244 resultados para holographic lithography


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A nonvolatile recording scheme is proposed using LiNbO3:Ce:Cu crystals and modulated UV light to record gratings simultaneously in two centres and using red light to bleach the grating in the shallow centre to realize persistent photorefractive holographic storage. Compared with the normal UV-sensitized nonvolatile holographic system, the amplitude of refractive-index changes is greatly increased and the recording sensitivity is significantly enhanced by recording with UV light in the LiNbO3:Ce:Cu crystals. Based on jointly solving the two-centre material equations and the coupled-wave equations, temporal evolutions of the photorefractive grating and the diffraction effciency are effectively described and numerically analysed. Roles of doping levels and recording-beam intensity are discussed in detail. Theoretical results confirm and predict experimental results.

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Modulated UV light is used to increase the sensitivity of the two-centre holographic recording. Inherent mechanisms of nonvolatile holographic recording in oxidized and reduced crystals are numerically analysed based on solving the two-centre material equations modilied for UV-Iight recording. Experiments verification is performed with an oxidized crystal and a reduced crystal, and the role of UV intensity on the sensitivity is presented.

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We propose a united theory that describes the two-center recording system by taking scattering noise into account. The temporal evolution of the signal-to-noise ratio in doubly doped photorefractive crystals is described based on jointly solving material equations and coupled-wave equations with the fourth-order Runge-Kutta method. Roles of microcosmic optical parameters of dopants on the signal-to-noise ratio are discussed in detail. The theoretical results can confirm and predict experimental results. (c) 2005 Elsevier GmbH. All rights reserved.

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By jointly solving two-centre material equations with a nonzero external electric field and coupled-wave equations, we have numerically studied the dependence of the non-volatile holographic recording in LiNbO3:Ce:Cu crystals on the external electric field. The dominative photovoltaic effect of the non-volatile holographic recording in doubly doped LiNbO3 crystals is directly verified. And an external electric field that is applied in the positive direction along the c-axis (or a large one in the negative direction of the c-axis) in the recording phase and another one that is applied in the negative direction of the c-axis in the fixing phase are both proved to benefit strong photorefractive performances. Experimental verifications are given with a small electric field applied externally.

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The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

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提出了一种在双掺杂铌酸锂晶体中用调制的双紫外光进行非挥发全息记录的方法。与通常的用紫外光敏化的非挥发全息记录相比,这种方法可以大幅度地提高光栅强度和记录灵敏度。联立双中心物质方程和双光束耦合波方程,数值分析了光栅强度和衍射效率随时间的变化并讨论了掺杂浓度和记录光强对紫外光非挥发全息记录机制下光折变效应的影响。研究发现,紫外光记录得到的深浅中心的光栅具有相同的相位,总的光栅(深浅中心光栅的叠加)强度为两光栅强度之和,固定过程中深中心的光栅得到增强;增大深浅中心掺杂的浓度可以提高光栅强度,增大记录紫外光的光强

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In LiNbO3:Fe, anomalous behaviour of grating erasure is observed with different wavelenghts, i.e. rapid grating erasure in the short wavelength range, which deviates from the results predicted by the electron transport band model. The deviation is related to the coexistance of electrons and holes in photorefraction, and charge-transfer process including electrons and hole has been proposed. The electron and hole contributions to photo-excitation coefficient S of the Fe centre on the wavelength.

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The digital holographic interferometry is used in the dynamic and static measurements of phase variation induced by domain inversion. For the first time, to the authors' knowledge, they observe the existence of ridge-shape phase distribution adjacent to 180 degrees domain wall in congruent LiNbO3 crystal. During the domain wall motion, the phase variations are not uniform but have obvious relaxations. In the static measurement, the ridge elevation can vary linearly with the uniform electric field. The reasonable assumptions are proposed to explain these effects. (c) 2006 American Institute of Physics.

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Based on the two-dimensional coupled-wave theory, the wavefront conversion between cylindrical and plane waves by local volume holograms recorded at 632.8 nm and reconstructed at 800 nm is investigated. The proposed model can realize the 90 degrees holographic readout at a different readout wavelength. The analytical integral solutions for the amplitudes of the space harmonics of the field inside the transmission geometry are presented. The values of the off-Bragg parameter at the reconstructed process and the diffracted beam's amplitude distribution are analysed. In addition, the dependences of diffraction efficiency on the focal length of the recording cylindrical wave and on the geometrical dimensions of the grating are discussed. Furthermore, the focusing properties of this photorefractive holographic cylindrical lens are analysed.

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利用一维耦合波理论研究了入射方向相互垂直的一束平面波与一束柱面波干涉形成光折变局域体全息光栅的波前转换情况。给出了透射波和衍射波振幅的解析表达式。讨论了该局域体全息光栅的几何尺寸以及全息透镜的焦距对光栅衍射效率的影响。结果表明,随着光栅横向尺寸的增加,光栅的衍射效率也逐渐增加。然而,光栅的衍射效率却随着光栅纵向尺寸的增加而减小。全息透镜的焦距越长,光栅的衍射效率也越大。此外,分析了光栅的布拉格选择特性,该光栅具有非常好的角度选择特性。在平面波与柱面波干涉形成全息透镜的设计中,为了获得最优的衍射效率,应当根

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利用马赫-曾德尔干涉光路和V光学透镜系统,以部分畴反转的掺钌铌酸锂晶体(RuO2:LiNbO3)的透射光作为物光来记录全息图,并在数值再现过程对其进行频域滤波以实现物场波前信息的数值重建,检测出在一定电压作用下晶体内部折射率变化的二维分布.检测结果证实;晶体中发生畴反转的区域与发生电色效应的区域严格相符.数字全息干涉术非接触、无干扰、无破坏的优势在准实时监控、检测和分析铌酸锂晶体畴反转方面有很好的应用前景.

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分别采用514nm绿光、488nm蓝光和390nm紫外光作为敏化光,633nm红光作为记录光,详细研究了敏化光波长对氧化(Fe,Ni):LiNbO3晶体全息记录性能的影响。结果表明:随着敏化光波长的逐渐减小,氧化(Fe,Ni):LiNbO3晶体的非挥发全息记录性能逐渐优化,390nm紫外光是这三种敏化光中最优的敏化光。考虑敏化光的吸收,为了在双中心全息记录中获得最优的性能,应当选择合适波长的敏化光:一方面短波长敏化光能有效地敏化深中心;另一方面短波长敏化光的吸收太强(如对光折变效应无用的基质吸收),不能沿

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将带输运模型与二维耦合波理论相结合,研究了双掺杂LiNbO3:Fe:Mn晶体中由两束有限宽度平面波干涉产生的局域光折变体全息的动力学机制及其衍射特性。采用三步法联立求解了双中心带输运物质波方程和二维耦合波方程。数值计算结果表明,局域光折变体全息光栅的空间电荷场在空间上呈不均匀分布。当光栅区域较小时空间电荷场较强,随着光栅区域的增大,空间电荷场急剧下降,并降低一个数量级。此外,在接近光束入射边界的区域,空间电荷场时空变化规律与一维无限大光折变体全息光栅的结果相似,随着光栅区域的扩大,边界效应对空间电荷场的影

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研究了照明光瞳非对称性对光刻成像质量的影响。通过PROLITH软件计算了环形与四极照明条件下,光瞳非对称性对图形位置偏移量、曝光图形内水平线条与垂直线条的宽度差、曝光图形上密集线条与孤立线条之间线宽偏差的影响。研究结果表明,光瞳非对称性主要影响曝光图形的位置偏移量,光瞳非对称性引起的图形位置偏移量与光瞳非对称性的大小成线性关系。根据套刻精度的误差分配原则,计算得到光瞳非对称性的容限为5%。

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A novel method to measure coma aberration by pattern displacements at different defocus positions is proposed in this paper. The effect of defocus on coma-induced pattern displacement is analyzed. The measuring principle of the method is described in detail. Using the simulation program PROLITH, the proportionality factors between pattern displacement and coma aberration at different defocus positions are calculated. It is proved that the method is simple to perform and the measurement accuracy of coma can increase approximately by 25% by this novel method. (c) 2006 Elsevier GmbH. All rights reserved.