Two-Dimensional Encoding Masks ror Hadamard Spectrometric Imager

Techniques to improve upon the design of two-dimensional encoding masks for multiplex Hadamard spectrometric imagers are described. The technique to generate masks based on completely orthonormal codes is described. In some cases, selfsupporting masks result which were not previously known. Transmission through the encoding masks (but not necessarily the signalto-noise ratio) can also be increased.

Diffraction of a cylindrical pulse by a metallic half plane

A direct transform technique is applied to the initial and boundary value problem involving diffraction of a cylindrical pulse by a half plane, on which impedance type of boundary conditions must be met by the total field. The solution to the time harmonic incident plane wave is deduced as a particular case of the general time-dependent problem considered here and we avoid the Wiener–Hopf technique which leads to very complicated factorization and which masks the role of the impedance factor Z′ (a small quantity) in the expression for the scattered field.

Topology Optimization of Micromachined Structures with the Manufacturing Constraints of KOH Etching of (110) Silicon

The focus of this paper is on designing useful compliant micro-mechanisms of high-aspect-ratio which can be microfabricated by the cost-effective wet etching of (110) orientation silicon (Si) wafers. Wet etching of (110) Si imposes constraints on the geometry of the realized mechanisms because it allows only etch-through in the form of slots parallel to the wafer's flat with a certain minimum length. In this paper, we incorporate this constraint in the topology optimization and obtain compliant designs that meet the specifications on the desired motion for given input forces. Using this design technique and wet etching, we show that we can realize high-aspect-ratio compliant micro-mechanisms. For a (110) Si wafer of 250 µm thickness, the minimum length of the etch opening to get a slot is found to be 866 µm. The minimum achievable width of the slot is limited by the resolution of the lithography process and this can be a very small value. This is studied by conducting trials with different mask layouts on a (110) Si wafer. These constraints are taken care of by using a suitable design parameterization rather than by imposing the constraints explicitly. Topology optimization, as is well known, gives designs using only the essential design specifications. In this work, we show that our technique also gives manufacturable mechanism designs along with lithography mask layouts. Some designs obtained are transferred to lithography masks and mechanisms are fabricated on (110) Si wafers.

MAST: multi-script annotation toolkit for scenic text

This paper describes a semi-automatic tool for annotation of multi-script text from natural scene images. To our knowledge, this is the maiden tool that deals with multi-script text or arbitrary orientation. The procedure involves manual seed selection followed by a region growing process to segment each word present in the image. The threshold for region growing can be varied by the user so as to ensure pixel-accurate character segmentation. The text present in the image is tagged word-by-word. A virtual keyboard interface has also been designed for entering the ground truth in ten Indic scripts, besides English. The keyboard interface can easily be generated for any script, thereby expanding the scope of the toolkit. Optionally, each segmented word can further be labeled into its constituent characters/symbols. Polygonal masks are used to split or merge the segmented words into valid characters/symbols. The ground truth is represented by a pixel-level segmented image and a '.txt' file that contains information about the number of words in the image, word bounding boxes, script and ground truth Unicode. The toolkit, developed using MATLAB, can be used to generate ground truth and annotation for any generic document image. Thus, it is useful for researchers in the document image processing community for evaluating the performance of document analysis and recognition techniques. The multi-script annotation toolokit (MAST) is available for free download.

BILATERAL EDGE DETECTORS

We propose to employ bilateral filters to solve the problem of edge detection. The proposed methodology presents an efficient and noise robust method for detecting edges. Classical bilateral filters smooth images without distorting edges. In this paper, we modify the bilateral filter to perform edge detection, which is the opposite of bilateral smoothing. The Gaussian domain kernel of the bilateral filter is replaced with an edge detection mask, and Gaussian range kernel is replaced with an inverted Gaussian kernel. The modified range kernel serves to emphasize dissimilar regions. The resulting approach effectively adapts the detection mask according as the pixel intensity differences. The results of the proposed algorithm are compared with those of standard edge detection masks. Comparisons of the bilateral edge detector with Canny edge detection algorithm, both after non-maximal suppression, are also provided. The results of our technique are observed to be better and noise-robust than those offered by methods employing masks alone, and are also comparable to the results from Canny edge detector, outperforming it in certain cases.