Limitations of high pressure sputtering for amorphous silicon deposition

Amorphous silicon thin films were deposited using the high pressure sputtering (HPS) technique to study the influence of deposition parameters on film composition, presence of impurities, atomic bonding characteristics and optical properties. An optical emission spectroscopy (OES) system has been used to identify the different species present in the plasma in order to obtain appropriate conditions to deposit high purity films. Composition measurements in agreement with the OES information showed impurities which critically depend on the deposition rate and on the gas pressure. We prove that films deposited at the highest RF power and 3.4 × 10^−2 mbar, exhibit properties as good as the ones of the films deposited by other more standard techniques.

Optimization of Enzymes Inactivation in High Pressure Processes

The demand of highest quality foods in terms of taste and their properties preservation without the use of additives is constantly increasing. Consequently, new approaches to food processing have been developed, as for example high-pressure technology which has proven to be very valuable because it allows to maintain good properties of food like some vitamins and, at the same time, to reduce some undesirable bacteria. This technology avoids the use of high temperatures during the process (not like Pasteurization), which may have adverse effect on some nutritional properties of the food, its flavour, etc. The models for some enzymatic inactivations, which depend on the pressure and temperature profiles are presented. This work deals with the optimization of the inactivation of certain enzymes when high pressure treatment on food processing is applied. The optimization algorithms will minimize the inactivation not only of a certain isolated enzyme but also to several enzymes that can be involved simultaneously in the high-pressure process.