Anisotropic radiation pattern from InGaAlP quantum well mesa-like microdisks

To overcome the isotropic directional emission of an ideal circular microdisk, two kinds of cylindrical mesa-like InGaAlP single quantum well (SQW) microdisks emitting at a visible red wavelength of 0.66 mu m have been fabricated. An anisotropic luminescence pattern was revealed by the microscopic fluorescence (FL) image. FL intensity, preferentially enhanced with twofold symmetry, appeared at the circumference of the InGaAlP SQW microdisks. Our results demonstrated that anisotropic radiation can be achieved by geometry shaping of the disks on the top view two-dimensional boundary slightly deformed from circular shape and/or on the side-view cross-section of the circular mesa by wet etching anisotropic undercut. (C) 2000 Elsevier Science Ltd. All rights reserved.

他克莫司对UVA照射后HaCaT细胞增殖的影响

　目的　探讨不同浓度他克莫司(TM)对不同强度长波紫外线(UVA)照射HaCaT细胞24h和48h后细胞 增殖活性的影响。方法将培养的HaCaT细胞分别行2, 4 和8J / cm2 的UVA 照射,且照射前1h 分别加入50, 500 和 5 000pg/mL的TM,对照组分别加入50, 500和5 000pg/mL的TM,但不行UVA照射。各剂量组分别照射24h和48h后在 倒置相差显微镜下观察细胞的形态变化,MTT法检测细胞的增殖活性。结果　HaCaT细胞经UVA照射24h后,细胞连接 松散,细胞折光性较未照射组差,部分细胞死亡、脱壁;与未经UVA照射组相比,细胞增殖受到抑制( P < 0. 05) ,加入TM 组无明显变化( P > 0. 05) ;照射48h后细胞虽有大量增殖,但体积较小;与未经UVA 照射组相比,细胞增殖明显( P < 0. 05) ,加入TM组细胞增殖受到抑制(P < 0. 05) 。结论　TM可抑制UVA照射HaCaT细胞引起的过度增殖,对UVA照射 后的HaCaT细胞有保护作用。

THEORETICAL CALCULATION FOR SHUBNIKOV-DEHAAS OSCILLATIONS IN DEEP MESA STRUCTURES

We have used the rectangular confinement potential to describe Shubnikov-deHaas oscillations produced by one-dimensional electrons confined in deep mesa structures. The edge distortion of the confinement potential caused by electrostatic image forces is taken into account. The model contains no fitting parameters and relates well with experimental data. The comparison with earlier reported parabolic model is presented,

Effect of Mesa Size on Thermal Characteristics of Vertical-cavity Surface-emitting Lasers

The effect of mesa size on the thermal characteristics of etched mesa vertical-cavity surfaceemitting lasers(VCSELs) is studied. The numerical results show that the mesa size of the top mirror strongly influences the temperature distribution inside the etched mesa VCSEL. Under a certain driving voltage, with decreasing mesa size, the location of the maximal temperature moves towards the p-contact metal, the temperature in the core region of the active layer rises greatly, and the thermal characteristics of the etched mesa VCSELs will deteriorate.