9 resultados para Chemical control. eng

em Chinese Academy of Sciences Institutional Repositories Grid Portal


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Multiphoton ionization of NO via intermediate Rydberg states with ultra-short laser pulses is investigated with time-resolved photoelectron spectroscopy in combination with fermosecond pump-probe technology. The Rydberg states of NO, which are characterized by obvious ac-Stark shift in ultra-strong laser field, can be tuned in resonance to ionize NO molecule at one's will with identical laser pulses, i.e., one can 'select' resonance path to ionization. The results shown in this Letter demonstrate that the states holding notable dynamic Stark shift provide us another dimension to chemical control with strong laser field. (C) 2003 Elsevier Science B.V. All rights reserved.

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抗旱节水化控技术是一种很有发展前景的农业节水技术。它具有操作简便、投入少、见效快、易推广的优点 ,因而是一般常规技术所无法替代的。本文介绍了几种主要的抗旱节水化控制剂 (保水剂、土壤蒸发抑制剂、植物抗蒸腾剂、土壤结构改良剂和植物生长调节剂 )的特性及应用效果 ,并指出了该技术研究中存在的一些问题 ,以期为化学节水技术广泛应用提供理论参考。

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Employing the metal-organic chemical vapour deposition (MOCVD) technique, we prepare ZnO samples with different morphologies from the film to nanorods through conveniently changing the bubbled diethylzinc flux (BDF) and the carrier gas flux of oxygen (OCGF). The scanning electron microscope images indicate that small BDF and OCGF induce two-dimensional growth while the large ones avail quasi-one-dimensional growth. X-ray diffraction (XRD) and Raman scattering analyses show that all of the morphology-dependent ZnO samples are of high crystal quality with a c-axis orientation. From the precise shifts of the 2 theta. locations of ZnO (002) face in the XRD patterns and the E-2(high) locations in the Raman spectra, we deduce that the compressive stress forms in the ZnO samples and is strengthened with the increasing BDF and OCGF. Photoluminescence spectroscopy results show all the samples have a sharp ultraviolet luminescent band without any defects-related emission. Upon the experiments a possible growth mechanism is proposed.

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The effects of In doped low-temperature (LT) AlGaN interlayer on the properties of GaN/Si(111) by MOCVD have been investigated. Using In doping LT-interlayer can decrease the stress sufficiently for avoiding crack formation in a thick (2.0 mu m) GaN layer. Significant improvement in the crystal and optical properties of GaN layer is also achieved. In doping is observed to reduce the stress in AlGaN interlayer measured by high-resolution X-ray diffraction (HRXRD). It can provide more compressive stress to counteract tensile stress and reduce crack density in subsequent GaN layer. Moreover, as a surfactant, indium is observed to cause an enhanced PL intensity and the narrowed linewidths of PL and XRD spectra for the LT-interlayer. Additionally, the crystal quality of GaN layer is found to be dependent on the growth parameters of underneath In-doped LT-AlGaN interlayer. The optimal parameters, such as TMIn flow rate, TMAl flow rates and thickness, are achieved to obtain nearly 2.0 mu m thick crack free GaN film with advanced optical and crystal properties. (c) 2005 Elsevier B.V. All rights reserved.

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The prospects of control chemical reaction in high-intensity laser field are talked about here, and some experimental and theoretical designs are reviewed and discussed also.

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Large size bulk silicon carbide (SiC) crystals are commonly grown by the physical vapor transport (PVT) method. The PVT growth of SiC crystals involves sublimation and condensation, chemical reactions, stoichiometry, mass transport, induced thermal stress, as well as defect and micropipes generation and propagation. The quality and polytype of as-grown SiC crystals are related to the temperature distribution inside the growth chamber during the growth process, it is critical to predict the temperature distribution from the measured temperatures outside the crucible by pyrometers. A radio-frequency induction-heating furnace was used for the growth of large-size SiC crystals by the PVT method in the present study. Modeling and simulation have been used to develop the SiC growth process and to improve the SiC crystal quality. Parameters such as the temperature measured at the top of crucible, temperature measured at the bottom of the crucible, and inert gas pressure are used to control the SiC growth process. By measuring the temperatures at the top and bottom of the crucible, the temperatures inside the crucible were predicted with the help of modeling tool. SiC crystals of 6H polytype were obtained and characterized by the Raman scattering spectroscopy and SEM, and crystals of few millimeter size grown inside the crucible were found without micropipes. Expansion of the crystals were also performed with the help of modeling and simulation.

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In this paper, an AC plasma arc reactorwithworkinggasofhydrogen is applied to destruct chemicalagents. The temperature attains 6000℃ in the arc area and over 2000℃ in the other space of the crucible. The Arsenic (As) contained chemical agent -Adams (DM) used in the experiment, was added into the plasmareactorwith the additives: Fe, CaO, and SiO_2, etc. Pyrolysis and destructionofchemicalagents occurs very quickly in the high-temperature reactor. Gaseous hydrogen was injected into the reactor to form a reductive environment, to reduce the formation of As_2O_3 etc. In the bottom of the crucible, the solid residues of toxicant and additives were melted and formed as vitrified slag. The off-gas was treated by a wet scrubber. The amounts of arsenic distributed in the off-gas, vitrified slag, waste water and solids (soot) were measured. The result shows DM is completely destructed in the plasmareactor. The Arsenic content in the off-gas, vitrified slag, waste water and soot are 0.052 mg/l, 3.0%, 10.44 mg/l, and 5.1% respectively, which will be disposed as the pollutant matters. The results show that the plasma technology is an environmentally friendly technology to destruct chemicals.