8 resultados para Morse
em Chinese Academy of Sciences Institutional Repositories Grid Portal
Resumo:
By means of Tersoff and Morse potentials, a three-dimensional molecular dynamics simulation is performed to study atomic force microscopy cutting on silicon monocrystal surface. The interatomic forces between the workpiece and the pin tool and the atoms of workpiece themselves are simulated. Two partial edge dislocations are introduced into workpiece Si, it is found that the motion of dislocations does not occur during the atomic force microscopy cutting processing. Simulation results show that the shear stress acting on dislocations is far below the yield strength of Si. (c) 2008 Elsevier Ltd. All rights reserved.
Resumo:
By means of Tersoff and Morse potentials, a three-dimensional molecular dynamics simulation is performed to study atomic force microscopy cutting on silicon monocrystal surface. The interatomic forces between the workpiece and the pin tool and the atoms of workpiece themselves are calculated. A screw dislocation is introduced into workpiece Si. It is found that motion of dislocations does not occur during the atomic force microscopy cutting processing. Simulation results show that the shear stress acting on dislocation is far below the yield strength of Si.
Resumo:
<正> 我们知道,晶须的强度远远大于大晶体的强度,很可能接近于理想晶体的理论强度.而晶须的轴线则通常平行于晶体的三个主要方向[100],[110]或[111]。因此当计算理想晶体在单轴应力下的理论强度时,也必须考虑不同的应力方向.七十年代,Milstein等人利用Morse势和Born稳定性判据计算了立方晶体分别在[100],[110]和[111]单轴应力下的理论强度.由于有心力近似受到Cauchy关系的限制,我们在文献
Resumo:
Molecular dynamics (MD) simulations using Morse interaction potential are performed in studies of [110] symmetrical tilt grain boundary (GB) structures with mis-orientation angles 50.5 degrees(Sigma 11), 129.5 degrees(Sigma 11), 70.5 degrees(Sigma 3) and 109.5 degrees(Sigma 3) at various tempratures. The GB structures are found to start local disordering at about 0.5T(m)(T-m is the melting point of aluminium) for 50.5 degrees(Sigma 11), 0.32T(m) for 129.5 degrees(Sigma 11) and 0.38T(m) for 70.5 degrees(Sigma 3), respectively. These results agree with conclusions deduced from the anelastic measurements. But, for twin-boundary structure 109.5 degrees(Sigma 3), this disordering has not been found even when temperature increases up to 0.9T(m).
Resumo:
In this paper, we mainly deal with cigenvalue problems of non-self-adjoint operator. To begin with, the generalized Rayleigh variational principle, the idea of which was due to Morse and Feshbach, is examined in detail and proved more strictly in mathematics. Then, other three equivalent formulations of it are presented. While applying them to approximate calculation we find the condition under which the above variational method can be identified as the same with Galerkin's one. After that we illustrate the generalized variational principle by considering the hydrodynamic stability of plane Poiseuille flow and Bénard convection. Finally, the Rayleigh quotient method is extended to the cases of non-self-adjoint matrix in order to determine its strong eigenvalne in linear algebra.
Resumo:
晶界结构在高温下的热稳定性问题是一个长期争论而又未能解决的问题,其争论的焦点是:在远低于熔点的温度下,晶界结构是否发生了可观察到的无序化,即是否存在一个远低于熔点的结构转化温度。为了能澄清这一争论,本文系统地研究了晶界结构的热稳定性。为了消除相互作用势的影响和系统误差,本文首先采用Morse势和经验多体势分别对铝、铜单晶的熔化过程进行了分子动力学模拟。在平衡态下,通过计算表征结构无序化的静态结构因子、径向分布函数和单晶原子位形图,获得了铝、铜单晶的熔点,结果表明:多体势计算的铝和铜的单晶熔点更接近实验值。因此,采用经验多体势应用分子动力学方法分别模拟了铝、铜Σ3、Σ5、Σ9、Σ11、Σ19、Σ33六种对称倾侧双晶晶界晶界结构由有序向无序转化的过程,计算了平衡态下的表征结构无序化的静态结构因子、径向分布函数和晶界原子位形图并将多体势获得的铝、铜单晶熔点作为晶界结构转化温度的约化熔点,获得了铝、铜Σ3、Σ5、Σ9、Σ11、Σ19、Σ33六种对称倾侧双晶晶界结构的转化温度和熔点,结果表明:1.Σ5、Σ9、Σ11、Σ19、Σ33五种对称倾侧双晶晶界均在远低于单晶熔点温度时,晶界结构发生了可观察到的无序化,而且双晶晶界结构的转变温度相差不大,双晶晶界熔点也低于单晶熔点。2.Σ3晶界在温度远低于熔点时,其晶界结构没有发生可观察到的无序化;Σ3晶界的转化温度与单晶熔点接近。所以,可以认为Σ3晶界不存在转化温度。这是由于Σ3晶界为共格孪晶,具有较低的能量。综上所述,除Σ3共格孪晶外,在远低于熔点温度下,晶界结构发生了可观察到的无序化,即:存在一个远低于熔点的转化温度,此时其静态结构因子约为0.5左右;晶界结构的熔点均低于单晶熔点,此时其静态结构因子约为0.15左右。从全文模拟结果可以看出,静态结构因子、径向分布函数、晶界原子位形图三种方法在确定晶界的结构转化温度和熔点时,静态结构因子是最有效、最准确的定量方法。
Resumo:
The thermal expansion coefficient (TEC) of an ideal crystal is derived by using a method of Boltzmann statistics. The Morse potential energy function is adopted to show the dependence of the TEC on the temperature. By taking the effects of the surface relaxation and the surface energy into consideration, the dimensionless TEC of a nanofilm is derived. It is shown that with decreasing thickness, the TEC can increase or decrease, depending on the surface relaxation of the nanofilm.