77 resultados para residual stresses

em Chinese Academy of Sciences Institutional Repositories Grid Portal


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An elasto-plastic finite element method is developed to predict the residual stresses of thermal spraying coatings with functionally graded material layer. In numerical simulations, temperature sensitivity of various material constants is included and mix

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In this paper, an accurate formula for calculating the thermal residual stress field in a particle-reinforced composite are presented. Numerical examples are given to show r-variations of the thermal residual stresses. The increase in fracture toughness of matrix predicted by the thermal residual stress field is compared well with the experimentally measured increase.

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发展了一种新的分析涂层结构(平板、梁)热残余应力的模型,可以研究骤冷过程(Quenching)和冷却过程(Cooling)在涂层结构内引发的残余应力分布。与以往模型相比,其优势在于:它可以考虑源于喷涂过程的涂层孔隙率、温度梯度等因素对于涂层和基底内残余应力的影响。其中孔隙率和温度分布由计算机模拟涂层沉积过程得到。另外,当基底的材料和几何参数被固定时,我们分析了诸如涂层的理想模量、厚度、热膨胀系数等参数,对于涂层结构中最终残余应力分布的改变机理。

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The influence of the thermal residual stress on the deformation behavior of a composite has been analyzed with a new micromechanical method. The method is based on secant moduli approximation and a new homogenized effective stress to characterize the plastic state of the matrix. It is found that the generated thermal residual stresses after cooling and their influence on the subsequent deformation behavior depends significantly on the aspect ratio of the inclusions. With prolate inclusions, the presence of thermal residual stresses generate a higher compressive hardening curves of the composite, but it is reversed with oblate inclusions. For particle reinforced composite, thermal residual stresses induce a tensile hardening curve higher than the compressive one and this is in agreement with experimental observations. (C) 1998 Elsevier Science Ltd.

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<正> The SiCw/6061Al composites were fabricated by squeeze casting method. Varia-tions of thermal residual stresses with quenching temperature, cooling manner, aging time and thethermal-cold cycle process in thin specimens,and the distributions of thermal residual stresses alongthe distances from the surface and changes with heating temperatnres in thick specimens were stud-ied by means of X-ray diffraction (XRD). The effects of residual stresses on the mierostructure, di-mensional stability and age-hardening behavior were studied by SEM, TEM observations, and tensiletest. The results showed that there existed macrostress, microstress and thermal mismatch stress inSiCw/Al compo-site,and the presence of microstress and thermal mismatch stress has no influenceon the measurement of macrostress, but the macrostress can affect the measured value of thermalmismatch stress. Thermal res dual stress induced during the composite fabrication process, will be further in-creased when the composite were subjected to the e

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This paper describes the preparation and the characterization Of Y2O3 stabilized ZrO2 thin films produced by electric-beam evaporation method. The optical properties, microstructure, surface morphology and the residual stress of the deposited films were investigated by optical spectroscopy, X-ray diffraction (XRD), scanning probe microscope and optical interferometer. It is shown that the optical transmission spectra of all the YSZ thin films are similar with those of ZrO2 thin film, possessing high transparency in the visible and near-infrared regions. The refractive index of the samples decreases with increasing of Y2O3 content. The crystalline structure of pure ZrO2 films is a mixture of tetragonal phase and monoclinic phase, however, Y2O3 stabilized ZrO2 thin films only exhibit the cubic phase independently of how much the added Y2O3 content is. The surface morphology spectrum indicates that all thin films present a crystalline columnar texture with columnar grains perpendicular to the substrate and with a predominantly open microporosity. The residual stress of films transforms tensile from compressive with the increasing Of Y2O3 molar content, which corresponds to the evolutions of the structure and packing densities. (C) 2008 Elsevier Ltd. All rights reserved.

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HfO2 Elms are deposited on BK7 glass substrates by electron beam evaporation. The influences of annealing between 100 degrees C and 400 degrees C on residual stresses and structures of HfO2 films are studied. It is found that little differences of spectra, residual stresses and structures are obtained after annealing at lower temperatures. After annealing at higher temperatures, the spectra shift to short wavelength, the residual stress increases with the increasing annealing temperature. At the same time, the crystallite size increases and interplanar distance decreases. The variations of optical spectra and residual stress correspond to the evolutions of structures induced by annealing.

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Y2O3 stabilized ZrO2 (YSZ) thin films with different Y2O3 molar contents (0, 3, 7, and 12 mol%) are deposited on BK7 substrates by electron-beam evaporation technique. The effects of different Y2O3 contents on residual stresses and structures of YSZ thin films are studied. Residual stresses are investigated by means of two different techniques: the curvature measurement and x- ray diffraction method. It is found that the evolution of residual stresses of YSZ thin films by the two different methods is consistent. Residual stresses of films transform from compressive stress into tensile stress and the tensile stress increases monotonically with the increase of Y2O3 content. At the same time, the structures of these films change from the mixture of amorphous and monoclinic phases into high temperature cubic phase. The variations of residual stress correspond to the evolution of structures induced by adding of Y2O3 content.

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The partial-dislocation-mediated processes have so far eluded high-resolution transmission electron microscopy studies in nanocrystalline nc Ni with nonequilibrium grain boundaries. It is revealed that the nc Ni deformed largely by twinning instead of extended partials. The underlying mechanisms including dissociated dislocations, high residual stresses, and stress concentrations near stacking faults are demonstrated and discussed.

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对基体界面屈服强度和残余应力失配情况下的界面裂纹扩展机制进行了力学理论分析,并通过位错与裂纹的关系理论计算了界面裂纹尖端塑性区尺寸。结果表明:当界面裂纹由低强度区向高强度区扩展时,高强度区的残余压应力和屈服强度减少了裂纹尖端的塑性区长度和裂纹尖端张开位移,从而起到了抑制界面裂纹扩展的作用。

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A crack intersecting an interface between two dissimilar materials may advance by either penetrating through the interface or deflecting into the interface. The competition between deflection and penetration can be assessed by comparison of two ratios: (i) the ratio of the energy release rates for interface cracking and crack penetration; and (ii) the ratio of interface to material fracture energies. Residual stresses caused by thermal expansion misfit can influence the energy release rates of both the deflected and penetrating crack. This paper analyses the role of residual stresses. The results reveal that expansion misfit can be profoundly important in systems with planar interfaces (such as layered materials, thin film structures, etc.), but generally can be expected to be of little significance in fiber composites. This paper corrects an earlier result for the ratio of the energy release rate for the doubly deflected crack to that for the penetrating crack in the absence of residual stress.

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本文发展一种新的分析涂层结构(平板、梁)热残余应力的模型,可以研究骤冷过程(Quenching)和冷却过程(Cooling)在涂层结构内引发的残余应力分布。与以往模型相比,其优势在于:它可以考虑源于喷涂过程的涂层孔隙率、温度梯度等因素对于涂层和基底内残余应力的影响。其中孔隙率和温度分布由计算机模拟涂层沉积过程得到。另外,当基底的材料和几何参数被固定时,我们分析了诸如涂层的理想模量、厚度、热膨胀系数等参数,对于涂层结构中最终残余应力分布的改变机理。

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用扫描电镜(SEM)观察了化学沉积Ni-P合金薄膜/单晶硅基体的结构与颗粒度,利用X射线衍射(XRD)技术测试了其化学沉积后的残余应力,测量了激光热处理后残余应力的变化规律,分析了残余应力对磨损性能及界面结合强度的影响。实验结果表明,化学沉积Ni-P合金薄膜/硅基体的残余应力均表现为拉应力,经过激光热处理后残余应力发生了变化,由高值的拉应力变为低值的拉应力或压应力;薄膜残余应力对其磨损性能有明显的影响,其磨损量随着残余应力的减小而减小;薄膜与基体结合强度随着残余应力的增大而减小,合理地选择激光热处理参数可

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ZnO/MgF2/ZnO sandwich structure films were fabricated. The effects of a buffer layer on structure and optical properties of ZnO films were investigated by X-ray diffraction, photoluminescence, optical transmittance and absorption measurements. Measurement results showed that the buffer layer had the effects of improving the quality of ZnO films and releasing the residual stresses in the films. The near-band edge emissions of ZnO films deposited on the MgF2 buffer layer were significantly enhanced compared with those deposited on bare substrate due to the smaller lattice mismatch between MgF2 and ZnO than that between fused silica and ZnO. (c) 2006 Elsevier B.V. All rights reserved.