers held at 2degreesC were insensitive to 48 h exposure to 1, 10 and 100 mu11(-1) ethylene. However, increasing the duration of treatment with I mu11(-1) ethylene at 10 and 2degreesC to 48 and 144 h, respectively, induced flower abscission. When flowers were held at 20degreesC in air without exogenous ethylene following continuous exposure to I mu11(-1) ethylene at 2degreesC, the duration required to elicit flower abscission was reduced from 144 to 72 It. Collectively, these responses show that maintaining harvested waxflower at low temperature (e.g. 2degreesC) is an effective means to minimise ethylene-mediated flower abscission.

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Prevalence of low temperature at sowing results in poor rice seed germination, seedling establishment and vigour in several temperate rice growing countries around the world. Rice seed of four cultivars (Sasanishiki, H433, HSC-55 and Doongara) was soaked in various combinations of gibberellic acid(3) (GA(3)) and glycinebetaine (GB) in petri dishes placed in a low temperature glasshouse (18/13 degrees C; day/night) for 2 days. After the 2 days soak, 10 treated seed were transferred into plastic pots filled with soil and seedlings were grown in the same glasshouse, where seed was treated. Seedling emergence was least affected by low temperature in cold tolerant cultivar, HSC-55, while other three cultivars showed reduced seedling emergence. However, seedling emergence increased significantly in some cultivars in response to seed treatment with GA(3) and/or GB. Seedlings emerged faster even in the cold tolerant cultivar, HSC-55, as measured by reduced mean emergence time (MET), in response to GB. Seedling height and seedling dry matter also increased in response to both GA(3) and GB. Combined treatment of both GA(3) and GB was more beneficial in increasing seedling emergence and vigour than the treatment with only GA3 or GB. We demonstrated significant genotypic differences for seedling emergence and vigour and not all cultivars responded to the treatment with GA(3) and GB, under low temperature.

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In this work, a working model is proposed of molecular sieve silica (MSS) multistage membrane systems for CO cleanup at high temperatures (up to 500 degrees C) in a simulated fuel cell fuel processing system. Gases are described as having little interactions with each other relative to the pore walls due to low isosteric heat of adsorption on silica surfaces and high temperatures. The Arrhenius function for activated transport of pure gases was used to predict mixture concentration in the permeate and retentate streams. Simulation predicted CO could be reduced to levels below the required 50 ppmv for polymer electrolyte membrane fuel cell anodes at a stage H-2/CO selectivity of higher than 40 in 4 series membrane units. Experimental validation showed predicting mixture concentrations required only pure gas permeation data. This model has significant application for setting industrial stretch targets and as a robust basis for complex membrane model configurations. (c) 2006 American Institute of Chemical Engineers.

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Multiple-sown field trials in 4 consecutive years in the Riverina region of south-eastern Australia provided 24 different combinations of temperature and day length, which enabled the development of crop phenology models. A crop model was developed for 7 cultivars from diverse origins to identify if photoperiod sensitivity is involved in determining phenological development, and if that is advantageous in avoiding low-temperature damage. Cultivars that were mildly photoperiod-sensitive were identified from sowing to flowering and from panicle initiation to flowering. The crop models were run for 47 years of temperature data to quantify the risk of encountering low temperature during the critical young microspore stage for 5 different sowing dates. Cultivars that were mildly photoperiod-sensitive, such as Amaroo, had a reduced likelihood of encountering low temperature for a wider range of sowing dates compared with photoperiod-insensitive cultivars. The benefits of increased photoperiod sensitivity include greater sowing flexibility and reduced water use as growth duration is shortened when sowing is delayed. Determining the optimal sowing date also requires other considerations, e. g. the risk of cold damage at other sensitive stages such as flowering and the response of yield to a delay in flowering under non-limiting conditions. It was concluded that appropriate sowing time and the use of photoperiod-sensitive cultivars can be advantageous in the Riverina region in avoiding low temperature damage during reproductive development.

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Materials and mechanical characteristics of the low temperature PECVD silicon nitrides have been investigated using various analytical and testing techniques. TEM and SEM examinations reveal that there is no distinct microstructural difference existing between the films deposited under different conditions. However, their mechanical properties determined by nanoindentation indicate otherwise. The variations in mechanical properties with deposition conditions are found to be strongly correlated to the change in silicon-to-nitrogen ratio in the film.

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The effect of deposition conditions on characteristic mechanical properties - elastic modulus and hardness - of low-temperature PECVD silicon nitrides is investigated using nanoindentation. lt is found that increase in substrate temperature, increase in plasma power and decrease in chamber gas pressure all result in increases in elastic modulus and hardness. Strong correlations between the mechanical properties and film density are demonstrated. The silicon nitride density in turn is shown to be related to the chemical composition of the films, particularly the silicon/nitrogen ratio. (c) 2006 Elsevier B.V. All rights reserved.