245 resultados para NITRIDE THIN-FILMS
Resumo:
Electrodeposition of CuInSe2 was investigated in acidic solutions containing Cu2+, In3+ and HSeO2+ ions. The electrodeposition condition was optimized with the aim of obtaining uniform thin films on titanium substrate. The mechanism of the electrodeposition process is discussed. Structure analysis of the deposited film shows a typical polycrystalline chalcopyrite structure, good crystallinity and homogeneous dispersion. The photoelectrochemical cells made of these kinds of deposited films in polysulfide redox solution give distinct photoresponse.
Resumo:
The optical, electrical and photoelectric properties of rare earth monophosphides (LnP, Ln = La, Nd, Sm, Y, Dy and Yb) have been studied in thin films. The films exhibit semiconducting behaviour with energy gaps of 1.0-1.46 eV and n-type electrical conduction. Their resistivities are 10(-2) OMEGA-cm with corresponding Hall mobilities of 8.5-400 cm2 V-1 s-1. The films are deposited on a p-type silicon substrate in vacuum. Voltage-current characteristic measurements show that a p-n junction has been formed between LnP and silicon. Spectral sensitivity and a photovoltaic effect have been observed in LnP-Si junctions. They may be useful photoelectric materials.
Resumo:
It is demonstrated that the electroactive species Fe~(2+) ion can transport easily through the thin films of vanadium hexacyanoferrate (VHF) to the underlaying glassy carbon (GC)electrode surface to be oxidized directly at less positive potential and that it can also be oxidized at the film at more positive potential through the media- tion of redox sites in the film. These two processes yield sequentially clearly distinguished first and second wave in stationary current-potential curves resulting...