支持可扩展性的设计模式协作研究

在软件设计中,设计模式已被大量采用,以提高系统的可扩展性、可重用性和可维护性。从使用设计模式应用的实际例子出发,研究设计模式在实际的应用中会遇到的协作方面的问题。从系统的可扩展性角度讨论了设计模式协作的度量准则,从中提出了设计模式协作的友好性分类,并通过设计模式的应用的实例来分析设计模式协作的友好性分类准则的使用方式,对设计模式的协作使用提出了指导性的意见和建议。

软件设计模式在移动机器人控制系统中的应用

介绍了软件设计模式的基本概念和主要特点。分析了已有移动机器人平台控制系统的功能需求,阐述了总线模式的结构及实现机制。运用总线模式设计了机器人控制系统,并在QNX平台下使用标准C++完成了该控制系统的实现。设计实现的控制系统结构合理,具有很强的实时性、可靠性和可扩展性。

A novel method to design flexible URAs

Aperture patterns play a vital role in coded aperture imaging ( CAI) applications. In recent years, many approaches were presented to design optimum or near-optimum aperture patterns. Uniformly redundant arrays (URAs) are, undoubtedly, the most successful for constant sidelobe of their periodic autocorrelation function. Unfortunately, the existing methods can only be used to design URAs with a limited number of array sizes and fixed autocorrelation sidelobe-to-peak ratios. In this paper, we present a novel method to design more flexible URAs. Our approach is based on a searching program driven by DIRECT, a global optimization algorithm. We transform the design question to a mathematical model, based on the DIRECT algorithm, which is advantageous for computer implementation. By changing determinative conditions, we obtain two kinds of types of URAs, including the filled URAs which can be constructed by existing methods and the sparse URAs which have never been mentioned by other authors as far as we know. Finally, we carry out an experiment to demonstrate the imaging performance of the sparse URAs.

Optimization of thin-film design for multi-layer dielectric grating

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)H-9 design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al2O3 between the initial design and an optimized HfO2 top layer. The optimized MLD coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8 degrees for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2 degrees for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation. (c) 2006 Elsevier B.V. All rights reserved.

Mode Analysis and Design of a Low-Loss Photonic Crystal 60 degrees Waveguide Bend

The guided modes of a two-dimensional photonic crystal straight waveguide and a waveguide bend are studied in order to find the high transmission mechanism for the waveguide bend. We find that high transmission occurs when the mode patterns and wave numbers match, while the single-mode condition in the waveguide bend is not necessarily required. According to the mechanism, a simply modified bend structure with broad high transmission band is proposed. The bandwidth is significantly increased from 19 to 116 nm with transmission above 90%, and covers the entire C band of optical communication.

A cunning strategy in design of polymeric nanomaterials with novel microstructures

A relative approach, based on the dynamic density functional theory, for simulating the solvent evaporation rate dependence of self-assembly process of block copolymers in solution is proposed. The di- and triblock copolymers are first chosen as the candidates for exploration of novel microstructures. The results reveal that asymmetrical block copolymers with unequal block length, which generally exhibit disordered microdomain patterns in melts, have the ability to assemble into periodic ordered microdomain patterns by properly controlling solvent evaporation rate, e.g., diblock copolymers may assemble into lamellar microstructures with lamellar thickness proportional to individual block length. This simulation suggests a strategy of design and manufacture of polymeric nanomaterials with novel microstructures.