Er3+ and Yb3+ codoped phosphate laser glass for high power flashlamp pumping

A novel Vb(3+)-Er-(3+) codoped phosphate glass for high power flashlamp pumping and high repetition rate laser at 1.54 mu m, designated EAT5-2, is developed. The weight-loss rate of is 1.3 x 10(-5) gcm(-2) h(-1) in boiling water, which is comparable to Kigre's QX-Er glass. Some spectroscopic parameters are analysed by Judd-Ofelt theory and McCumber theory The emission cross section is calculated to be 0.73 x 10(-20) cm(2). The thermo-mechanical properties of EAT5-2 are modified after an ion-exchange chemical strengthening process in a KNO3/NaNO3 molten salt bath. The thresholds for optical damage from the flashlamp pumping are tested on glass rods. A repetition rate of 15 Hz is achieved for chemically strengthened glass. The laser experimental results at. 1.54 mu m from flashlamp pumping are also reported.

Nuclear matter at a HIRFL-CSR energy regime

We report some recent progress in constraining the symmetry energy E-sym(rho) at high densities using high-energy heavy-ion collisions. Circumstantial evidence of a soft E-sym(rho) at supra-saturation density is obtained by comparing the pion ratio pi(-)/pi(+) measured recently with FOPI at GSI and the IBUU04 model calculations. Detailed studies indicate that the power of determining the E-sym(rho)from pi(-)/pi(+) is enhanced with decreasing the beam energy to near the pion production threshold, showing a correlation to the increasing nuclear stopping. Among several heavy-ion reaction facilities in the world, the cooling storage ring (HIRFL-CSR), newly commissioned at Lanzhou, delivering heavy-ion beams up to 1 A GeV, to be coupled with advanced detectors will contribute significantly to further studies of the equation of state of asymmetric nuclear matter.

Production of EUV power with SECRAL

The high power EUV source is one of key issues in the development of EUV lithography which is considered to be the most promising technology among the next generation lithography. However neither DPP nor LPP seems to meet the requirements of the commercial high-volume product. Insufficiency of DPP and LPP motivate the investigation of other means to produce the EUV radiation required in lithography. ECR plasma seems to be one of the alternatives. In order to investigate the feasibility of ECR plasma as a EUV light source, the EUV power emitted by SECRAL was measured. A EUV power of 1.03W in 4 pi sr solid angle was obtained when 2000W 18GHz rf power was launched, and the corresponding CE was 0.5%. Considering that SECRAL is designed to produce very high charge state ions, this very preliminary result is inspiring. Room-temperature ECR plasma and Sn plasma are both in the planned schedule.

基于CPLD和ATMEGAL128的数字电源系统的设计；Design of Digital Power Control System Based on CPLD and ATMEGAL128

介绍了一种基于CPLD设计的电源控制模块,并且利用Atmegal128单片机和RTL8019S实现逻辑功能和远程控制功能。该电源系统主要用于重离子加速器注入器(SFC)中,具有很好的灵活性、可远程控制、性能稳定等特点。