Near-field diffraction-based focal length determination technique

An accurate and simple technique for determining the focal length of a lens is presented. It consists of measuring the period of the fringes produced by a diffraction grating at the near field when it is illuminated with a beam focused by the unknown lens. In paraxial approximation, the period of the fringes varies linearly with the distance. After some calculations, a simple extrapolation of data is performed to obtain the locations of the principal plane and the focal plane of the lens. Thus, the focal length is obtained as the distance between the two mentioned planes. The accuracy of the method is limited by the collimation degree of the incident beam and by the algorithm used to obtain the period of the fringes. We have checked the technique with two commercial lenses, one convergent and one divergent, with nominal focal lengths (+100±1) mm and (−100±1) mm respectively. We have experimentally obtained the focal lengths resulting into the interval given by the manufacturer but with an uncertainty of 0.1%, one order of magnitude lesser than the uncertainty given by the manufacturer.

Far field of binary phase gratings with errors in the height of the strips

Diffraction gratings are not always ideal but, due to the fabrication process, several errors can be produced. In this work we show that when the strips of a binary phase diffraction grating present certain randomness in their height, the intensity of the diffraction orders varies with respect to that obtained with a perfect grating. To show this, we perform an analysis of the mutual coherence function and then, the intensity distribution at the far field is obtained. In addition to the far field diffraction orders, a "halo" that surrounds the diffraction order is found, which is due to the randomness of the strips height.

Binary gratings with random heights

We analyze the far-field intensity distribution of binary phase gratings whose strips present certain randomness in their height. A statistical analysis based on the mutual coherence function is done in the plane just after the grating. Then, the mutual coherence function is propagated to the far field and the intensity distribution is obtained. Generally, the intensity of the diffraction orders decreases in comparison to that of the ideal perfect grating. Several important limit cases, such as low- and high-randomness perturbed gratings, are analyzed. In the high-randomness limit, the phase grating is equivalent to an amplitude grating plus a “halo.” Although these structures are not purely periodic, they behave approximately as a diffraction grating.

Dual self-image technique for beam collimation

We propose an accurate technique for obtaining highly collimated beams, which also allows testing the collimation degree of a beam. It is based on comparing the period of two different self-images produced by a single diffraction grating. In this way, variations in the period of the diffraction grating do not affect to the measuring procedure. Self-images are acquired by two CMOS cameras and their periods are determined by fitting the variogram function of the self-images to a cosine function with polynomial envelopes. This way, loss of accuracy caused by imperfections of the measured self-images is avoided. As usual, collimation is obtained by displacing the collimation element with respect to the source along the optical axis. When the period of both self-images coincides, collimation is achieved. With this method neither a strict control of the period of the diffraction grating nor a transverse displacement, required in other techniques, are necessary. As an example, a LED considering paraxial approximation and point source illumination is collimated resulting a resolution in the divergence of the beam of σ φ = ± μrad.

Diffraction by random Ronchi gratings

In this work, we obtain analytical expressions for the near-and far-field diffraction of random Ronchi diffraction gratings where the slits of the grating are randomly displaced around their periodical positions. We theoretically show that the effect of randomness in the position of the slits of the grating produces a decrease of the contrast and even disappearance of the self-images for high randomness level at the near field. On the other hand, it cancels high-order harmonics in far field, resulting in only a few central diffraction orders. Numerical simulations by means of the Rayleigh–Sommerfeld diffraction formula are performed in order to corroborate the analytical results. These results are of interest for industrial and technological applications where manufacture errors need to be considered.