Denver - A City Profile

Denver has emerged from the 1990s as a city region experiencing rapid growth. This has been fuelled by a vibrant local economy, which has adjusted itself from dependency on an earlier oil boom to greater reliance on the information and communications technology sector. The current planning and development challenges are dominated by the need to deal with urban sprawl and pressured transportation infrastructure. The contemporary restructuring of the physical fabric of Denver is marked by a progressive downtown revitalisation effort and a number of space extensive brownfield development projects. The interplay of state and local governments with commercial interests and citizens is a powerful dynamic in shaping these negative and positive outcomes.

Optimisation of source/drain extension region profile for suppression of short channel effects in sub-50 nm DG SOI MOSFETs with high- k gate dielectrics

Novel technology dependent scaling parameters i.e. spacer to gradient ratio and effective channel length (Leff) are proposed for source/drain engineered DG MOSFET, and their significance in minimizing short channel effects (SCES) in high-k gate dielectrics is discussed in detail. Results show that a high-k dielectric should be associated with a higher spacer to gradient ratio to minimise SCEs The analytical model agrees with simulated data over the entire range of spacer widths, doping gradients, high-k gate dielectrics and effective channel lengths.