Broadband Emitting Superluminescent Diodes With InAs Quantum Dots in AlGaAs Matrix

Superluminescent diodes were fabricated by using InAs-AlGaAs self-assembled quantum dots (QDs) as the active region. The ultrawide emitting spectrum of 142 nm was achieved. The short migration length of indium adatoms on AlGaAs surface increases the size dispersion of InAs QDs, resulting in the broadening of optical gain spectrum.

Effects of Ag on electrical properties of Ag/Ni/p-GaN ohmic contact

Properties of the Ag/Ni/p-GaN structure at different temperatures are studied by Auger electron spectroscopy, scanning electron microscopy and high resolution x-ray diffraction. The effect of Ag in ohmic contact on the crystalline quality is investigated and the optimized value of annealing temperature is reported. The lowest specific contact resistance of 2.5 x 10(-4) Omega cm(2) is obtained at annealing temperature of 550 degrees C.

Defects in GaN films grown on Si(111) substrates by metal-organic chemical vapour deposition

We report the transmission-electron microscopy study of the defects in wurtzitic GaN films grown on Si(111) substrates with AIN buffer layers by the metal-organic chemical vapour deposition method. The In0.1Ga0.9N/GaN multiple quantum well (MQW) reduced the dislocation density by obstructing the mixed and screw dislocations passing through the MQW. No evident reduction of the edge dislocations density by the MQW was observed. It was found that dislocations with screw component can be located at the boundaries of sub-grains slightly in-plane misoriented.

Micro-Raman study on hydrogenated protocrystalline silicon films

Good quality hydrogenated protocrystalline silicon films were successfully prepared by radio frequency plasma enhanced chemical vapor deposition (PECVD) with various hydrogen dilution ratios (R = ([H-2]/[SiH4]) from 10 to 100). The photosensitivity of the films is up to 10(6) under the light intensity of 50mW.cm(-2). The microstructure of the films was studied by micro-region Raman scattering spectra at room temperature. The deconvolution of the Raman spectra by Gaussion functions shows that the films deposited under low hydrogen dilution ratios (R < 33) exhibit typical amorphous properties, while the films deposited under high hydrogen dilution ratios (R > 50) possess a diphasic structure, with increasing crystalline volume fraction with R. The size of the crystallites in the diphasic films is about 2.4 mm, which was deduced from the phonon confinement model. The intermediate range order of the silicon film increases with increasing hydrogen dilution ratio.

基于进程行为的异常检测模型

利用系统漏洞实施攻击是目前计算机安全面临的主要威胁.本文提出了一种基于进程行为的异常检测模型.该模型引入了基于向量空间的相似度计算算法和反向进程频率等概念,区分了不同系统调用对定义正常行为的不同作用,提高了正常行为定义的准确性;该模型的检测算法针对入侵造成异常的局部性特点,采用了局部分析算法,降低了误报率.

非线性放大环形镜“8”字腔光纤激光器实验研究

!"#$%&’(!&%"!:%&%")*

注入噪声对光纤激光器锁模启动的影响

国家自然科学基金资助课题(60537060)

珊瑚礁区碳循环研究进展

珊瑚礁是海洋中生产力水平最高的生态系统之一，其碳循环受到有机碳代谢（光合作用／呼吸作用）和无机碳

单纵模布里渊掺铒光纤激光器的实验研究

提出了一种具有多环形腔(MRC)和光纤布拉格光栅可调谐滤波器(FBG-TF)相结合的单纵模布里渊掺铒光纤激光器(BEDFL)。实验中通过观察激光器输出光的拍频信号分析其光谱精细结构,分别讨论了布里渊增益、FBG-TF、MRC对BEDFL单模输出的贡献,给出了激光器的功率特性曲线和波长稳定性测试图。实验得到了在1550 nm处功率为4 dBm,信噪比(SNR)>60 dB,线宽小于1.5 kHz的稳定单纵模输出光。

表面处理对p-GaN欧姆接触的影响

分别用稀盐酸、王水以及(NH_4)_2S溶液处理p-GaN表面,通过测试样品表面Ols的X射线光电子能谱(XPS),比较了这些溶液去除p-GaN表面氧化层的能力;在经不同溶液处理后的样品表面,以相同的条件制作Ni/Au电极,并测试其与p-GaN的比接触电阻,结果表明经稀盐酸处理后的样品表面,由于其氧含量较高,不能与Ni/Au形成良好的欧姆接触,而经王水和(NH_4)_2S溶液处理后的p-GaN表面,能与Ni/Au形成良好的欧姆接触;最后,通过比较样品表面的Ga/N原子浓度比,探讨了王水处理p-GaN表面能够形成良好欧姆接触的原因.

纳米硅薄膜制备及HIT太阳能电池

在较高工作气压(332.5～399Pa)下,采用等离子增强化学气相沉积(PECVD)工艺制备了优质的本征纳米硅薄膜及掺磷的纳米硅薄膜,并采用X射线衍射(XRD)、拉曼散射(Raman) 测试技术对其进行了测试和分析.结果表明纳米硅薄膜的XRD谱中存在(111)、(220)和(331)峰位;Raman谱中显示出其薄膜中的晶粒的大小(2～5nm)符合纳米晶的要求.将制备的纳米硅薄膜初步用于栅极/ITO/n-nc-Si∶H/i-nc-Si∶H/p-c-Si/Al/Ag结构的异质结(HIT)太阳能电池,开路电压(Voc)达404mV,短路电流密度(Jsc)可达到34.2mA/cm2(AM1.5,100mW/cm~2,25℃).

非晶/微晶过渡区域硅薄膜的微区喇曼散射研究

通过改变氢气对硅烷气体的稀释程度，并保持其他的沉积参量不变，用等离子体增强化学气相沉积（PECVD）方法成功地制备出非晶/微晶相变过渡区域的硅薄膜样品。测量了样品的室温光电导和暗电导，样品的光电性能优越，在50 mW·cm~（-2）的白光照射下，光电导和暗电导的比值达到10~6。在室温下用微区喇曼谱研究了薄膜的微结构特性，用高斯函数对喇曼谱进行了拟合分析。结果表明，在我们的样品制备条件下，当H_2和SiH_4的流量比R较小时，样品表现出典型的非晶硅薄膜 的结构特性；随流量比R的增大，薄膜表现出两相结构，其中的微晶成分随氢稀释比的增大逐渐增多；用量子尺寸效应估算了两个高氢稀释样品（R > 50）中微晶粒子的平均尺寸大小为2.4 nm左右；样品的中程有序度随氢稀释程度的增加而增大。