Ethnogenesis and Craniofacial Change in Japan from the Perspective of Nonmetric Traits

To examine population affinities in light of the ‘dual structure model’, frequencies of 21 nonmetric cranial traits were analyzed in 17 prehistoric to recent samples from Japan and five from continental northeast Asia. Eight bivariate plots, each representing a different bone or region of the skull, as well as cluster analysis of 21-trait mean measures of divergence using multidimensional scaling and additive tree techniques, revealed good discrimination between the Jomon-Ainu indigenous lineage and that of the immigrants who arrived from continental Asia after 300 BC. In Hokkaido, in agreement with historical records, Ainu villages of Hidaka province were least, and those close to the Japan Sea coast were most, hybridized with Wajin. In the central islands, clines were identified among Wajin skeletal samples whereby those from Kyushu most resembled continental northeast Asians, while those from the northernmost prefectures of Tohoku apparently retained the strongest indigenous heritage. In the more southerly prefectures of Tohoku, stronger traces of Jomon ancestry prevailed in the cohort born during the latest Edo period than in the one born after 1870. Thus, it seems that increased inter-regional mobility and gene flow following the Meiji Restoration initiated the most recent episode in the long process of demic diffusion that has helped to shape craniofacial change in Japan.

Variable 360° Vector-Sum Phase Shifter With Coarse and Fine Vector Scaling

A CMOS vector-sum phase shifter covering the full 360° range is presented in this paper. Broadband operational transconductance amplifiers with variable transconductance provide coarse scaling of the quadrature vector amplitudes. Fine scaling of the amplitudes is accomplished using a passive resistive network. Expressions are derived to predict the maximum bit resolution of the phase shifter from the scaling factor of the coarse and fine vector-scaling stages. The phase shifter was designed and fabricated using the standard 130-nm CMOS process and was tested on-wafer over the frequency range of 4.9–5.9 GHz. The phase shifter delivers root mean square (rms) phase and amplitude errors of 1.25° and 0.7 dB, respectively, at the midband frequency of 5.4 GHz. The input and output return losses are both below 17 dB over the band, and the insertion loss is better than 4 dB over the band. The circuit uses an area of 0.303 mm2 excluding bonding pads and draws 28 mW from a 1.2 V supply.