Insight into the Evaporation Dynamics of a Pair of Sessile Droplets on a Hydrophobic Substrate

In this work, we have demonstrated three unique regimes in the evaporation lifecycle of a pair of sessile droplets placed in variable proximity on a hydrophobic substrate. For small separation distance, the droplets undergo asymmetric spatiotemporal,evaporation leading to contact angle hysteresis and suppressed vaporization. The reduced evaporation has been attributed quantitatively to the existence of a constrained vapor-rich dome between the two droplets. However, a dynamic decrease in the droplet radius due to solvent removal marks a return to symmetry in terms of evaporation and contact angle. We have described the variation in evaporation flux using a universal correction factor. We have also demonstrated the existence of a critical separation distance beyond which the droplets in the, droplet pair do not affect each other. The results are crucial to a plethora of applications ranging from surface patterning to lab-on-a-chip devices.

Insight into the Evaporation Dynamics of a Pair of Sessile Droplets on a Hydrophobic Substrate

In this work, we have demonstrated three unique regimes in the evaporation lifecycle of a pair of sessile droplets placed in variable proximity on a hydrophobic substrate. For small separation distance, the droplets undergo asymmetric spatiotemporal,evaporation leading to contact angle hysteresis and suppressed vaporization. The reduced evaporation has been attributed quantitatively to the existence of a constrained vapor-rich dome between the two droplets. However, a dynamic decrease in the droplet radius due to solvent removal marks a return to symmetry in terms of evaporation and contact angle. We have described the variation in evaporation flux using a universal correction factor. We have also demonstrated the existence of a critical separation distance beyond which the droplets in the, droplet pair do not affect each other. The results are crucial to a plethora of applications ranging from surface patterning to lab-on-a-chip devices.

Stabilization of Collective Motion in Synchronized, Balanced and Splay Phase Arrangements on a Desired Circle

This paper proposes a design methodology to stabilize collective circular motion of a group of N-identical agents moving at unit speed around individual circles of different radii and different centers. The collective circular motion studied in this paper is characterized by the clockwise rotation of all agents around a common circle of desired radius as well as center, which is fixed. Our interest is to achieve those collective circular motions in which the phases of the agents are arranged either in synchronized, in balanced or in splay formation. In synchronized formation, the agents and their centroid move in a common direction while in balanced formation, the movement of the agents ensures a fixed location of the centroid. The splay state is a special case of balanced formation, in which the phases are separated by multiples of 2 pi/N. We derive the feedback controls and prove the asymptotic stability of the desired collective circular motion by using Lyapunov theory and the LaSalle's Invariance principle.