Femtosecond laser-induced damage in reflector

We have investigated the damage for ZrO2/SiO2 800 nm 45 degrees high-reflection mirror with femtosecond pulses. The damage morphologies and the evolution of ablation crater depths with laser fluences are dramatically different from that with pulse longer than a few tens of picoseconds. The ablation in multilayers occurs layer by layer, and not continuously as in the case of bulk single crystalline or amorphous materials. The weak point in damage is the interface between two layers. We also report its single-short damage thresholds for pulse durations ranging from 50 to 900 fs, which departs from the diffusion-dominated tau(1/2)(p) scaling. A developed avalanche model, including the production of conduction band electrons (CBE) and laser energy deposition, is applied to study the damage mechanisms. The theoretical results agree well with our measurements. (c) 2005 Elsevier B.V. All rights reserved.

Optical properties of zirconia-titania-ORMOSIL films for temperature tuning distributed feedback waveguide lasers

The zirconia-titania-ORMOSIL waveguide thin films with considerable optical quality were prepared by the sol-gel process. The refractive index (n) and the extinction coefficient (k) were determined by a scanning ellipsometer. Wavelength tunable output of distributed feedback waveguide lasing was demonstrated in Rhodamine 6G doped ZrO2 TiO2-ORMOSIL thin films by varying the temperature, and about 5.5 nm wavelength tuning range was achieved around the emission wavelength of 599 nm. The thermal-optic coefficient (dn/dT) of the active ZrO2-TiO2-ORMOSIL films was deduced. (c) 2005 Elsevier B.V. All rights reserved.

Bi2O3-B2O3-TiO2系统玻璃的形成能力研究

采用传统的玻璃熔融方法，研究了Bi2O3-B2O3-TiO2-RmOn四元系统的玻璃形成区（RmOn分别为La2O3、Sb2O3、ZrO2、SiO2和Nb2O5氧化物），给出了上述四元系统的玻璃形成范围。研究发现：Bi2O3-B2O3-TiO2-La2O3系统的玻璃形成范围最大，当TiO2的摩尔含量超过25％时，上述五个系统均不能形成玻璃。分剐熔制了摩尔分数55Bi2O3-35B2O3—5TiO2—5RmOn的玻璃（RmOn分别为La2O3、Sb2O3、ZrO2、SiO2和Nb2O5），测定了其红外吸收光

Thermal and electric conductivity of near-zero thermal expansion ZrW 2O8//ZrO2 composites

In this work, the microstructure, thermal and electric conductivity properties of near-zero thermal expansion ZrW2O8/ZrO2 and Al2O3 added ZrW2O8/ZrO2 composites were studied. Both the two composites exhibit very low thermal conductivity and the thermal conductivity decreases slightly as the temperature increases. The electric conductivity of the two composites increases with the increasing of the measurement temperature. The Al2O3 added ZrW2O8/ZrO2 composite has higher thermal and electric conductivity than ZrW2O8/ZrO2 composite. The most important factor which causes the difference of the thermal and electric conductivity of the composites is the porosity. (C) 2008 The Ceramic Society of Japan. All rights reserved.

Wideband antireflection film fabricated by glancing angle deposition

Graded-index ZrO2 films has been fabricated on K9 glass by glancing angle deposition. Because the index mismatch at the interface has been reduced, the film results in wideband high-transmission antireflection. From 400nm to 1200nm, the film reflection is lower than 0.8% and the lowest value is 0.2% at 432nm.

测量薄膜微粗糙度的总积分散射仪

介绍了一种检测光学薄膜表面总积分散射（TIS）分布的总积分散射仪。对仪器的基本结构、理论基础、测量原理以及系统性能等进行了阐述，提出了抑制系统噪音和提高测量精度的有效措施。利用该仪器对K9基底上的银（Ag）膜和氧化锆（ZrO2）薄膜进行了测量，并根据标量散射理论得到了表面均方根（RMS）粗糙度。利用光学轮廓仪和原子力显微镜（AFM）分别测量了上述Ag膜和ZrO2薄膜的表面均方根粗糙度，并与总积分散射仪所得的粗糙度进行了比较。结果表明，根据测量的薄膜表面总积分散射计算得到的表面均方根粗糙度与光学轮廓仪及原子

Extended effective medium model for refractive indices of thin films with oblique columnar structure

The refractive indices of thin films, containing dielectric and voids in an oblique columnar structure, are modeled by extended effective medium in the quasi-static limit. The dielectric function is shown to be strongly dependent on the angle of incidence and on the columnar orientation for p-polarized light. This model is applied to model ZrO2 thin films with oblique columnar structures and the computed results, with the Maxwell Garnett, the Bragg-Pippard, and the Bruggeman formalisms, have been given. (c) 2004 Elsevier B.V. All rights reserved.

Design of anisotropic reflector with birefringent thin films

A novel design for dielectric anisotropic mirrors with birefringent thin films for normal incidence is presented. This mirror consists of a stack of quarter-wave biaxial layers. The biaxial anisotropic layers can be fabricated by oblique deposition. The reflectance is different for two linear polarizations of light incidence on the mirrors. As a numerical example, the design is carried out on glass with TiO2 and ZrO2. These thin films could be applied to anisotropic reflective devices for lasers.

Surface morphology and properties of zirconia thin films prepared at different deposition rates

ZrO2 thin films were prepared on BK7 glass substrates by electron beam evaporation deposition method. The influence of deposition rate varying from 1.2 to 6.3 nm s(-1) on surface morphology and other properties of ZrO2 films were examined. With increasing deposition rate, the surface defect density increased. The decrease in half width at full maximum in X-ray diffraction pattern with deposition rate indicates an increase in crystal dimension with increasing deposition rate. Electron beam deposited ZrO2 films are known to be inhomogeneous. From the change of the peak transmittance value, it can be deduced that the inhomogeneity of ZrO2 films strengthened gradually with increasing deposition rate. The type of surface defects changed from nodules to craters when the deposition rate was high enough.

单脉冲和多脉冲飞秒激光对单层光学薄膜的损伤

利用掺钛的蓝宝石飞秒激光系统输出的单脉冲和多脉冲飞秒激光（中心波长800nm，脉宽50fs,靶面聚焦直径Ф40／μm）。分别对BK7玻璃基底上厚约500nm的单层HfO2和单层ZrO2薄膜进行辐照,得到了这两种薄膜在1-on-1和1000-on-1测试方法下的激光损伤阙值。实验发现,两种方法下HfO2单层膜的阈值均比ZrO2单层膜的阈值高。从简化的Keldysh多光子离化理论出发，认为HfO2薄膜材料的带比ZrO2的宽是导致上述结果的主要原因。同时，同一种薄膜的多脉冲下的阙值比单脉冲下的低，原因是多脉冲下

光学薄膜的分层界面散射模型

提出了一种计算光学介质膜系表面总积分散射（TIS）的理论模型。该模型认为，介质膜系粗糙的膜层界面和表面为微观结构不均匀的微薄过渡区；过渡区可用折射率为不同常量的层数足够多的均匀子层来代替，同时这些均匀子层的折射率变化满足指数函数的分布规律。利用矩阵法对积分散射的表达式进行了推导。对于电子束蒸发方法在K9玻璃上沉积的ZrO2单层膜，分层界面散射模型对积分散射的理论计算值要比非相关表面散射模型的计算值更加符合总积分散射仪的实验测量结果。

制备工艺条件对薄膜微结构的影响

用不同的方法在石英玻璃，YAG晶体，K9玻璃和LiNbO3晶体等几种衬底上制备了ZrO2，HfO2和TiO2薄膜。HfO2薄膜利用电子束蒸发（EB）、离子束辅助（IAD）和双束离子束溅射（DIBS）三种方法沉积。对其中的一些样品进行了不同温度下的退火处理，对所有的样品进行X射线衍射（XRD）测试，以获得不同条件下得到的薄膜的晶相及晶粒尺寸等的微结构参数。实验结果表明，薄膜的晶相结构以及晶粒尺寸强烈地依赖于沉积过程的各种技术参数，如衬底的种类、沉积温度、沉积方法和退火温度。利用薄膜表面扩散以及薄膜成核长大热

电子束蒸发氧化锆薄膜的粗糙度和光散射特性

利用电子束蒸发工艺，以Ag层为衬底，沉积了中心波长为632．8nm的氧化锆（ZrO2）薄膜，膜层厚度在80-480nm范围内变化．研究了不同厚度样品的粗糙度变化规律和表面散射特性．结果发现，随着膜层厚度的逐渐增加．其表面均方根（RMS）粗糙度和总积分散射（TIS）均呈现出先减小后增大的趋势．利用非相关表面粗糙度的散射模型对样品的TIS特性进行了理论计算，所得结果与测量结果相一致．

氧等离子体处理对氧化锆薄膜性质的影响

用低能氧等离子体对电子束热蒸发后的沉积氧化锆薄膜进行了后处理。通过对其光学性质、缺陷密度、弱吸收及抗激光辐照等性质的研究后发现，经氧等离子体处理后的氧化锆薄膜的折射率、消光系数、缺陷密度及吸收率等均有所降低，薄膜的激光损伤阈值较未处理的样品有了较大的提高。分析探讨了氧等离子体处理技术对薄膜性质的影响。

不同沉积参量下ZrO_2薄膜的微结构和激光损伤阈值

ZrO2采用X射线衍射(XRD)技术分析了不同充氧条件和沉积温度对ZrO2溥膜组成结构的影响，并对不同工艺下制备的薄膜的表面粗糙度和激光损伤阈值进行了测量。结果发现随着氧压的升高，ZrO2溥膜将由单斜相多晶态逐渐转变为非晶态结构，而随着基片温度的增加，溥膜将由非晶态逐渐转变为单斜相多晶态。同时发现随着氧压升高晶粒尺寸减小，而随着沉积温度增加，晶粒尺寸增大。氧压增加时工艺对表面粗糙度有一定程度的改善，而沉积温度升高，工艺对表面粗糙度的改善不明显。晶粒尺寸大小变化与表面粗糙度变化存在对应关系。激光损伤测量表明