2 resultados para Image Analysis. Co-located Microscopy

em CORA - Cork Open Research Archive - University College Cork - Ireland


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The importance of non-destructive techniques (NDT) in structural health monitoring programmes is being critically felt in the recent times. The quality of the measured data, often affected by various environmental conditions can be a guiding factor in terms usefulness and prediction efficiencies of the various detection and monitoring methods used in this regard. Often, a preprocessing of the acquired data in relation to the affecting environmental parameters can improve the information quality and lead towards a significantly more efficient and correct prediction process. The improvement can be directly related to the final decision making policy about a structure or a network of structures and is compatible with general probabilistic frameworks of such assessment and decision making programmes. This paper considers a preprocessing technique employed for an image analysis based structural health monitoring methodology to identify sub-marine pitting corrosion in the presence of variable luminosity, contrast and noise affecting the quality of images. A preprocessing of the gray-level threshold of the various images is observed to bring about a significant improvement in terms of damage detection as compared to an automatically computed gray-level threshold. The case dependent adjustments of the threshold enable to obtain the best possible information from an existing image. The corresponding improvements are observed in a qualitative manner in the present study.

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The anodic behavior of highly doped (> 1018 cm-3) n-InP in aqueous KOH was investigated. Electrodes anodized in the absence of light in 2- 5 mol dm-3 KOH at a constant potential of 0.5- 0.75 V (SCE), or subjected to linear potential sweeps to potentials in this range, were shown to exhibit the formation of a nanoporous subsurface region. Both linear sweep voltammograms and current-time curves at constant potential showed a characteristic anodic peak, corresponding to formation of the nanoporous region. No porous region was formed during anodization in 1 mol dm-3 KOH. The nanoporous region was examined using transmission electron microscopy and found to have a thickness of some 1- 3 μm depending on the anodization conditions and to be located beneath a thin (typically ∼40 nm), dense, near-surface layer. The pores varied in width from 25 to 75 nm and both the pore width and porous region thickness were found to decrease with increasing KOH concentration. The porosity was approximately 35%. The porous layer structure is shown to form by the localized penetration of surface pits into the InP, and the dense, near-surface layer is consistent with the effect of electron depletion at the surface of the semiconductor.