32 resultados para 1471
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根据激光强化的工艺特性,从优化的角度出发,提出了一种基于平行截面法的改进算法。首先通过分析光斑的平均离焦量与光斑覆盖域曲率的关系,得到用自由曲面最大主曲率表示的工艺所允许的最大光斑尺寸公式;进而通过轨迹样本点分析的方式,得到统计平均的相邻平行截面间距。该方法综合考虑光斑大小、光斑间距、轨迹排距等多种因素,相较于一般的轨迹规划算法,能在保证加工效果的基础上有效提高加工效率。最后给出了一个算例,这一方法被用于汽车门板局部的激光强化加工轨迹规划,取得了良好的效果
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忍冬(Lonicera japonica Thunb.)属忍冬科忍冬属,是一种重要的药用植物,其花蕾称为金银花(Flos Lonicerae),在我国已有1000多年的药用历史,具有清热解毒、凉散风热等功效。我们利用秋水仙素诱导二倍体“大毛花”品种茎尖选育出同源四倍体“九丰一号”品种,并在生产中发现花蕾产量显著提高,而药效成份含量是否发生变化了呢?四倍体忍冬表现出典型的器官巨大性,这些变化是否与其较强生态适应性之间存在联系呢?染色体加倍增强了忍冬的生态适应性,其生态修复功能如何呢?在本研究中,主要从以下几个方面进行了探讨:(1)染色体加倍对其叶片,茎、花蕾和花蕾产量及其药效成份等生物学性状的影响;(2)染色体加倍后植物对水分胁迫的响应;(3)染色体加倍后植物对热胁迫的响应;(4)除上述两个品种外,增加一个变异品种“红银花”,探讨3个忍冬品种对退化生态系统的修复功能。主要结果如下: 1. 通过测定根尖细胞染色体数目和使用流式细胞仪分析茎尖细胞DNA含量,表明四倍体忍冬(2n = 4x = 36)确实来自二倍体忍冬(2n = 2x = 18)的染色体加倍。四倍体忍冬气孔细胞大小显著大于二倍体,而气孔密度显著低于二倍体。四倍体忍冬没有光合“午休”,而二倍体存在明显的光合“午休”,这可能与其存在抗高温的叶片解剖结构特性有关。四倍体忍冬叶片较二倍体变大、变厚、变浓绿(较高叶绿素含量)。与二倍体相比,四倍体忍冬单位叶面积重量显著增高,表明其具有较强的生态适应性。四倍体忍冬单个花蕾的鲜重和干重均显著大于二倍体。连续3年的花蕾产量调查表明,四倍体显著高于二倍体。染色体加倍使其茎干粗壮、节间变短、新梢上着生花蕾数目增多及单个花蕾变大,这是其花蕾高产的生物学基础。对金银花的药效成份而言,染色体加倍不影响绿原酸的含量,但增加了木犀草苷的含量。结果表明,染色体加倍能增加金银花的产量和药效成份的含量,建议四倍体忍冬在药材生产中推广应用。 2. 水分胁迫显著降低二倍体和四倍体忍冬叶片的净光合速率、气孔导度和蒸腾速率。水分胁迫也降低电子传递速率、光系统II实际量子产量和光化学猝灭,而增加非光化学猝灭、总可溶性糖、脯氨酸和丙二醛的含量。四倍体忍冬对水分胁迫的响应表现为其叶片水势、气体交换、叶绿素荧光和有关代谢物含量的变化程度低于二倍体,并且复水后其恢复能力快于二倍体,表明染色体加倍增强了忍冬的抗旱能力。分析其主要原因,可能是由于四倍体植株总叶面积减少、单位叶面积重量增加、叶片表皮细胞和栅栏组织增大以及叶片表皮毛较浓密等形态解剖结构特性有关。结果表明,染色体加倍能增加忍冬植物的抗旱能力,而使其具有较强的生态适应性。 3. 二倍体和四倍体忍冬受48 ºC热胁迫处理6 h和恢复10 h,以及离体叶片45 ºC,50 ºC,55 ºC 水浴热胁迫3 min,应用叶绿素荧光成像系统研究了它们对热胁迫的响应。热胁迫显著降低了两个品种叶片的最大光化学效率、电子传递速率、光系统II实际量子产量和光化学猝灭,降低了四倍体的非光化学猝灭,而增加了二倍体的非光化学猝灭。热胁迫增加了两个品种叶片的总可溶性糖、脯氨酸和丙二醛的含量。四倍体受热胁迫的叶绿素荧光参数和有关代谢物的响应程度低于二倍体,以及其恢复程度快于二倍体,表明染色体加倍提高了抗热性。此外,叶绿素荧光成像的异质性也表明,四倍体的抗热能力大于二倍体。进一步的叶片解剖结构分析表明,四倍体叶片的表皮细胞变大、栅栏组织增厚、表皮毛较浓密等特点,是其抗热性强的主要原因。 4.根据以上的研究结果,通过四倍体忍冬生态修复功能的野外试验证明染色体加倍后其生态适应性变化。在本研究中,针对北京市门头沟区大面积不同类型的废弃地急需恢复植被和景观的问题,在恢复生态学理念的指导下,综合运用集成技术,将3个忍冬品种植物用于这些退化生态系统的恢复。在王平镇的公路下边坡(以碎石和矿渣为主)、煤矿、石灰窑和采石场4种类型废弃地建立生态修复的试验示范区。结果表明,在4个废弃地类型上引进的3个金银花品种,具有使示范区快速复绿、当年成景和群落快速形成的潜力,并具有对不同退化迹地的适应能力和恢复效果,其中四倍体忍冬效果更好些,这主要与其形态解剖结构和较强的生态适应性有关。
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Mitochondria are essential for cellular energy production in most eukaryotic organisms. However, when glucose is abundant, yeast species that underwent whole-genome duplication (WGD) mostly conduct fermentation even under aerobic conditions, and most can
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The graphite electrode sludge was sampled from a huge chloralkali plant in central China. The total level of PCDD/F was found as high as 378.85 mu g/kg sludge (dry weight). The patterns of PCDD/F in each homologue indicated the predominance of tetra- to octa-chlorinated PCDFs, Furthermore, the toxic 2,3,7,8-substituted PCDFs constituted over 80% of the total PCDFs in the sludge and the corresponding PCDDs were only at 15 mu g/kg level. The calculated value of the international toxic equivalence (I-TEQ) in sludge was 21.65 mu g/kg sludge (dry weight). This typical "dioxin chloralkali pattern" was apparently identified in the sediments near the effluent outlet of the chloralkali plant.
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Chinese Academy of Sciences;National Science Fund for Distinguished Young Scholar 60925016;National High Technology Research and Development program of China 2009AA034101;Postdoctoral Foundation 0971050000
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Efficient green emission from ZnMgS:Mn2+ nanoparticles prepared by co-doping Mg2+ and Mn2+ ions into ZnS lattices has been observed. The synthesis is carried out in aqueous solution, followed by a post-annealing process, thus showing the features of less complexity, low cost, and easy incorporation of dopants. In comparison with the emission of ZnS:Mn2+ nanoparticles, which is located generally around 590 nm, the photoluminescence of ZnMgS:Mn2+ nanoparticles is blue-shifted by 14 nm in wavelength, leading to the enhanced green emission. The X-ray diffraction, electron spin resonance, and pressure dependent photoluminescence measurements suggest that the change of the crystal field caused by Mg2+ ionic doping and the lower symmetry in the nanoparticles may account for the blue-shift of the photoluminescence. The ZnMgS:Mn2+ nanoparticles with 1% Mn2+ doping exhibit the strongest luminescence, which could potentially meet the requirements for the construction of green light emitting diodes.
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AlN/GaN superlattice buffer is inserted between GaN epitaxial layer and Si substrate before epitaxial growth of GaN layer. High-quality and crack-free GaN epitaxial layers can be obtained by inserting AlN/GaN superlattice buffer layer. The influence of AlN/GaN superlattice buffer layer on the properties of GaN films are investigated in this paper. One of the important roles of the superlattice is to release tensile strain between Si substrate and epilayer. Raman spectra show a substantial decrease of in-plane tensile strain in GaN layers by using AlN/GaN superlattice buffer layer. Moreover, TEM cross-sectional images show that the densities of both screw and edge dislocations are significantly reduced. The GaN films grown on Si with the superlattice buffer also have better surface morphology and optical properties.
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Contactless electroreflectance (CER) and photoreflectance (PR) measurements have been performed on samples with the structure of an n-doped GaAs epitaxial layer on a semi- insulating GaAs substrate. Modulated reflectance signals from the n-GaAs surface and those from the n-GaAs/SI-GaAs interface are superposed in PR spectra. For the case of CER measurement, however, Franz-Keldysh oscillations (FKOs) from the interface, which are observed in PR spectra, cannot be detected. This discrepancy is attributed to different modulation mechanisms of CER and PR. In CER experiments, the electric field modulation cannot be added to the interfacial electric field because of the effective screening by the fast response of carriers across the interface. FKOs from the interface without any perturbation by the surface signals are extracted by subtracting CER spectra from PR spectra.
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The effect of using an indium flux during the MBE growth of GaN layers was investigated. The properties of these layers were studied using electron probe microanalysis, secondary ion mass spectroscopy, photoluminescence and cathodoluminescence. The optical properties of the GaN layers are shown to improve as compared with undoped GaN layers grown under nominally the same conditions but without an additional indium flux.