2 resultados para Nano-patterned

em Duke University


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The task of nanofabrication can, in principle, be divided into two separate tracks: generation and replication of the patterned features. These two tracks are different in terms of characteristics, requirements, and aspects of emphasis. In general, generation of patterns is commonly achieved in a serial fashion using techniques that are typically slow, making this process only practical for making a small number of copies. Only when combined with a rapid duplication technique will fabrication at high-throughput and low-cost become feasible. Nanoskiving is unique in that it can be used for both generation and duplication of patterned nanostructures.

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We propose an ISA extension that decouples the data access and register write operations in a load instruction. We describe system and hardware support for decoupled loads. Furthermore, we show how compilers can generate better static instruction schedules by hoisting a decoupled load’s data access above may-alias stores and branches. We find that decoupled loads improve performance with geometric mean speedups of 8.4%.