Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas

An industrial, confined, dual frequency, capacitively coupled, radio-frequency plasma etch reactor Exelan®, Lam Research has been modified for spatially resolved optical measurements. Space and phase resolved optical emission spectroscopy yields insight into the dynamics of the discharge. A strong coupling of the two frequencies is observed in the emission profiles. Consequently, the ionization dynamics, probed through excitation, is determined by both frequencies. The control of plasma density by the high frequency is, therefore, also influenced by the low frequency. Hence, separate control of plasma density and ion energy is rather complex.

Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge

The dynamics of high energetic electrons (>= 11.7 eV) in a modified industrial confined dual-frequency capacitively coupled RF discharge (Exelan, Lam Research Inc.), operated at 1.937 MHz and 27.118 MHz, is investigated by means of phase resolved optical emission spectroscopy. Operating in a He-O-2. plasma with small rare gas admixtures the emission is measured, with one-dimensional spatial resolution along the discharge axis. Both the low and high frequency RF cycle are resolved. The diagnostic is based on time dependent measurements of the population densities of specifically chosen excited rare gas states. A time dependent model, based on rate equations, describes the dynamics of the population densities of these levels. Based on this model and the comparison of the excitation of various rare gas states, with different excitation thresholds, time and space resolved electron temperature, propagation velocity and qualitative electron density as well as electron energy distribution functions are determined. This information leads to a better understanding of the dual-frequency sheath dynamics and shows, that separate control of ion energy and electron density is limited.

The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma

Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies.

Mechanically tunable multiband compact quadrifilar helix antenna with dual mode operation

We show that by introducing a gap at the center of the helical sections (where the current is minimum) of a lambda/2 quadrifilar helix antenna (QHA) and varying the axial length and radial gap between the overlapping volutes, the antenna gives a 28% impedance bandwidth which is nine times the bandwidth of a conventional QHA. A 16% bandwidth with a front to back ratio of >= 14 dB is achievable with 5-14% reduction in the size of the QHA. The structure can yield a monopole radiation pattern suitable for terrestrial applications or a hemispherical pattern suitable for satellite use. The simulation results are validated by measurements at L-band.

Dual-mode compact structure comprising of side-fed bifilar and quadrifilar helix antenna

A side-fed bifilar helix antenna can be integrated with a quadrifilar helix antenna in a piggy back configuration in order to achieve a dual-mode radiating structure. The overall length of the structure is 0.44 lambda at the resonant frequency (1.54 GHz) of the space mode antenna and 0.39 lambda at the resonant frequency (1.34 GHz) of the terrestrial mode antenna. The computed results are validated by experimental data.