Near-field diffraction-based focal length determination technique

An accurate and simple technique for determining the focal length of a lens is presented. It consists of measuring the period of the fringes produced by a diffraction grating at the near field when it is illuminated with a beam focused by the unknown lens. In paraxial approximation, the period of the fringes varies linearly with the distance. After some calculations, a simple extrapolation of data is performed to obtain the locations of the principal plane and the focal plane of the lens. Thus, the focal length is obtained as the distance between the two mentioned planes. The accuracy of the method is limited by the collimation degree of the incident beam and by the algorithm used to obtain the period of the fringes. We have checked the technique with two commercial lenses, one convergent and one divergent, with nominal focal lengths (+100±1) mm and (−100±1) mm respectively. We have experimentally obtained the focal lengths resulting into the interval given by the manufacturer but with an uncertainty of 0.1%, one order of magnitude lesser than the uncertainty given by the manufacturer.

Near-field diffraction of chirped gratings

In this Letter, we analyze the near-field diffraction pattern produced by chirped gratings. An intuitive analytical interpretation of the generated diffraction orders is proposed. Several interesting properties of the near-field diffraction pattern can be determined, such as the period of the fringes and its visibility. Diffraction orders present different widths and also, some of them present focusing properties. The width, location, and depth of focus of the converging diffraction orders are also determined. The analytical expressions are compared to numerical simulation and experimental results, showing a high agreement.

Diffraction by random Ronchi gratings

In this work, we obtain analytical expressions for the near-and far-field diffraction of random Ronchi diffraction gratings where the slits of the grating are randomly displaced around their periodical positions. We theoretically show that the effect of randomness in the position of the slits of the grating produces a decrease of the contrast and even disappearance of the self-images for high randomness level at the near field. On the other hand, it cancels high-order harmonics in far field, resulting in only a few central diffraction orders. Numerical simulations by means of the Rayleigh–Sommerfeld diffraction formula are performed in order to corroborate the analytical results. These results are of interest for industrial and technological applications where manufacture errors need to be considered.