Theoretical analysis of the relationships between hardness, elastic modulus, and the work of indentation for work-hardening materials

In our previous paper, the expanding cavity model (ECM) and Lame solution were used to obtain an analytical expression for the scale ratio between hardness (H) to reduced modulus (E-r) and unloading work (W-u) to total work (W-t) of indentation for elastic-perfectly plastic materials. In this paper, the more general work-hardening (linear and power-law) materials are studied. Our previous conclusions that this ratio depends mainly on the conical angle of indenter, holds not only for elastic perfectly-plastic materials, but also for work-hardening materials. These results were also verified by numerical simulations.

Effect of the work function of gate electrode on hysteresis characteristics of organic thin-film transistors with Ta2O5/polymer as gate insulator

Organic thin-film transistors (OTFTs) using high dielectric constant material tantalum pentoxide (Ta2O5) and benzocyclobutenone (BCBO) derivatives as double-layer insulator were fabricated. Three metals with different work function, including Al (4.3 eV), Cr (4.5 eV) and Au (5.1 eV), were employed as gate electrodes to study the correlation between work function of gate metals and hysteresis characteristics of OTFTs. The devices with low work function metal Al or Cr as gate electrode exhibited high hysteresis (about 2.5 V threshold voltage shift). However, low hysteresis (about 0.7 V threshold voltage shift) OTFTs were attained based on high work function metal Au as gate electrode.