84 resultados para Fringe pattern traces


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Frequent episode discovery is a popular framework for pattern discovery from sequential data. It has found many applications in domains like alarm management in telecommunication networks, fault analysis in the manufacturing plants, predicting user behavior in web click streams and so on. In this paper, we address the discovery of serial episodes. In the episodes context, there have been multiple ways to quantify the frequency of an episode. Most of the current algorithms for episode discovery under various frequencies are apriori-based level-wise methods. These methods essentially perform a breadth-first search of the pattern space. However currently there are no depth-first based methods of pattern discovery in the frequent episode framework under many of the frequency definitions. In this paper, we try to bridge this gap. We provide new depth-first based algorithms for serial episode discovery under non-overlapped and total frequencies. Under non-overlapped frequency, we present algorithms that can take care of span constraint and gap constraint on episode occurrences. Under total frequency we present an algorithm that can handle span constraint. We provide proofs of correctness for the proposed algorithms. We demonstrate the effectiveness of the proposed algorithms by extensive simulations. We also give detailed run-time comparisons with the existing apriori-based methods and illustrate scenarios under which the proposed pattern-growth algorithms perform better than their apriori counterparts. (C) 2013 Elsevier B.V. All rights reserved.

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In this paper, we consider the setting of the pattern maximum likelihood (PML) problem studied by Orlitsky et al. We present a well-motivated heuristic algorithm for deciding the question of when the PML distribution of a given pattern is uniform. The algorithm is based on the concept of a ``uniform threshold''. This is a threshold at which the uniform distribution exhibits an interesting phase transition in the PML problem, going from being a local maximum to being a local minimum.

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Group VB and VIB M-Si systems are considered to show an interesting pattern in the diffusion of components with the change in atomic number in a particular group (M = V, Nb, Ta or M = Mo, W, respectively). Mainly two phases, MSi2 and M5Si3 are considered for this discussion. Except for Ta-silicides, the activation energy for the integrated diffusion of MSi2 is always lower than M5Si3. In both phases, the relative mobilities measured by the ratio of the tracer diffusion coefficients, , decrease with an increasing atomic number in the given group. If determined at the same homologous temperature, the interdiffusion coefficients increase with the atomic number of the refractory metal in the MSi2 phases and decrease in the M5Si3 ones. This behaviour features the basic changes in the defect concentrations on different sublattices with a change in the atomic number of the refractory components.

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Isochromatic patterns in the vicinity of frictional contacts furnish vital clues for characterizing friction. Though friction effects are evident in a diametrally loaded circular disk, three-point loading provides better results towards highlighting friction. In this paper, a new method of characterizing friction at loading contacts using photoelastic isochromatics patterns is presented. Location of isotropic points (IPs) formed in three-point and four-point loadings of circular disk is used as a main tool to quantify the friction component using theoretical analysis. Bifurcation of isochromatic fringe loops near the distributed loads is explained by the presence of anti-symmetric Hertzian shear traction in addition to Hertzian normal traction. The classical solution by Flamant for point load at the edge of half plane is used to derive stresses in circular disk for all required loading configurations. A semicircualr ring under three-point loading is examined using photoelasticity to understand the isochromatics pattern theoretically by considering normal and shear traction components at loaded regions.

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We demonstrate a new technique to generate multiple light-sheets for fluorescence microscopy. This is possible by illuminating the cylindrical lens using multiple copies of Gaussian beams. A diffraction grating placed just before the cylindrical lens splits the incident Gaussian beam into multiple beams traveling at different angles. Subsequently, this gives rise to diffraction-limited light-sheets after the Gaussian beams pass through the combined cylindrical lens-objective sub-system. Direct measurement of field at and around the focus of objective lens shows multi-sheet pattern with an average thickness of 7.5 mu m and inter-sheet separation of 380 mu m. Employing an independent orthogonal detection sub-system, we successfully imaged fluorescently-coated yeast cells (approximate to 4 mu m) encaged in agarose gel-matrix. Such a diffraction-limited sheet-pattern equipped with dedicated detection system may find immediate applications in the field of optical microscopy and fluorescence imaging. (C) 2015 Optical Society of America

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The notion of structure is central to the subject of chemistry. This review traces the development of the idea of crystal structure since the time when a crystal structure could be determined from a three-dimensional diffraction pattern and assesses the feasibility of computationally predicting an unknown crystal structure of a given molecule. Crystal structure prediction is of considerable fundamental and applied importance, and its successful execution is by no means a solved problem. The ease of crystal structure determination today has resulted in the availability of large numbers of crystal structures of higher-energy polymorphs and pseudopolymorphs. These structural libraries lead to the concept of a crystal structure landscape. A crystal structure of a compound may accordingly be taken as a data point in such a landscape.

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Eutectic growth is an interesting example for exploring the topic of pattern-formation in multi-phase systems, where the growth of the phases is coupled with the diffusive transport of one or more components in the melt. While in the case of binary alloys, the number of possibilities are limited (lamellae, rods, labyrinth etc.), their number rapidly increases with the number of components and phases. In this paper, we will investigate pattern formation during three-phase eutectic solidification using a state-of-the art phase-field method based on the grand-canonical density formulation. The major aim of the study is to highlight the role of two properties, which are the volume fraction of the solid phases and the solid-liquid interfacial energies, in the self-organization of the solid phases during directional growth. Thereafter, we will show representative phase-field simulations of a micro-structure in a real alloy (Ag-Al-Cu) using an asymmetric phase diagram as well as interfacial properties.

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Self-assembly has been recognized as an efficient tool for generating a wide range of functional, chemically, or physically textured surfaces for applications in small scale devices. In this work, we investigate the stability of thin films of polymer solutions. For low concentrations of polymer in the solution, long length scale dewetting patterns are obtained with wavelength approximately few microns. Whereas, for concentrations above a critical value, bimodal dispersion curves are obtained with the dominant wavelength being up to two orders smaller than the usual dewetting length scale. We further show that the short wavelength corresponds to the phase separation in the film resulting in uniformly distributed high and low concentration regions. Interestingly, due to the solvent entropy, at very high concentration values of polymer, a re-entrant behaviour is observed with the dominant length scale now again corresponding to the dewetting wavelength. Thus, we show that the binary films of polymer solutions provide additional control parameters that can be utilized for generating functional textured surfaces for various applications. (C) 2016 AIP Publishing LLC.