49 resultados para high-performance computing, computational modelling, multi-scale simulation, Visible Cell, orthologue mapping, systems biology


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High-kappa TiO2 thin films have been fabricated using cost effective sol-gel and spin-coating technique on p-Si (100) wafer. Plasma activation process was used for better adhesion between TiO2 films and Si. The influence of annealing temperature on the structure-electrical properties of titania films were investigated in detail. Both XRD and Raman studies indicate that the anatase phase crystallizes at 400 degrees C, retaining its structural integrity up to 1000 degrees C. The thickness of the deposited films did not vary significantly with the annealing temperature, although the refractive index and the RMS roughness enhanced considerably, accompanied by a decrease in porosity. For electrical measurements, the films were integrated in metal-oxide-semiconductor (MOS) structure. The electrical measurements evoke a temperature dependent dielectric constant with low leakage current density. The Capacitance-voltage (C-V) characteristics of the films annealed at 400 degrees C exhibited a high value of dielectric constant (similar to 34). Further, frequency dependent C-V measurements showed a huge dispersion in accumulation capacitance due to the presence of TiO2/Si interface states and dielectric polarization, was found to follow power law dependence on frequency (with exponent `s'=0.85). A low leakage current density of 3.6 x 10(-7) A/cm(2) at 1 V was observed for the films annealed at 600 degrees C. The results of structure-electrical properties suggest that the deposition of titania by wet chemical method is more attractive and cost-effective for production of high-kappa materials compared to other advanced deposition techniques such as sputtering, MBE, MOCVD and AID. The results also suggest that the high value of dielectric constant kappa obtained at low processing temperature expands its scope as a potential dielectric layer in MOS device technology. (C) 2015 Elsevier Ltd. All rights reserved.

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Inverters with high voltage conversion ratio are used in systems with sources such as batteries, photovoltaic (PV) modules or fuel cells. Transformers are often used in such inverters to provide the required voltage conversion ratio and isolation. In this paper, a compact high-frequency (HF) transformer interfaced AC link inverter with lossless snubber is discussed. A high performance synchronized modulation scheme is proposed for this inverter. This modulation addresses the issue of over-voltage spikes due to transformer leakage inductance and it is shown that the circuit can operate safely even when the turn-on delay, such as dead-time, is not used in the HF rectifier section. The problem of spurious turn-on in the HF inverter switches is also mitigated by the proposed modulation method. The circuit performance is validated experimentally with a $900W$ prototype inverter.

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Vulnerability of communities and natural ecosystems, to potential impacts of climate change in developing countries like India, and the need for adaptation are rapidly emerging as central issues in the debate around policy responses to climate change. The present study presents an approach to identify and prioritize the most vulnerable districts, villages and households in Karnataka State, through a multi-scale assessment of inherent vulnerability to current climate variability. It also identifies the drivers of inherent vulnerability, thereby providing a tool for developing and mainstreaming adaptation strategies, in ongoing developmental or dedicated adaptation programmes. The multi-scale assessment was made for all 30 districts at the state level in Karnataka, about 1220 villages in Chikballapur district, and at the household level for two villages - Gundlapalli and Saddapalli - in Bagepalli taluk of Chikballapur district. At the district, village and household levels, low levels of education and skills are the dominant factors contributing to vulnerability. At the village and household level, the lack of income diversification and livelihood support institutions are key drivers of vulnerability. The approach of multi-scale vulnerability assessment facilitates identification and prioritization of the drivers of vulnerability at different scales, to focus adaptation interventions to address these drivers.

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We report the tunable dielectric constant of titania films with low leakage current density. Titanium dioxide (TiO2) films of three different thicknesses (36, 63 and 91 nm) were deposited by the consecutive steps of solution preparation, spin-coating, drying, and firing at different temperatures. The problem of poor adhesion between Si substrate and TiO2 insulating layer was resolved by using the plasma activation process. The surface roughness was found to increase with increasing thickness and annealing temperature. The electrical investigation was carried out using metal-oxide-semiconductor structure. The flat band voltage (V-FB), oxide trapped charge (Q(ot)), dielectric constant (kappa) and equivalent oxide thicknesses are calculated from capacitance-voltage (C-V) curves. The C-V characteristics indicate a thickness dependent dielectric constant. The dielectric constant increases from 31 to 78 as thickness increases from 36 to 91 nm. In addition to that the dielectric constant was found to be annealing temperature and frequency dependent. The films having thickness 91 nm and annealed at 600 A degrees C shows the low leakage current density. Our study provides a broad insight of the processing parameters towards the use of titania as high-kappa insulating layer, which might be useful in Si and polymer based flexible devices.