Performance evaluation of nonthermal plasma reactors for NO oxidation in diesel engine exhaust gas treatment

The discharge plasma-chemical hybrid process for NO/sub x/ removal from the due gas emissions is an extremely effective and economical approach in comparison with the conventional selective catalytic reduction system. In this paper we bring out a relative comparison of several discharge plasma reactors from the point of NO removal efficiency. The reactors were either energized by AC or by repetitive pulses. Ferroelectric pellets were used to study the effect of pellet assisted discharges on gas cleaning. Diesel engine exhaust, at different loads, is used to approximately simulate the due gas composition. Investigations were carried out at room temperature with respect to the variation of reaction products against the discharge power. Main emphasis is laid on the oxidation of NO to NO/sub 2/, without reducing NOx concentration (i.e., minimum reaction byproducts), with least power consumption. The produced NO/sub 2/ will be totally converted to N/sub 2/ and Na/sub 2/SO/sub 4/ using Na/sub 2/SO/sub 3/. The AC packed bed reactor and pelletless pulsed corona reactor showed better performance, with minimum reaction products for a given power, when the NO concentration was low (/spl sim/100 ppm). At high engine loads (NO>300 ppm) there was not much decrease in NO/sub x/ reduction and more or less all the reactors performed equally. The paper discusses these observations in detail.

Pulsed plasma treatment for NOx reduction from filtered/unfiltered stationary diesel engine exhaust

A detailed study on the removal of oxides of nitrogen (NOx) from the filtered/unfiltered exhaust of a stationary diesel engine was carried out using non-thermal plasma (pulsed electrical discharge plasma) process and cascaded processes namely plasma- adsorbent and plasma-catalyst processes. The superior performance of discharge plasma with regard to NOx removal, energy consumption and formation of by-products in unfiltered exhaust environment is identified. In the cascaded plasma-adsorbent process, the plasma was cascaded with adsorbents (MS13X/Activated alumina/Activated charcoal). The cascaded process treating unfiltered exhaust exhibits a very high NOx removal compared to the individual processes and further, the cascaded process gives almost the same NOx removal efficiency irrespective of type of adsorbent used. In the cascaded plasma- catalyst process, the plasma was cascaded with activated alumina catalyst at high temperature. The synergy effect and improved performance of the cascaded process are explained. Further, experiments were conducted at room temperature as well as at higher temperatures.

Synthesis of free standing carbon nanosheet using electron cyclotron resonance plasma enhanced chemical vapor deposition

Carbon nanosheets (CNSs) have been synthesized by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition (PECVD) using a mixture of acetylene and argon gases on copper foil as the substrate. Micrometer-wide carbon sheets consisting of several atomic layers thick graphene sheets have been synthesized by controlled decomposition of carbon radicals in ECR-PECVD. Raman spectroscopy of these films revealed characteristics of a disordered graphitic sheet. Thick folded carbon-sheets and a semi transparent freestanding CNSs have been observed by scanning electron microscopy. This is a promising technique to synthesize free standing CNSs and can be used in the fabrication of nanoelecronic devices in future. (C) 2012 Elsevier B.V. All rights reserved.

A Laboratory Analysis of Plasma Based Hybrid Techniques for Treating Engine Exhaust

A detailed study on the removal of pollutants (NOx, aldehydes and CO) from the exhaust of a stationary diesel engine is carried out using barrier discharge hybrid plasma techniques. The objective of the study is to make a comparative analysis. For this purpose, the exhaust treatment was carried out in two stages. In the first stage, the exhaust was treated with plasma process and plasma-adsorbent hybrid process. The effectiveness of the two processes with regard to NOx removal and by-product reduction was discussed. In the second stage, the exhaust was treated by plasma and plasma-catalyst hybrid process. The effectiveness of the two processes with regard to pollutants (NOx, CO) removal and by-product reduction was analyzed. Finally, a comprehensive comparison of different techniques has been made and feasible plasma based hybrid techniques for stationary and non-stationary engine exhaust treatments were proposed.

Application of Solar Powered High Voltage Discharge Plasma for NOX Rem

This paper proposes a compact electric discharge plasma source for controlling NOX emission in diesel engine exhaust. Boost converter is used to boost to solar powered battery voltage to 24V, further an automobile ignition coil was used to generate the high voltage pulse using fly-back topology. This design is aimed at retrofitting the existing catalytic converters with pulse assisted cleaning technique. In this paper we bring out a relative comparison of discharge plasma and plasma-adsorbent process at different gas flow rates. Activated alumina was used as adsorbent. The main emphasis is laid on the development of a compact pulse source from 12V battery, which is powered by the solar, for the removal of NOX from the filtered diesel engine exhaust.

A core study on NOX removal in diesel exhaust by pulsed/ac/dc electric discharge plasma

In this paper a study on effect of different energization on removal of NOX in diesel engine exhaust has been presented. Here we made a detailed qualitative study of effect of pulsed/ac/dc voltage energizations on the NOX treatment of using conventional wire-cylinder reactor configuration. It was observed that amongst different energizations, pulse energization exhibits maximum NOX removal efficiency when compared to ac and dc energizations. For a given specific energy density, wire-cylinder reactor filled with BaTiO3 pellet gives higher NOX removal efficiency when compared to reactor without pellets under both pulse and ac energization. The dc energization does not have much impact on the removal processes. The paper further discusses the individual energization cases in detail.

Spark plasma sintering of novel ZrB2-SiC-TiSi2 composites with better mechanical properties

We report here the development of ultrafine grained ZrB2-SiC composites using TiSi2 as the sintering aid and spark plasma sintering (SPS) as the processing technique. It was observed that the presence of TiSi2 improved the sinterability of the composites, such that near theoretical densification (99.9%) could be achieved for ZrB2-18 wt.% SiC-5 wt.% TiSi2 composites after SPS at 1600 degrees C for 10 min at 50 MPa. Use of innovative multi stage sintering (MSS) route, which involved holding the samples at lower (intermediate) temperatures for some time before holding at the final temperature, while keeping the net holding time to 10 min, allowed attainment of full densification of ZrB2-18 wt.% SiC-2.5 wt.% TiSi2 at a still lower final temperature of 1500 degrees C at 30 MPa. TEM observations, which revealed the presence of anisotropic ZrB2 grains with faceted grain boundaries and TiSi2 at the intergranular regions, suggested the occurrence of liquid phase sintering in the presence of TiSi2. No additional phase was detected in XRD as well as TEM, which confirmed the absence of any sintering reaction. The as developed composites possessed an excellent combination of Vickers hardness and indentation toughness, both of which increased with increase in TiSi2 content, such that the ZrBi2-18 wt.% SiC-5 wt.% TiSi2 (SPS processed at 1600 degrees C) possessed hardness of similar to 20 GPa and indentation toughness of similar to 5 MPa m(1/2). The use of MSS SPS at 1500 degrees C for ZrBi2-18 wt.% SiC-2.5 wt.% TiSi2 composite resulted in improvement in hardness of up to similar to 27 GPa and attainment of high flexural strength of similar to 455 MPa. (C) 2011 Elsevier B.V. All rights reserved.

Mass of highly magnetized white dwarfs exceeding the Chandrasekhar limit: An analytical view

In recent years a number of white dwarfs have been observed with very high surface magnetic fields. We can expect that the magnetic field in the core of these stars would be much higher (similar to 10(14) G). In this paper, we analytically study the effect of high magnetic field on relativistic cold electron, and hence its effect on the stability and the mass-radius relation of a magnetic white dwarf. In strong magnetic fields, the equation of state of the Fermi gas is modified and Landau quantization comes into play. For relatively very high magnetic fields (with respect to the average energy density of matter) the number of Landau levels is restricted to one or two. We analyze the equation of states for magnetized electron degenerate gas analytically and attempt to understand the conditions in which transitions from the zeroth Landau level to first Landau level occurs. We also find the effect of the strong magnetic field on the star collapsing to a white dwarf, and the mass-radius relation of the resulting star. We obtain an interesting theoretical result that it is possible to have white dwarfs with mass more than the mass set by Chandrasekhar limit.

Carrier concentration dependence of donor activation energy in n-type GaN epilayers grown on Si (111) by plasma-assisted MBE

The n-type GaN layers were grown by plasma-assisted MBE and either intentionally doped with Si or unintentionally doped. The optical characteristics of a donor level in Si-doped, GaN were studied in terms of photoluminescence (PL) spectroscopy as a function of electron concentration. Temperature dependent PL measurements allowed us to estimate the activation energy of a Si-related donor from temperature-induced decay of PL intensity. PL peak positions, full width at half maximum of PL and activation energies are found to be proportional to the cube root of carrier density. The involvement of donor levels is supported by the temperature-dependent electron concentration measurements. (C) 2012 Elsevier Ltd. All rights reserved.

Valence band offset at GaN/beta-Si3N4 and beta-Si3N4/Si(111) heterojunctions formed by plasma-assisted molecular beam epitaxy

Ultra thin films of pure beta-Si3N4 (0001) were grown on Si (111) surface by exposing the surface to radio- frequency nitrogen plasma with a high content of nitrogen atoms. Using beta-Si3N4 layer as a buffer layer, GaN epilayers were grown on Si (111) substrate by plasma-assisted molecular beam epitaxy. The valence band offset (VBO) of GaN/beta-Si3N4/ Si heterojunctions is determined by X-ray photoemission spectroscopy. The VBO at the beta-Si3N4 /Si interface was determined by valence-band photoelectron spectra to be 1.84 eV. The valence band of GaN is found to be 0.41 +/- 0.05 eV below that of beta-Si3N4 and a type-II heterojunction. The conduction band offset was deduced to be similar to 2.36 eV, and a change of the interface dipole of 1.29 eV was observed for GaN/ beta-Si3N4 interface formation. (c) 2011 Elsevier B.V. All rights reserved.

Realization of thermally durable close-packed 2D gold nanoparticle arrays using self-assembly and plasma etching

Realization of thermally and chemically durable, ordered gold nanostructures using bottom-up self-assembly techniques are essential for applications in a wide range of areas including catalysis, energy generation, and sensing. Herein, we describe a modular process for realizing uniform arrays of gold nanoparticles, with interparticle spacings of 2 nm and above, by using RF plasma etching to remove ligands from self-assembled arrays of ligand-coated gold nanoparticles. Both nanoscale imaging and macroscale spectroscopic characterization techniques were used to determine the optimal conditions for plasma etching, namely RF power, operating pressure, duration of treatment, and type of gas. We then studied the effect of nanoparticle size, interparticle spacing, and type of substrate on the thermal durability of plasma-treated and untreated nanoparticle arrays. Plasma-treated arrays showed enhanced chemical and thermal durability, on account of the removal of ligands. To illustrate the application potential of the developed process, robust SERS (surface-enhanced Raman scattering) substrates were formed using plasma-treated arrays of silver-coated gold nanoparticles that had a silicon wafer or photopaper as the underlying support. The measured value of the average SERS enhancement factor (2 x 10(5)) was quantitatively reproducible on both silicon and paper substrates. The silicon substrates gave quantitatively reproducible results even after thermal annealing. The paper-based SERS substrate was also used to swab and detect probe molecules deposited on a solid surface.