Correlations strike back (again): The case of associative memory retrieval

It has long been recognised that statistical dependencies in neuronal activity need to be taken into account when decoding stimuli encoded in a neural population. Less studied, though equally pernicious, is the need to take account of dependencies between synaptic weights when decoding patterns previously encoded in an auto-associative memory. We show that activity-dependent learning generically produces such correlations, and failing to take them into account in the dynamics of memory retrieval leads to catastrophically poor recall. We derive optimal network dynamics for recall in the face of synaptic correlations caused by a range of synaptic plasticity rules. These dynamics involve well-studied circuit motifs, such as forms of feedback inhibition and experimentally observed dendritic nonlinearities. We therefore show how addressing the problem of synaptic correlations leads to a novel functional account of key biophysical features of the neural substrate.

HYDROGENATED AMORPHOUS SILICON THIN-FILM DEPOSITION BY DIRECT PHOTO-ENHANCED DECOMPOSITION OF SILANE USING AN INTERNAL HYDROGEN DISCHARGE LAMP.

Hydrogenated amorphous silicon (a-Si:H) thin films have been deposited from silane using a novel photo-enhanced decomposition technique. The system comprises a hydrogen discharge lamp contained within the reaction vessel; this unified approach allows high energy photon excitation of the silane molecules without absorption by window materials or the need for mercury sensitisation. The film growth rates (exceeding 4 Angstrom/s) and material properties obtained are comparable to those of films produced by plasma-enhanced CVD techniques. The reduction of energetic charged particles in the film growth region should enable the fabrication of cleaner semiconductor/insulator interfaces in thin-film transistors.

Appraisal of PD6493:1991 fracture assessment procedures

PD6493:1991 fracture assessment have been performed for a range of large-scale fracture mechanics tests conducted at TWI in the past. These tests cover several material groups, including pressure vessel steels, pipeline steels, stainless steels and aluminium alloys, including parent material and weldments. Ninety-two wide plate and pressure vessel tests have been assessed, following Levels 1, 2 and 3 PD6493:1991 procedures. In total, over 400 assessments have been performed, examining many features of the fracture assessment procedure including toughness input, proof testing, residual stress assumptions and stress state (tension, bending and biaxial). In all cases the large scale tests have been assessed as one would actual structures: i.e., based on lower bound toughness values obtained from small scale fracture toughness specimens.

A comparison of methods for assessing the lifetime reliability of a moored FPSO

Current design codes for floating offshore structures are based on measures of short-term reliability. That is, a design storm is selected via an extreme value analysis of the environmental conditions and the reliability of the vessel in that design storm is computed. Although this approach yields valuable information on the vessel motions, it does not produce a statistically rigorous assessment of the lifetime probability of failure. An alternative approach is to perform a long-term reliability analysis in which consideration is taken of all sea states potentially encountered by the vessel during the design life. Although permitted as a design approach in current design codes, the associated computational expense generally prevents its use in practice. A new efficient approach to long-term reliability analysis is presented here, the results of which are compared with a traditional short-term analysis for the surge motion of a representative moored FPSO in head seas. This serves to illustrate the failure probabilities actually embedded within current design code methods, and the way in which design methods might be adapted to achieve a specified target safety level.

PHOTOENHANCED DEPOSITION OF HYDROGENATED AMORPHOUS SILICON THIN FILMS.

This paper will review the different U. V. lamp photo-CVD (Chemical Vapor Deposition) techniques which have been utilized for the production of highly photoconductive hydrogenated amorphous silicon (a-Si:H) thin films. Most of these require the transmission of U. V. light through a window into the reaction vessel; leading to unwanted U. V. light absorption by the window and the a-Si:H film which tends to form on its inner surface. A deposition system developed in our laboratory will also be described, which circumvents these problems by incorporating a windowless discharge lamp into the reaction vessel.