Research on metallic ion beam production at IMP

Since 1998, many experiments for metallic ion production have been done on LECR2 (Lanzhou ECR ion source NO.2), LECR3 (Lanzhou ECR ion source NO.3) and SECRAL (Superconductiong ECR ion source Advanced design in Lanzhou) at Institute of Modern Physics. The very heavy metallic ion beams such as those of uranium were also produced by the plasma sputtering method, and supplied for HIRFL (Heavy Ion Research Facility in Lanzhou) accelerators successfully. During the test, 11.5e mu AU(28+), 9e mu AU(24+) were obtained. Some ion beams of the metal having lower melting temperature such as Ni and Mg ion beams were produced by oven method on LECR3 too. The consumption rate was controlled to be lower for Mg-26 ion beams production, and the minimum consumption was about 0.3mg per hour. In this paper, the main experimental results are given. Some discussions are made for some experimental phenomena and results, and some conclusions are drawn.

Production of EUV power with SECRAL

The high power EUV source is one of key issues in the development of EUV lithography which is considered to be the most promising technology among the next generation lithography. However neither DPP nor LPP seems to meet the requirements of the commercial high-volume product. Insufficiency of DPP and LPP motivate the investigation of other means to produce the EUV radiation required in lithography. ECR plasma seems to be one of the alternatives. In order to investigate the feasibility of ECR plasma as a EUV light source, the EUV power emitted by SECRAL was measured. A EUV power of 1.03W in 4 pi sr solid angle was obtained when 2000W 18GHz rf power was launched, and the corresponding CE was 0.5%. Considering that SECRAL is designed to produce very high charge state ions, this very preliminary result is inspiring. Room-temperature ECR plasma and Sn plasma are both in the planned schedule.