Layered Exact-Repair Regenerating Codes via Embedded Error Correction and Block Designs

A new class of exact-repair regenerating codes is constructed by stitching together shorter erasure correction codes, where the stitching pattern can be viewed as block designs. The proposed codes have the help-by-transfer property where the helper nodes simply transfer part of the stored data directly, without performing any computation. This embedded error correction structure makes the decoding process straightforward, and in some cases the complexity is very low. We show that this construction is able to achieve performance better than space-sharing between the minimum storage regenerating codes and the minimum repair-bandwidth regenerating codes, and it is the first class of codes to achieve this performance. In fact, it is shown that the proposed construction can achieve a nontrivial point on the optimal functional-repair tradeoff, and it is asymptotically optimal at high rate, i.e., it asymptotically approaches the minimum storage and the minimum repair-bandwidth simultaneously.

Fabrication of back contacts using laser writer and photolithography for inscribing textured solar cells

Semiconductor fabrication process begins with photolithography. Preparing a photo mask is the key process step in photolithography. The photo mask was fabricated by inscribing patterns directly onto a soda lime glass with the help of a laser beam, as it is easily controllable. Laser writer LW405-A was used for preparing the mask in this study. Exposure wavelength of 405 nm was used, with which 1.2 mu m feature size can be written in direct write-mode over the soda lime glass plate. The advantage of using the fabricated mask is that it can be used to design back contacts for thin film Photovoltaic (PV) solar cells. To investigate the process capability of LW405-A, same pattern with different line widths was written on soda lime glass samples at different writing speeds. The pattern was inscribed without proximity effect and stitching errors, which was characterized using optical microscope and field emission scanning electron microscope (FE-SEM). It was proven that writing speed of a mask-writer is decided according to the intended feature size and line width. As the writing speed increases, the edges of the patterns become rougher due to uneven scattering of the laser beam. From the fabricated mask, the solar cell can be developed embedding both the contacts at the bottom layer, to increase the absorption of solar radiation on the top surface effectively by increasing light absorption area.