67 resultados para Scalar curvature
Resumo:
The far-field intensity distribution (FFID) of a beam generated by a phase-unifying mirror resonator was investigated based on scalar diffraction theory. Attention was paid to the parameters, such as obscuration ratio and reflectivity of the phase-unifying mirror, that determine the FFID. All analyses were limited to the TEM00 fundamental mode. (c) 2005 Optical Society of America.
Resumo:
The far-field intensity distribution of hollow Gaussian beams was investigated based on scalar diffraction theory. An analytical expression of the M-2 factor of the beams was derived on the basis of the second-order moments. Moreover, numerical examples to illustrate our analytical results are given. (c) 2005 Optical Society of America.
Resumo:
Based on scalar diffraction theory, we investigated far-field intensity distribution (FFID) of beam generated by Gaussian mirror resonator. We found usable analytical expressions of diffracted field with respect to variation of diffraction parameters. Particular attention was paid to the parameters such as mirror spot size and radius of the Gaussian mirror, which determine the FFID. All analyses were limited to TEM00 fundamental mode. (c) 2004 Elsevier B.V. All rights reserved.
Resumo:
Based on the scalar diffraction theory, the propagation and focusing properties of a hard-edged diffracted beam generated by a Gaussian mirror resonator were investigated. Explicit expressions for the field distribution of the truncated beam that propagates through a paraxial optical ABCD system were derived in detail. Numerical examples are given to illustrate our analytical results. (c) 2006 Optical Society of America.
Resumo:
Based on scalar diffraction theory, propagation properties of beam generated by Gaussian mirror resonator were investigated. Explicit expressions for the field distribution of the beam that propagate through a paraxial optical ABCD system were derived and numerical examples were given to illustrate our analytical results. (c) 2005 Elsevier B.V. All rights reserved.
Resumo:
利用电子束蒸发工艺,以Ag层为衬底,沉积了中心波长为632.8nm的氧化锆(ZrO2)薄膜,膜层厚度在80-480nm范围内变化.研究了不同厚度样品的粗糙度变化规律和表面散射特性.结果发现,随着膜层厚度的逐渐增加.其表面均方根(RMS)粗糙度和总积分散射(TIS)均呈现出先减小后增大的趋势.利用非相关表面粗糙度的散射模型对样品的TIS特性进行了理论计算,所得结果与测量结果相一致.
Resumo:
Y2O3 stabilized ZrO2 (YSZ) thin films with different Y2O3 molar contents (0, 3, 7, and 12 mol%) are deposited on BK7 substrates by electron-beam evaporation technique. The effects of different Y2O3 contents on residual stresses and structures of YSZ thin films are studied. Residual stresses are investigated by means of two different techniques: the curvature measurement and x- ray diffraction method. It is found that the evolution of residual stresses of YSZ thin films by the two different methods is consistent. Residual stresses of films transform from compressive stress into tensile stress and the tensile stress increases monotonically with the increase of Y2O3 content. At the same time, the structures of these films change from the mixture of amorphous and monoclinic phases into high temperature cubic phase. The variations of residual stress correspond to the evolution of structures induced by adding of Y2O3 content.