5 resultados para ISO 12647-2
em QUB Research Portal - Research Directory and Institutional Repository for Queen's University Belfast
Resumo:
As ubiquitous computing becomes a reality, sensitive information is increasingly processed and transmitted by smart cards, mobile devices and various types of embedded systems. This has led to the requirement of a new class of lightweight cryptographic algorithm to ensure security in these resource constrained environments. The International Organization for Standardization (ISO) has recently standardised two low-cost block ciphers for this purpose, Clefia and Present. In this paper we provide the first comprehensive hardware architecture comparison between these ciphers, as well as a comparison with the current National Institute of Standards and Technology (NIST) standard, the Advanced Encryption Standard.
Resumo:
We present ISO-SWS spectra of the O-rich Mira variable R Gas, showing CO2 in absorption and emission, and H2O in absorption. The CO2 absorption feature is the 01(1)0 - 00(0)0 ro-vibrationaI band at 14.97 mu m. The emission features are the 10(0)0-01(1)0 and 11(1)0 - 02(2)0 re-vibrational transitions at 13.87 and 13.48 mu m respectively. The water absorption spectrum shows the nu(1) and nu(3) re-vibrational bands in the 2.75 - 3 mu m region. Using LTE models, we derive physical parameters for the features. We find the CO2 emission temperature to be similar to 1100 K. We discuss the nature of the CO2 feature at 15 mu m and show that it can be modeled as an emission/absorption band by deviating front thermal equilibrium for the population of the 01(1)0 vibrational level. The H2O absorption spectrum is shown to arise from gas at different temperatures, but can be fit reasonably well with two components at T = 950 K and T = 250 K. The CO2 emission and hut H2O absorption temperatures an similar, suggesting chat these features probe the same region of the inner envelope. We discuss the inner envelope chemistry using molecular equilibrium calculations and recent modeling work by Duari et al. (1999), and find our observations consistent with the results.
Resumo:
The current eight published ISO standards associated with semiconductor photocatalysis are considered. These standards cover: (1) air purification (specifically, the removal of NO, acetaldehyde and toluene), (2) water purification (the photobleaching of methylene blue and oxidation of DMSO) (3) self-cleaning surfaces (the removal of oleic acid and subsequent change in water droplet contact angle), (4) photosterilisation (specifically probing the antibacterial action of semiconductor photocatalyst films) and (5) UV light sources for semiconductor photocatalytic ISO work. For each standard, the background is first considered, followed by a brief discussion of the standard particulars and concluding in a discussion of the pros and cons of the standard, with often recommendations for their improvement. Other possible standards for the future which would either compliment or enhance the current ones are discussed briefly.
The nitric oxide ISO photocatalytic reactor system: Measurement of NOx removal activity and capacity
Resumo:
Although the NO removal-based air-purification ISO method ISO 22197-1:2007 is well established, its preconditioning requirements mean that only the initial activity of the photocatalyst under test is measured owing to the often-reported, gradual alteration of the surface kinetics for NO oxidation by air through the accumulation of surface HNO3. Herein, we compare the photocatalytic NO removal abilities of a number of different, common TiO2 materials, surface-saturated with photogenerated HNO3, with their behaviours observed during the typical 5 h-long ISO standard test. It is found that all the TiO2 materials studied eventually become largely NO to NO2 converters after sufficient exposure to NO under irradiation (>5 h) due to the accumulation of surface HNO3. The UV exposure time, t*, necessary to reach this HNO3 saturated condition is different for each different catalyst. As a consequence, an alternative preconditioning process for the ISO method is proposed which can be used to provide a more realistic measure of the photocatalytic activity of the underlying material and provide a measure of the NOx removing capacity of the photocatalytic material under test.
Resumo:
The end of Dennard scaling has promoted low power consumption into a firstorder concern for computing systems. However, conventional power conservation schemes such as voltage and frequency scaling are reaching their limits when used in performance-constrained environments. New technologies are required to break the power wall while sustaining performance on future processors. Low-power embedded processors and near-threshold voltage computing (NTVC) have been proposed as viable solutions to tackle the power wall in future computing systems. Unfortunately, these technologies may also compromise per-core performance and, in the case of NTVC, xreliability. These limitations would make them unsuitable for HPC systems and datacenters. In order to demonstrate that emerging low-power processing technologies can effectively replace conventional technologies, this study relies on ARM’s big.LITTLE processors as both an actual and emulation platform, and state-of-the-art implementations of the CG solver. For NTVC in particular, the paper describes how efficient algorithm-based fault tolerance schemes preserve the power and energy benefits of very low voltage operation.