拼接光栅压缩器的时域特性

在拼接光栅和拼接光栅压缩器的设计中,子光栅调节偏差不可避免,各维偏差与拼接光栅的时间特性之间的关系很关键。通过脉冲压缩理论分析得到各维偏差和聚焦脉冲时间宽度展宽之间的解析关系,从数值计算结果分析,面平行左右偏差对脉冲的时间宽度影响较大,必须控制在21.08 μrad内；条纹密度差异对脉冲宽度的影响很显著,相对条纹密度的比值应控制在10-5以内；从消除角色散的角度分析,面平行俯仰偏差和条纹平行度偏差可以相互补偿,条纹密度差异和面平行左右偏差也可以相互补偿。

阵列光栅压缩器的空域特性

引入角度偏差、位移偏差作为拼接光栅系统的物理参数，定义了拼接光栅的孔径函数，利用傅里叶角谱理论研究了高斯脉冲入射拼接光栅压缩器后的远场分布特性。研究表明；出射脉冲仍然是高斯型脉冲，但包络中心发生偏移，偏移量由角度偏差量和光束口径决定；位移偏差引入的相位随着拼接光栅压缩器传递，其对远场焦斑的影响，取决于每片子光栅的非整数倍光栅常数的横向位移偏差和纵向位移偏差的综合作用。通过数值计算得到了各维偏差对阵列光栅压缩器空域特性的影响，计算表明：光栅面外角度偏差（俯仰左右）和条纹平行度偏差都必须控制在1μrad以内，

有限尺寸光栅压缩器的优化设计

分析了超短超强激光系统中有限尺寸光栅压缩器设计的关键物理参数及约束条件,得到了压缩器优化的三项基本变量。给出了一种输出能量最大化的压缩器优化方法,进而确定了有限尺寸光栅压缩器的最大工作能力。针对传统的圆光束方案提出了改进的椭圆光束方案,增大了聚焦能量,减小了焦斑尺寸,提高了峰值聚焦功率密度。通过数值模拟对500 mm曝光口径介质膜光栅在圆光束和椭圆光束两种方案下的最大输出能力进行分析比较,指出单块光栅在椭圆光束方案下可以实现500 fs,500 J,1 PW的脉冲输出。

Miniature pulse compressor of deep-etched gratings

We propose a miniature pulse compressor that can be used to compensate the group velocity dispersion that is produced by a commercial femtosecond laser cavity. The compressor is composed of two identical highly efficient deep-etched transmissive gratings. Compared with prism pairs, highly efficient deep-etched transmissive grating pairs are lightweight and small. With an optimized groove depth and a duty cycle, 98% diffraction efficiency of the -1 transmissive order can be achieved at a wavelength of 800 nm under Littrow conditions. The deep-etched gratings are fabricated in fused silica by inductively coupled plasma etching. With a pair of the fabricated gratings, the input positively chirped 73.9 fs pulses are neatly compressed into the nearly Fourier transform-limited 43.2 fs pulses. The miniature deep-etched grating-based pulse compressor should be of interest for practical applications. (c) 2008 Optical Society of America

Design and control of an ultraprecision stage used in grating tiling

In petawatt laser system, the gratings used to compose pulse compressor are very large in size which can be only acquired currently by arraying small aperture gratings to form a large one instead, an approach referred to as grating tiling. Theory and experiments have demonstrated that the coherent addition of multiple small gratings to form a larger grating is viable, the key technology of which is to control the relative position and orientation of each grating with high precision. According to the main factors that affect the performance of the grating tiling, a 5-DOF ultraprecision stage is developed for the grating tiling experiment. The mechanism is formed by serial structures. The motion of the mechanism is guided by flexure hinges and driven by piezoelectric actuators and the movement resolution of which can achieve nanometer level. To keep the stability of the mechanism, capacitive position sensors with nanometer accuracy are fixed on it to provide feedback signals with which to realize closed-loop control, thus the positioning precision of the mechanism is within several nanometers range through voltage control and digital PID algorithm. Results of experiments indicate that the performance of the mechanism can meet the requirement of precision for grating tiling.}

Split-aperture laser pulse compressor design tolerant to alignment and line-density differences

We introduce a four-pass laser pulse compressor design based on two grating apertures with two gratings per aperture that is tolerant to some alignment errors and, importantly, to grating-to-grating period variations. Each half-beam samples each grating in a diamond-shaped compressor that is symmetric about a central bisecting plane. For any given grating, the two half-beams impinge on opposite sides of its surface normal. It is shown that the two split beams have no pointing difference from paired gratings with different periods. Furthermore, no phase shift between half-beams is incurred as long as the planes containing a grating line and the surface normal for each grating of the pair are parallel. For grating pairs satisfying this condition, gratings surfaces need not be on the same plane, as changes in the gap between the two can compensate to bring the beams back in phase. © 2008 Optical Society of America.

Characteristics of high reflection mirror with an SiO2 top layer for multilayer dielectric grating

The high reflection (HR) mirror composed of dielectric stacks with excellent spectrum characteristics and high damage resistant ability is critical for fabricating multilayer dielectric (MLD) grating for pulse compressor. The selection of the SiO2 material as the top layer of the HR mirror for grating fabrication is beneficial for improving the laser-induced damage threshold of MLD grating as well as minimizing the standing-wave effect in the photoresist during the exposure process. Based on an (HLL) H-9 design comprising quarter-waves of HfO2 ( H) and half-waves of SiO2 ( L), we obtain an optimal design of the HR mirror for MLD grating, the SiO2 top layer of which is optimized with a merit function including both the diffraction efficiency of the MLD grating and the electric field enhancement in the grating. Dependence of the performance of the MLD grating on the fabrication error of the dielectric mirror is analysed in detail. The HR mirror is also fabricated by E-beam evaporation, which shows good spectral characteristics at the exposure wavelength of 413 nm and at the operation wavelength of 1053 nm and an average damage threshold of 10 J cm(-2) for a 12 ns pulse.

Design of high-efficiency diffraction gratings based on total internal reflection for pulse compressor

We present designs of high-efficiency compression grating based on total internal reflection (TIR) for picosecond pulse laser at 1053 nm. The setup is devised by directly etching gratings into the bottom side of a prism so that light can successfully enter (or exit) the compression grating. Dependence of the -1 order diffraction efficiencies on the constructive parameters is analyzed for TE- and TM-polarized incident light at Littrow angle by using Fourier modal method in order to obtain optimal grating structure. The electric field enhancement within the high-efficiency TIR gratings is regarded as another criterion to optimize the structure of the TIR gratings. With the criterion of high diffraction efficiency, low electric field enhancement and sufficient manufacturing latitude, TIR compression gratings with optimized constructive parameters are obtained for TE- and TM-polarized incident light, respectively. The grating for TE-polarized light exhibits diffraction efficiencies higher than 0.95 within 23 nm bandwidth and relatively low square of electric field enhancement ratio of 5.7. Regardless of the internal electric field enhancement, the grating for TM-polarized light provides diffraction efficiencies higher than 0.95 within 42 nm bandwidth. With compact structure, such TIR compression gratings made solely of fused silica should be of great interest for application to chirped pulse amplification (CPA) systems. (c) 2007 Elsevier B.V. All rights reserved.

Quasi-Dammann Grating With Proportional Intensity Array Spots

A quasi-Dammann grating is proposed to generate array spots with proportional-intensity orders in the far field. To describe the performance of the grating, the uniformities of the array spots are redefined. A two-dimensional even-sampling encode scheme is adopted to design the quasi-Dammann grating. Numerical solutions of the binary-phase quasi-Dammann grating with proportional-intensity orders are given. The experimental results with a third-order quasi-Dammann grating, which has an intensity proportion of 3:2:1 from zero order to second order, are presented. (C) 2008 Optical Society of America

Phase-type quantum-dot-array diffraction grating

A novel phase-type quantum-dot-array diffraction grating (QDADG) is reported. In contrast to an earlier amplitude-type QDADG [C. Wang , Rev. Sci. Instrum. 78, 053503 (2007)], the new phase-type QDADG would remove the zeroth order diffraction at some certain wavelength, as well as suppressing the higher-order diffractions. In this paper, the basic concept, the fabrication, the calibration techniques, and the calibration results are presented. Such a grating can be applied in the research fields of beam splitting, laser probe diagnostics, and so on.

Ultrafast transient ring-shaped population grating

We demonstrate an ultrafast transient, ring-shaped population grating induced by an ultrashort hollow Gaussian laser bullet by solving the three-dimensional full-wave Maxwell-Bloch equations. Through adjusting the beam waist and the area of the pulse, we can control the number of lines and the period of the grating. Based on this coherent control scheme, a door to produce gratings with complex transverse structure is opened.

基于多台阶反射光栅的飞秒脉冲压缩装置

反射式光栅对是一种具有负色散性质的器件,可用于飞秒激光脉冲的压缩和展宽,具有无材料色散的优点。给出了一种基于多台阶反射光栅的脉冲压缩装置。该装置为倍密度光栅结构,由两个周期分别为40μm和20μm的四台阶反射式光栅组成。实验得到的衍射效率可以达到70%以上,输入脉冲经过两个光栅的衍射后会按原路返回,从而达到色散补偿的效果。利用此压缩装置,脉冲宽度为66.8 fs的输入脉冲压缩至接近傅里叶变换极限脉冲,即46.6 fs,由此证明只要多台阶光栅效率足够高,此装置就有可能成为不同于棱镜对进行飞秒脉冲腔内和腔外压缩的另一种途径。