突出电极对四杆型RFQ腔体并联阻抗及场平整性的影响；Influence of projecting electrodes on shunt impedance and flatness of 4-rod radiofrequency quadrupole cavity

中国科学院近代物理研究所正在进行等离子体直接注入方案的研究,以便为重离子物理研究提供稳定可靠的高流强束流。由于工作频率较低,用于等离子体直接注入方案的RFQ腔体采用了适合于低频的四杆型结构。在完成束流动力学设计的前提下,研究了RFQ腔体支撑臂的各参数对并联阻抗的影响。由于突出电极之间存在着一定大小的电容,会对腔体的性能产生影响,为使腔体达到最优化的设计,进行了突出电极对并联阻抗及场平整性的影响的研究,并给出了突出电极的取值范围。

Impact of hydrogen dilution on microstructure and optoelectronic properties of silicon films deposited using tirisilane

We explored the deposition of hydrogenated amorphous silicon (a-Si: H) using trisilane (Si3H8) as a gas precursor in a radiofrequency plasma enhanced chemical vapour deposition process and studied the suitability of this material for photovoltaic applications. The impact of hydrogen dilution on the deposition rate and microstructure of the films is systematically examined. Materials deposited using trisilane are compared with that using disilane (Si2H6). It is found that when using Si3H8 as the gas precursor the deposition rate increases by a factor of similar to 1.5 for the same hydrogen dilution (R = [H-2]/[Si3H8] or [H-2]/[Si2H6])- Moreover, the structural transition from amorphous to nanocrystalline occurs at a higher hydrogen dilution level for Si3H8 and the transition is more gradual as compared with Si2H6 deposited films. Single-junction n-i-p a-Si: H solar cells were prepared with intrinsic layers deposited using Si3H8 or Si2H6. The dependence of open circuit voltage (V-oc) on hydrogen dilution was investigated. V-oc greater than 1 V can be obtained when the i-layers are deposited at a hydrogen dilution of 180 and 100 using Si3H8 and Si2H6, respectively.